Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2003Silicon nitride films deposited using ECR-PECVD technique for coating InGaAlAs high power laser facets
Sah, R.E.; Rinner, F.; Baumann, H.; Kiefer, R.; Mikulla, M.; Weimann, G.
Journal Article
2003Wet etching studies of silicon nitride thin films deposited by electron cyclotron resonance (ECR) plasma enhanced chemical vapor deposition
Sundaram, K.B.; Sah, R.E.; Baumann, H.; Balachandran, K.; Todi, R.M.
Journal Article
2002High-density plasma deposited silicon nitride films for coating InGaAlAs high-power lasers
Sah, R.E.; Rinner, F.; Kiefer, R.; Mikulla, M.; Weimann, G.
Conference Paper
2001Thermally induced stress changes in high-density plasma deposited silicon nitride films
Sah, R.E.; Baumann, H.; Mikulla, M.; Kiefer, R.; Weimann, G.
Conference Paper
1999Effect of aging on stress in silicon nitride films deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition technique
Sah, R.E.; Baumann, H.; Serries, D.; Kiefer, R.; Braunstein, J.
Conference Paper
1997Composition and mechanical properties of silicon nitride thin films deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition technique
Sah, R.E.; Baumann, H.; Ohle, T.
Conference Paper