Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
1999Optical pyrometry for in situ control of MBE growth of (Al,Ga)As1-xSbx compounds on InP
Biermann, K.; Hase, A.; Kunzel, H.
Conference Paper, Journal Article
1996Temperature measurement at RTP facilities. An overview
Wagner, J.; Böbel, F.G.
Conference Paper
1995In situ film thickness and temperature control of molecular beam epitaxy growth by pyrometric interferometry
Böbel, F.G.; Möller, H.; Hertel, B.; Grothe, H.; Schraud, G.; Schröder, S.; Chow, P.
Journal Article
1995In situ observation of chemical vapour deposition growth of epitaxial SiGe thin films by reflexion supported pyrometric interferometry
Ritter, G.; Tillack, B.; Weidner, M.; Zaumseil, P.; Böbel, F.G.; Hertel, B.; Möller, H.
Conference Paper
1995Pyrometrische Interferometrie. Ein neues Meßverfahren zur in-situ-Prozeßkontrolle
Böbel, F.G.
Dissertation
1995Temperature controlling with reflection supported interferometry (RSPI) at rapid thermal chemical vapor deposition-facilities (RTCVD)
Märitz, J.; Möller, H.; Böbel, F.G.; Ritter, G.; Weusthof, M.H.H.; Hollemann, J.
Conference Paper
1994In situ film thickness and temperature monitoring of MBE-growth of vertical cavity surface emitting lasers (VCSELs) by reflexion supported pyrometric interferometry (RSPI)
Böbel, F.G.
Book
1994In situ film-thickness and temperature monitor
Böbel, F.G.; Möller, H.; Hertel, B.; Ritter, G.; Chow, P.
Journal Article
1993Pyrometrische Interferometrie: Ein neues Werkzeug zur Prozeßkontrolle in schichtabscheidenden Prozessen
Möller, H.; Böbel, F.G.
Conference Paper
1993Reflexion supported pyrometric interferometry. A new tool for in situ, real time temperature control in semiconductor manufacturing
Böbel, F.G.; Möller, H.; Preiß, W.
Conference Paper
1991In-situ film thickness measurements by using pyrometric interferometry
Boebel, F.G.; Bonnes, U.; Frohmader, K.P.
Conference Paper