Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2018TiOx deposited by magnetron sputtering
Tonneau, R.; Moskovkin, P.; Pflug, A.; Lucas, S.
Journal Article
2015Magnéli phases Ti4O7 and Ti8O15 and their carbon nanocomposites via the thermal decomposition-precursor route
Conze, Susan; Veremchuk, Igor; Reibold, Marianne; Matthey, Björn; Michaelis, Alexander; Grin, Juri; Kinski, Isabel
Journal Article
2005New steps towards large area plasma activated EB-PVD
Reinhold, E.; Steuer, C.; Metzner, C.; Scheffel, B.
Conference Paper
2005Structure and properties of titanium oxide layers deposited by reactive plasma activated electron beam evaporation
Modes, T.; Scheffel, B.; Metzner, C.; Zywitzki, O.; Reinhold, E.
Conference Paper
2004Structure and properties of crystalline titanium oxide layers deposited by reactive pulse magnetron sputtering
Zywitzki, O.; Modes, T.; Sahm, H.; Frach, P.; Goedicke, K.; Gloss, D.
Conference Paper
2004Ultra high-rate deposition of photocatalytic TiO2 films by reactive magnetron sputtering with unipolar pulsing and plasma emission control systems
Takasawa, N.; Ohno, S.; Sato, D.; Song, P.K.; Yoshikawa, M.; Suzuki, K.; Frach, P.; Shigesato, Y.
Conference Paper
2003High rate deposition of insulating TiO2 and conducting ITO films for optical and display applications
Frach, P.; Glöß, D.; Goedicke, K.; Fahland, M.; Gnehr, W.-M.
Conference Paper
2003Plasma emission control of reactive sputtering process in mid-frequency mode with dual cathodes to deposit photocatalytic TiO2 films
Ohno, S.; Sato, D.; Kon, M.; Song, P.K.; Yoshikawa, M.; Suzuki, K.; Frach, P.; Shigesato, Y.
Conference Paper
1999Ex situ and in situ spectroscopic ellipsometry of MF and DC-sputtered TiO2 and SiO2 films for process control
Vergöhl, M.; Malkomes, N.; Staedler, T.; Matthee, T.; Richter, U.
Journal Article