Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2013Evaluation of resistless Ga+ beam lithography for UV NIL stamp fabrication
Rumler, Maximilian; Fader, Robert; Haas, Anke; Rommel, Mathias; Bauer, Anton; Frey, Lothar
Journal Article
2013Processing of silicon nanostructures by Ga+ resistless lithography and reactive ion etching
Rommel, M.; Rumler, M.; Haas, A.; Bauer, A.J.; Frey, L.
Journal Article
2010Aligned diamond nano-wires: Fabrication and characterisation for advanced applications in bio- and electrochemistry
Smirnov, W.; Kriele, A.; Yang, N.; Nebel, C.E.
Journal Article
2002Investigation of macroscopic uniformity during CH4/H2 reactive ion etching of InP and its improvement by use of a guard ring
Janiak, K.; Niggebrugge, U.
Journal Article
2000Hydrogen passivation in InP:Zn resulting from reactive ion etching during laser stripe formation
Kreissl, J.; Moehrle, M.; Sigmund, A.; Bochnia, R.; Harde, P.; Ulrici, W.
Conference Paper
2000MOMBE selective infill growth of InP/GaInAs for quantum dot formation
Gibis, R.; Schelhase, S.; Steingrüber, R.; Urmann, G.; Kunzel, H.; Thiel, S.; Stier, O.; Bimberg, D.
Conference Paper, Journal Article
1998Dielectric micro-filters for locally resolving color sensors
Frank, M.; Schallenberg, U.B.; Kaiser, N.; Buß, W.
Journal Article
1998Low-loss polymer waveguide with high thermal stability
Wirges, H.; Keil, N.; Yao, H.H.; Yilmaz, S.; Zawadzki, C.; Bauer, M.; Bauer, J.; Dreyer, C.
Conference Paper
1998Multispectral dielectric microfilter arrays for local resolving color sensors
Frank, M.; Schallenberg, U.B.; Kaiser, N.
Journal Article
1998Selective infill metalorganic molecular beam epitaxy of InP:Si n+/n- layers for buried collector double heterostructure bipolar transistors
Schelhase, S.; Bottcher, J.; Gibis, R.; Harde, P.; Paraskevopoulos, A.; Kunzel, H.
Journal Article
1997Dielectric microfilter arrays for multispectral measuring devices
Frank, M.; Schallenberg, U.; Kaiser, N.; Buss, W.
Conference Paper
1997Highly reproducible and defect-free MOVPE overgrowth of InGaAsP-based DFB gratings
Franke, D.; Roehle, H.
Conference Paper, Journal Article
1994Plasma-deposited fluorocarbon coatings for passive and active integrated optical devices
Wirges, W.; Bauer-Gogonea, S.; Bauer, S.; Gerhard-Multhaupt, R.; Martinu, L.; Klemberg-Sapieha, J.E.; Wertheimer, M.R.
Conference Paper
1993Electronic study of plasma-induced damage in GaAs heterostructures.
Zappe, H.P.
Journal Article
1990Hydrogen passivation of Zn acceptors in InGaAs during reactive ion etching
Moehrie, M.
Journal Article
1990In situ etching depth monitoring for reactive ion etching of InGaAs(P)/InP heterostructures by ellipsometry
Muller, R.
Journal Article
1990Influence of dry etch conditions on the properties of Schottky contacts to n-GaAs
Pletschen, W.; Bachem, K.H.; Hornung, J.; Kaufel, G.; Köhler, K.
Conference Paper
1990Influence of plasma and ion beams on the electrical properties on n-GaAs Schottky diodes.
Pletschen, W.; Bachem, K.H.
Journal Article
1990Influence of RIE- induced damage on luminescence and electron transport properties of AlGaAs-GaAs heterostructures.
As, D.J.; Kaufel, G.; Köhler, K.; Rothemund, W.; Zappe, H.P.; Jantz, W.; Schweizer, T.; Frey, T.
Journal Article
1989Endpoint detection for CH4/H2 reactive ion etching of InGaAsP heterostructures by mass spectrometry
Schmid, H.; Fidorra, F.; Grutzmacher, D.
Conference Paper
1987Plasma mass spectrometric analysis and control of reactive ion etching of InP and related compounds
Schmid, H.
Conference Paper
1987Self-aligned waveguide mirrors for optical integration on InGaAsP/InP
Albrecht, P.; Doldissen, W.; Niggerbrugge, U.; Nolting, H.P.; Schmid, H.
Conference Paper
1986A novel process for reactive ion etching on InP, using CH4/H2
Niggebrugge, U.; Klug, M.; Garus, G.
Conference Paper