Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2019Influence of growth conditions and film thickness on the anodization behavior of sputtered aluminum films and the fabrication of nanorod arrays
Barth, Stephan; Derenko, Susan; Bartzsch, Hagen; Zywitzki, Olaf; Modes, Thomas; Patrovsky, Fabian; Fiehler, Vera; Uhlig, Tino; Frach, P.; Eng, L.M.
Journal Article
2018Time resolved detection of particle contamination during thin film deposition
Rüsseler, A.K.; Balasa, I.; Kricheldorf, H.-U.; Vergöhl, M.; Jensen, L.; Ristau, D.
Conference Paper
2017Spontaneous formation of highly periodic nano-ripples in inclined deposition of Mo/Si multilayers
Voronov, Dmitriy; Gawlitza, Peter; Braun, Stefan; Padmore, Howard
Journal Article
2016Adjustment of plasma properties in magnetron sputtering by pulsed powering in unipolar/bipolar hybrid pulse mode
Barth, Stephan; Bartzsch, Hagen; Glöß, Daniel; Frach, Peter; Gittner, Mathias; Labitzke, Rainer
Journal Article, Conference Paper
2016Thin-film deposition processes
Pflug, A.; Siemers, M.; Melzig, T.; Keunecke, M.; Schäfer, L.; Bräuer, G.
Book Article
2015Growth condition of amorphous ZTO films from rotatable targets
Sittinger, V.; Pflug, A.; Schulz, C.; Siemers, M.; Melzig, T.; Meyer, B.; Kronenberger, A.; Oberste Berghaus, J.; Bosscher, W. de
Journal Article, Conference Paper
2015Influence of process parameters on properties of piezoelectric AlN and AlScN thin films for sensor and energy harvesting applications
Barth, Stephan; Bartzsch, Hagen; Glöß, Daniel; Frach, Peter; Modes, Thomas; Zywitzki, Olaf; Suchaneck, Gunnar; Gerlach, Gerald
Conference Paper
2014Effect of process parameters on structure and piezoelectric properties of AlN and AlXSc1-XN films deposited by pulsed magnetron sputtering
Barth, Stephan; Bartzsch, Hagen; Glöß, Daniel; Frach, Peter; Zywitzki, Olaf; Herzog, Thomas; Walter, Susan; Heuer, Henning
Conference Paper
2014Fabrication of customizable wedged multilayer Laue lenses by adding a stress layer
Niese, Sven; Krüger, Peter; Kubec, Adam; Laas, Roman; Gawlitza, Peter; Melzer, Kathleen; Braun, Stefan; Zschech, Ehrenfried
Journal Article
2014Optical properties of unprotected and protected sputtered silver films: Surface morphology versus UV/VIS reflectance
Jobst, Paul Johannes; Stenzel, Olaf; Modsching, N.; Yulin, Sergiy; Wilbrandt, Steffen; Schürmann, Mark; Gäbler, Dieter; Kaiser, Norbert; Tünnerman, Andreas
Journal Article
2013Heteroepitaxial Ge-on-Si by DC magnetron sputtering
Steglich, Martin; Patzig, Christian; Berthold, Lutz; Schrempel, Frank; Füchsel, Kevin; Höche, Thomas; Kley, Ernst-Bernhard; Tünnermann, Andreas
Journal Article
2013Sputter deposition of stress controlled piezoelectric AlN and AlScN films for ultrasonic and energy harvesting applications
Barth, Stephan; Bartzsch, Hagen; Glöß, Daniel; Frach, Peter; Herzog, Thomas; Walter, Susan; Heuer, Henning
Conference Paper
2012Ion beam sputter deposition of epitaxial Ag films on native oxide covered Si (100) substrates
Khare, C.; Gerlach, J.W.; Patzig, C.; Rauschenbach, B.
Journal Article
2011High rate reactive sputter deposition of TiO2 films for photocatalyst and dye-sensitized solar cells
Sato, Y.; Hashimoto, T.; Miyamura, A.; Ohno, S.; Oka, N.; Suzuki, K.; Glöß, D.; Frach, P.; Shigesato, Y.
