Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2018Investigation of industrially-suited processes for deposition of oxide thin films by high power impulse magnetron sputtering
Campos Carreri, Felipe de
Dissertation
2017Influence of substrate temperature on morphology and behavior under cyclic thermal load of gas flow sputtered zirconia coatings
Rösemann, N.; Ortner, K.; Petersen, J.; Stöwer, M.; Bäker, M.; Bräuer, G.; Rösler, J.
Journal Article
2017Large area precision coatings by pulse magnetron sputtering
Frach, Peter; Glöß, Daniel; Goschurny, Thomas; Drescher, Andy; Hartung, Ullrich; Bartzsch, Hagen; Heisig, Andreas; Grune, Harald; Leischnig, L.; Leischnig, S.; Bundesmann, C.
Conference Paper
2017Microstructure of gas flow sputtered thermal barrier coatings
Rösemann, N.; Ortner, K.; Petersen, J.; Bäker, M.; Bräuer, G.; Rösler, J.
Journal Article
2016Piezoelectric AlN films for FPW sensors with improved device performance
Reusch, M.; Holc, K.; Kirste, L.; Katus, P.; Reindl, L.; Ambacher, O.; Lebedev, V.
Journal Article, Conference Paper
2015Heuristic modeling of the doping efficiency in sputtered TCO layers
Pflug, A.; Siemers, M.; Melzig, T.; Sittinger, V.; Schäfer, L.
Journal Article, Conference Paper
2015Influence of bias voltage and oxygen flow rate on morphology and crystallographic properties of gas flow sputtered zirconia coatings
Rösemann, N.; Ortner, K.; Petersen, J.; Schadow, T.; Bäker, M.; Bräuer, G.; Rösler, J.
Journal Article
2014Reaktive sputtering in roll-to-roll coating machines using rotatable magnetrons
Fahland, Matthias; Vogt, Tobias; Dimer, Martin; Khvostikova, Olga
Conference Paper
2013Applications of HIPIMS metal oxides
Sittinger, V.; Lenck, O.; Vergöhl, M.; Szyszka, B.; Bräuer, G.
Journal Article
2013High power density pulse magnetron sputtering - process and film properties
Frach, Peter; Gottfried, Christian; Fietzke, Fred; Klostermann, Heidrun; Bartzsch, Hagen; Glöß, Daniel
Conference Paper
2012Modelling of sputtering yield amplification in serial reactive magnetron co-sputtering
Kubart, T.; Schmidt, R.M.; Austgen, M.; Nyberg, T.; Pflug, A.; Siemers, M.; Wuttig, M.; Berg, S.
Journal Article
2012Scratch resistant optical coatings on polymers by magnetron-plasma-enhanced chemical vapor deposition
Täschner, K.; Bartzsch, H.; Frach, P.; Schultheiss, E.
Journal Article, Conference Paper
2011Characterization of reactively sputtered permeation barrier materials on polymer substrates
Fahlteich, J.; Schönberger, W.; Fahland, M.; Schiller, N.
Journal Article, Conference Paper
2010All-in-vacuum deposited transparent multilayer barries on polymer substrates
Fahlteich, J.; Barth, S.; Fahland, M.; Schiller, N.
Conference Paper
2010Modelling of sputtering yield amplification effect in reactive deposition of oxides
Kubart, T.; Nyberg, T.; Pflug, A.; Siemers, M.; Austgen, M.; Koehl, D.; Wuttig, M.; Berg, S.
Journal Article
2010Scratch resistant optical coatings on polymers by magnetron-PECVD
Taeschner, K.; Bartzsch, H.; Frach, P.; Schultheiß, E.
Conference Paper
2009Permeation barrier properties of thin oxide films on flexible polymer substrates
Fahlteich, J.; Fahland, M.; Schönberger, W.; Schiller, N.
Conference Paper, Journal Article
2006Deposition of reflection layers on metal and polymer substrates for the CMS Experiment at CERN
Fahland, M.; Braem, A.
Conference Paper
2006High rate deposition of tin-doped indium oxide films by reactive magnetron sputtering with unipolar pulsing and plasma emission feedback systems
Ohno, S.; Kawaguchi, Y.; Miyamura, A.; Sato, Y.; Song, P.K.; Yoshikawa, M.; Frach, P.; Shigesato, Y.
