Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
20113D simulation of sputter etching with the Monte-Carlo approach
Kunder, D.
Dissertation
2010Coupling of Monte Carlo sputter simulation and feature-scale profile simulation and application to the simulation of back etching of an intermetal dielectric
Baer, E.; Kunder, D.; Lorenz, J.; Sekowski, M.; Paschen, Uwe
Conference Paper
2010Simulation of focused ion beam etching by coupling a topography simulator and a Monte-Carlo sputtering yield simulator
Kunder, D.; Baer, E.; Sekowski, M.; Pichler, P.; Rommel, M.
Journal Article, Conference Paper
2007Atmospheric-pressure plasmas for wide-area thin-film deposition and etching
Hopfe, V.; Sheel, D.W.
Journal Article
20043D feature-scale simulation of sputter etching with coupling to equipment simulation
Bär, E.; Lorenz, J.; Ryssel, H.
Conference Paper
2002Highly selective etching of deep silica components using electron cyclotron resonance plasma
Ferstl, M.
Journal Article
2002Investigation of macroscopic uniformity during CH4/H2 reactive ion etching of InP and its improvement by use of a guard ring
Janiak, K.; Niggebrugge, U.
Journal Article
2001Fabrication of InGaAsP/InP ridge waveguide lasers with dry etched facets using chemically assisted ion beam etching and a simple photoresist mask
Paraskevopoulos, A.; Hensel, H.-J.; Molzow, W.-D.; Janiak, K.; Suryaputra, E.; Roehle, H.; Wolfram, P.; Ebert, W.
Conference Paper
2001Micro-optical elements fabricated by electron-beam lithography and dry etching technique using top conductive coatings
Steingrüber, R.; Ferstl, M.; Pilz, W.
Conference Paper, Journal Article
2000Flexible, reliable and simple fabrication of integrated spot size converters with shifting mask technique
Steingrüber, R.; Trommer, D.; Kaiser, R.; Pfeiffer, K.; Tiedke, I.
Conference Paper, Journal Article
2000Hydrogen passivation in InP:Zn resulting from reactive ion etching during laser stripe formation
Kreissl, J.; Moehrle, M.; Sigmund, A.; Bochnia, R.; Harde, P.; Ulrici, W.
Conference Paper
2000MOMBE selective infill growth of InP/GaInAs for quantum dot formation
Gibis, R.; Schelhase, S.; Steingrüber, R.; Urmann, G.; Kunzel, H.; Thiel, S.; Stier, O.; Bimberg, D.
Conference Paper, Journal Article
2000Three-dimensional microstructure elements fabricated by electron beam lithography and dry etching technique
Steingrüber, R.; Ferstl, M.
Conference Paper, Journal Article
1999Characterization of oxide etching and wafer cleaning using vapor phase anhydrous hydrofluoric acid and ozone
Bauer, A.J.; Froeschle, B.; Beichele, M.; Ryssel, H.
Conference Paper
1999Impurity incorporation during beam assisted processing analyzed using nuclear microprobe
Park, Y.K.; Takai, M.; Lehrer, C.; Frey, L.; Ryssel, H.
Journal Article, Conference Paper
1998Surface-micromachined electrostatic microrelay
Schiele, I.; Huber, J.; Hillerich, B.; Kozlowski, F.
Conference Paper
1997Highly reproducible and defect-free MOVPE overgrowth of InGaAsP-based DFB gratings
Franke, D.; Roehle, H.
Conference Paper, Journal Article
1996Investigation of macroscopic uniformity during CH4/H2 reactive ion etching of InP and improvement using a guard ring
Janiak, K.; Niggebrugge, U.
Conference Paper
1996Numerical modelling of charged particle motion in electric and magnetic fields to assist magnetron design
Liebig, J.-S.; Frach, P.; Bartzsch, H.; Schulze, D.; Schwanbeck, H.