Journal Article
2011Resonance effects in photoemission from TiO2-capped Mo/Si multilayer mirrors for extreme ultraviolet applications
Faradzhev, N.S.; Yakshinskiy, B.V.; Starodub, E.; Madey, T.E.; Hill, S.B.; Grantham, S.; Lucatorto, T.B.; Yulin, S.; Vescovo, E.; Keister, J.W.
Journal Article
2010Modified TiAlN coatings prepared by d.c. pulsed magnetron sputtering
Keunecke, M.; Stein, C.; Bewilogua, K.; Koelker, W.; Kassel, D.; Berg, H. van den
Journal Article, Conference Paper
2009Electrical insulation properties of sputter-deposited SiO2, Si3N4 and Al2O3 films at room temperature and 400 degrees C
Bartzsch, H.; Glöß, D.; Frach, P.; Gittner, M.; Schultheiß, E.; Brode, W.; Hartung, J.
Journal Article, Conference Paper
2009Highly dense amorphous Nb2O5 films with closed nanosized pores
Vinnichenko, M.; Rogozin, A.; Grambole, D.; Munnik, F.; Kolitsch, A.; Möller, W.; Stenzel, O.; Wilbrandt, S.; Chuvilin, A.; Kaiser, U.
Journal Article
2009Preparation and comparison of a-C:H coatings using reactive sputter techniques
Keunecke, M.; Weigel, K.; Bewilogua, K.; Cremer, R.; Fuss, H.-G.
Journal Article
2008Sputter process with time-variant reactive gas mixture for the deposition of optical multilayer and gradient layer systems
Bartzsch, H.; Weber, J.; Lau, K.; Glöß, D.; Frach, P.
Conference Paper
2006High-reflectivity Cr/Sc multilayer condenser for compact soft x-ray microscopy
Stollberg, H.; Yulin, S.; Takman, P.A.C.; Hertz, H.M.
Journal Article
2006Process stabilization and increase of the deposition rate in reactive sputtering of metal oxides and oxynitrides
Severin, D.; Kappertz, O.; Kubart, T.; Nyberg, T.; Berg, S.; Pflug, A.; Siemers, M.; Wuttig, M.
Journal Article
2006ZnO:Al films deposited by in-line reactive AC magnetron sputtering for a-Si:H thin film solar cells
Sittinger, V.; Ruske, F.; Werner, W.; Szyszka, B.; Rech, B.; Hüpkes, J.; Schöpe, G.; Stiebig, H.
Journal Article
2005Deposition of broadband antireflection coatings on plastic substrates by evaporation and reactive pulse magnetron sputtering
Weber, J.; Schulz, U.; Kaiser, N.; Bartzsch, H.; Frach, P.
Conference Paper
2005Preparation and characterization of multilayers for EUV applications
Foltyn, T.; Braun, S.; Friedrich, W.; Leson, A.; Menzel, M.
Conference Paper
2004Growth and characterization of thick cBN coatings on silicon and tool substrates
Bewilogua, K.; Keunecke, M.; Weigel, K.; Wiemann, E.
Journal Article
2003Process simulation for advanced large area optical coatings
Pflug, A.; Szyszka, B.; Sittinger, V.; Niemann, J.
Conference Paper
2002Simulation of the influence of via sidewall tapering on step coverage of sputter-deposited barrier layers
Bär, E.; Lorenz, J.; Ryssel, H.
Journal Article
2001Dynamic simulation of process control of the reactive sputter process using two seperate targets and experimental results
Malkomes, N.; Bierhals, A.; Szyszka, B.; Vergöhl, M.
Conference Paper
2001Mechanical and tribological properties of cBN films on silicon and tungsten carbide substrates
Keunecke, M.; Yamamoto, K.; Bewilogua, K.
Journal Article
2001Mo/Si multilayers with different barrier layers for applications as EUV mirrors
Braun, S.; Mai, H.; Moss, M.; Scholz, R.
Conference Paper
2000Deposition of well adhering CBN films up to 2 µm thickness by B-C-N gradient layer systems
Yamamoto, K.; Keunecke, M.; Bewilogua, K.
