Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2018Modeling of block copolymer dry etching for directed self-assembly lithography
Belete, Zelalem; Bär, Eberhard; Erdmann, Andreas
Conference Paper
2018Nanostructuring of polymer surfaces by magnetron plasma treatment
Steiner, Cindy; Fichtner, Juliane; Fahlteich, John
Journal Article
2016Characterization of stochastic nanostructures on ethylene tetrafluoroethylene films
Steiner, Cindy; Fahlteich, John
Conference Paper
2016Light management in flexible thin-film solar cells on transparent plastic substrates
Wilken, Karen; Paetzold, Ulrich W.; Meier, Matthias; Ablayev, Gani M.; Terukov, Evgeny I.; Prager, Nicole; Fahland, Matthias; Finger, Friedhelm; Smirnov, Vladimir
Journal Article
2015Improvement of feature-scale profile evolution in a silicon dioxide plasma etching simulator using the level set method
Montoliu, C.; Baer, Eberhard; Cerda, J.; Colom, R.J.
Journal Article
2011Organic small molecule-based optical coatings
Schulz, U.; Präfke, C.; Munzert, P.; Kaiser, N.
Conference Paper
2010Coupling of equipment simulation and feature-scale profile simulation for dry-etching of polysilicon gate lines
Baer, E.; Kunder, D.; Evanschitzky, P.; Lorenz, J.
Conference Paper
1997The selective etching of H+ ions and its effect on the oriented growth of diamond films
Jiang, X.; Xia, Y.B.; Zhang, W.J.
Journal Article
1997Surface cleaning and etching of CdZnTe and CdTe in H2/Ar, CH4/H2/Ar, and CH4/H2/N2/Ar electron cyclotron resonance plasmas
Keller, R.C.; Zimmermann, H.; Seelmann Eggebert, M.; Richter, H.J.
Journal Article
1995Addition of N2 as a polymer deposition inhibitor in CH4/H2 electrocyclotron resonance plasma etching of Hg1-xCdxTe
Keller, R.C.; Seelmann-Eggebert, M.; Richter, H.J.
Journal Article
1994Plasma-deposited fluorocarbon coatings for passive and active integrated optical devices
Wirges, W.; Bauer-Gogonea, S.; Bauer, S.; Gerhard-Multhaupt, R.; Martinu, L.; Klemberg-Sapieha, J.E.; Wertheimer, M.R.
Conference Paper
1993Mehrlagenmetallisierung für hochintegrierte mikroelektronische Schaltungen
Vogt, H.
Habilitation
1991Plasma etching damage in GaAs studied by resonant Raman scattering.
Pletschen, W.; Kaufel, G.; Köhler, K.; Wagner, J.
Journal Article