Conference Paper
1996Polarization independent integrated mode transformer for uncladded InGaAsP/InP rib waveguides without epitaxial regrowth
Albrecht, P.; Heidrich, H.; Löffler, R.; Mörl, L.; Reier, F.; Weinert, C.M.
Conference Paper
1995Chemical analysis of a C12/BCl3/IBr3 chemically assisted ion-beam etching process for GaAs and InP laser-mirror fabrication under cryo-pumped ultrahigh vacuum conditions
Daleiden, J.; Eisele, K.; Sah, R.E.; Schmidt, K.H.; Ralston, J.D.
Journal Article
1995Novel high density plasma tool for large area flat panel display etching
Heinrich, F.; Bänzinger, U.; Jentzsch, A.; Neumann, G.; Huth, C.
Conference Paper
1994Plasma-deposited fluorocarbon coatings for passive and active integrated optical devices
Wirges, W.; Bauer-Gogonea, S.; Bauer, S.; Gerhard-Multhaupt, R.; Martinu, L.; Klemberg-Sapieha, J.E.; Wertheimer, M.R.
Conference Paper
1993AR-coated arrays of binary lenses for interconnection networks at 1.5 mu m
Ferstl, M.; Kuhlow, B.; Pawlowski, E.
Journal Article, Conference Paper
1993Blazed Fresnel zone lenses approximated by discrete step profiles: Effects of fabrication errors
Ferstl, M.; Kuhlow, B.; Pawlowski, E.
Conference Paper
1993In situ SIMS monitoring for ion beam etching of III-V semiconductor compounds and metal contacts
Hensel, H.J.; Paraskevopoulos, A.; Mörl, L.; Hase, A.; Böttcher, J.
Conference Paper
1993Simulation of time depending particle transport during dry etch processes
Börnig, K.; Pelka, J.
Conference Paper
1992Passivation effects in novolak based resists during O2-RIE
Jagdhold, U.; Pelka, J.
Conference Paper
1991Recent advances in dry etching processes for InP-based materials
Niggebrugge, U.
Conference Paper
1991A reliable fabrication technique for very low resistance ohmic contacts to p-InGaAs using low energy Ar+ ion beam sputtering
Stareev, G.; Umbach, A.; Fidorra, F.; Roehle, H.
Conference Paper
1990Control of a reactive ion etching process for InP and related materials by in-situ ellipsometry in the near infrared
Muller, R.
Conference Paper
1990Dry chemical etching processes for the production of InP-based components
Niggebrugge, U.; Muller, R.
Conference Paper
1990In situ etching depth monitoring for reactive ion etching of InGaAs(P)/InP heterostructures by ellipsometry
Muller, R.
Journal Article
1990Ion projection lithography - electronic alignment and dry development of IPL exposed resist materials
Buchmann, L.-M.; Heuberger, A.; Fallmann, W.; Paschke, F.; Stangl, G.; Chalupka, A.; Fegerl, J.; Löschner, H.; Malek, L.; Nowak, R.; Stengl, G.; Traher, C.; Wolf, P.; Fischer, R.
Journal Article
1990Profile evolution in the multilevel technique
Pilz, W.; Pelka, J.
Conference Paper
1989Endpoint detection for CH4/H2 reactive ion etching of InGaAsP heterostructures by mass spectrometry
Schmid, H.; Fidorra, F.; Grutzmacher, D.
Conference Paper
1989Microstructuring in semiconductor technology
Mader, H.
Conference Paper
1987Plasma mass spectrometric analysis and control of reactive ion etching of InP and related compounds
Schmid, H.
Conference Paper
1986A novel process for reactive ion etching on InP, using CH4/H2
Niggebrugge, U.; Klug, M.; Garus, G.
Conference Paper
1986Reactive ion beam etching of InP with N2 and N2/O2 mixtures
Katzschner, W.; Niggebrügge, U.; Löffler, R.; Schroeter-Janssen, H.
Journal Article
1984Ion beam milling of InP with an Ar/O2-gas mixture
Katzchner, W.; Steckenborn, A.; Löffler, R.; Grote, N.
Journal Article