Journal Article
2006Photocatalytic TiO2 films deposited by reactive magnetron sputtering with unipolar pulsing and plasma emission control systems
Ohno, S.; Takasawa, N.; Sato, Y.; Yoshikawa, M.; Suzuki, K.; Frach, P.; Shigesato, Y.
Journal Article, Conference Paper, Journal Article
2005Modeling of the plasma impedance in reactive magnetron sputtering for various target materials
Pflug, A.; Siemers, M.; Szyszka, B.; Kappertz, O.; Nyberg, T.; Berg, S.
Conference Paper
2005Photocatalytic titanium dioxide thin films prepared by reactive pulse magnetron sputtering at low temperature
Glöß, D.; Frach, P.; Zywitzki, O.; Modes, T.; Klinkenberg, S.; Gottfried, C.
Journal Article
2004Graded refractive index layer systems for antireflective coatings and rugate filters deposited by reactive pulse magnetron sputtering
Bartzsch, H.; Lange, S.; Frach, P.; Goedicke, K.
Conference Paper, Journal Article
2004The sputtering of ITO-layers by pulsed plasmas
Gnehr, W.-M.; Hartung, U.; Kopte, T.
Conference Paper
2004Ultra high-rate deposition of photocatalytic TiO2 films by reactive magnetron sputtering with unipolar pulsing and plasma emission control systems
Takasawa, N.; Ohno, S.; Sato, D.; Song, P.K.; Yoshikawa, M.; Suzuki, K.; Frach, P.; Shigesato, Y.
Conference Paper
2003Gas response of reactively sputtered ZnO films on Si-based micro-array
Min, Y.; Tuller, H.L.; Palzer, S.; Wöllenstein, J.; Böttner, H.
Journal Article, Conference Paper
2003High rate deposition of insulating TiO2 and conducting ITO films for optical and display applications
Frach, P.; Glöß, D.; Goedicke, K.; Fahland, M.; Gnehr, W.-M.
Conference Paper, Journal Article
2003Impedance Control of Reactive Sputtering Process in Mid-Frequency Mode with Dual Cathodes to Deposit Al-Doped ZnO Films
Kon, M.; Song, P.K.; Shigesato, Y.; Frach, P.; Ohno, S.; Suzuki, K.
Journal Article
2003Influences of pulse parameters on properties of optical coatings deposited by reactive pulsed magnetron sputtering
Vanecek, R.; Liebig, J.; Sahm, H.
Conference Paper
2003Magnetically enhanced RF discharges for effective pre-treatment of plastic webs at high speed
Rank, R.; Wünsche, V.; Günther, S.
Journal Article, Conference Paper
2003Plasma emission control of reactive sputtering process in mid-frequency mode with dual cathodes to deposit photocatalytic TiO2 films
Ohno, S.; Sato, D.; Kon, M.; Song, P.K.; Yoshikawa, M.; Suzuki, K.; Frach, P.; Shigesato, Y.
Conference Paper, Journal Article
2002Simulation of reactive magnetron sputtering kinetics in real in-line processing chambers
Pflug, A.; Malkomes, N.; Sittinger, V.; Szyszka, B.
Conference Paper
2000Improving tribological properties of sputtered boron carbide coatings by process modifications
Eckardt, T.; Bewilogua, K.; Kolk, G.J. van der; Hurkmans, T.; Trinh, T.; Fleischer, W.
Journal Article
1996Entwicklung von Schichtsystemen für hochohmige Präzisionswiderstände
Klages, C.-P.; Thyen, R.; Veyhl, R.; Weber, A.
Conference Paper
1996Entwicklung von Schichtsystemen für hochohmige Präzisionswiderstände. Abschlußbericht
Thyen, R.
Report
1995Preparation of cubic boron nitride films by use of electrically conductive boron carbide targets
Lüthje, H.; Bewilogua, K.; Daaud, S.; Johansson, M.; Hultmann, L.
Journal Article
1993High rate deposition of alumina films by reactive gas flow sputtering
Jung, T.; Westphal, A.
Journal Article, Conference Paper
1993Preparation of W-C-H coatings by reactive magnetron sputtering
Bewilogua, K.; Dimigen, H.
Conference Paper
1992Preparation of c-BN containing films by reactive r.f. sputtering
Bewilogua, K.; Buth, J.; Hübsch, H.; Grischke, M.
Journal Article, Conference Paper