Journal Article
2000Effect of target material on deposition and properties of metal-containing DLC (Me-DLC) coatings
Bewilogua, K.; Cooper, C.V.; Specht, C.; Schröder, J.; Wittorf, R.; Grischke, M.
Conference Paper, Journal Article
2000Erratum to: Effect of target material on deposition and properties of metal-containing DLC (Me-DLC) coatings
Bewilogua, K.; Cooper, C.V.; Specht, C.; Schröder, J.; Wittorf, R.; Grischke, M.
Journal Article
2000Vapor phase deposition of cubic boron nitride films
Bewilogua, K.; Richter, F.
Book Article
1999Improvement of the adhesion of sputter-deposited cubic boron nitride films
Walter, H.; Bewilogua, K.; Schütze, A.; Maassen, T.
Journal Article
1998Dual magnetron sputtering (DMS) system with sine-wave power supply for large-area coating
Kirchhoff, V.; Kopte, T.; Winkler, T.; Schulze, M.; Wiedemuth, P.
Conference Paper, Journal Article
19973D simulation for sub-micron metallization
Bär, E.; Lorenz, J.; Ryssel, H.
Journal Article, Conference Paper
19973D simulation of sputter deposition of titanium layers in contact holes with high aspect ratios
Bär, E.; Lorenz, J.; Ryssel, H.
Conference Paper
1997Deposition of BaTiO3 thin films by a hybrid DC-field enhanced PLD-process
Husmann, A.; Mertin, M.; Klotzbücher, T.; Kreutz, E.W.
Journal Article
1997The PROMPT project and its application to the three-dimensional simulation of low-pressure chemical vapor deposition processes
Bär, E.; Lorenz, J.
Journal Article
1997Three-dimensional simulation of conventional and collimated sputter deposition of Ti layers into high aspect ratio contact holes
Bär, E.; Lorenz, J.; Ryssel, H.
Conference Paper
1996Numerical modelling of charged particle motion in electric and magnetic fields to assist magnetron design
Liebig, J.-S.; Frach, P.; Bartzsch, H.; Schulze, D.; Schwanbeck, H.
Conference Paper
1996Preparation and characterization of cubic boron nitride and carbon nitride films
Bewilogua, K.
Conference Paper
1996Preparation and characterization of cubic boron nitride and carbon nitride films
Bewilogua, K.
Conference Paper
1996Segmented Fresnel zone lens elements with several primary foci
Galloway, P.C.M.; Ferstl, M.; Kuhlow, B.; Pawlowski, E.; Przyrembel, G.
Journal Article
1995Diffractive optical elements: Fabrication and measurement of wavelength division multiplexer
Pawlowski, E.
Conference Paper
1994Antireflection-coated diffractive optical elements fabricated by thin-film deposition
Pawlowski, E.; Kuhlow, B.
Journal Article
1994Diffractive microlenses with antireflection coatings fabricated by thin film deposition
Pawlowski, E.; Engel, H.; Ferstl, M.; Furst, W.; Kuhlow, B.
Journal Article
1994Integrated planar Fresnel zone lenses for beam forming and coupling
Pawlowski, E.
Conference Paper
1993Control of reactive DC magnetron sputtering of SnO2 by means of optical emission
Kirchhoff, V.; Heisig, U.
Conference Paper
1993Thin film deposition: An alternative technique for the fabrication of binary optics with high efficiency
Pawlowski, E.
Conference Paper
1993Two dimensional array of AR-coated diffractive microlenses fabricated by thin film deposition
Pawlowski, E.; Engel, H.; Ferstl, M.; Furst, W.; Kuhlow, B.
Conference Paper
1989Effects in sputtered Y1Ba2Cu3O7-8 films
Springholz, G.; Aichholzer, K.; Abt, R.; Leising, G.; Leitner, O.; Kranebitter, P.; Pölt, P.
Journal Article
1985An InGaAsP/InP double-heterojunction bipolar transistor for monolithic integration with a 1.5- mu m laser diode
Su, L.M.; Grote, N.; Kaumanns, R.; Katzschner, W.; Bach, H.G.
Journal Article