| | |
|---|
| 2009 | Magnetically enhanced hollow cathode - a new plasma source for high-rate deposition processes
Fietzke, F.; Morgner, H.; Günther, S. | Journal Article, Conference Paper |
| 2006 | Micro-cavity organic light emitting diodes for biochip applications
Roma, G.; Belardini, A.; Michelotti, F.; Danz, N.; Pace, A.; Sarto, F.; Montereali, R.M. | Journal Article |
| 2005 | Passivation of III-V-based compound semiconductor devices using high-density plasma deposited silicon nitride films
Sah, R.E.; Mikulla, M.; Schneider, H.; Benkhelifa, F.; Dammann, M.; Quay, R.; Fleißner, J.; Walther, M.; Weimann, G. | Conference Paper |
| 2004 | Influence of plasma functionalization of poly(propylene) with acrylic acid on the nucleation of CaCO3
Sciarratta, V.; Oehr, C.; Diegelmann, C.; Löbmann, P. | Journal Article |
| 2003 | Plasma functionalization of polypropylene with acrylic acid
Sciarratta, V.; Vohrer, U.; Hegemann, D.; Müller, M.; Oehr, C. | Conference Paper |
| 2003 | Wet etching studies of silicon nitride thin films deposited by electron cyclotron resonance (ECR) plasma enhanced chemical vapor deposition
Sundaram, K.B.; Sah, R.E.; Baumann, H.; Balachandran, K.; Todi, R.M. | Journal Article |
| 2002 | Detailed study of the composition of hydrogenated SiNX layers for high-quality silicon surface passivation
Mächel, H.; Lüdemann, R. | Journal Article |
| 2001 | Thermally induced stress changes in high-density plasma deposited silicon nitride films
Sah, R.E.; Baumann, H.; Mikulla, M.; Kiefer, R.; Weimann, G. | Conference Paper |
| 2000 | Plasma-assisted deposition at atmospheric pressure using dielectric barrier discharges
Klages, C.-P.; Höpfner, K.; Kläke, N.; Thyen, R. | Conference Paper |
| 2000 | Surface functionalization at atmospheric pressure by DBD-based pulsed plasma polymerization
Klages, C.-P.; Höpfner, K.; Kläke, N.; Thyen, R. | Journal Article |
| 1999 | Simulation and development of optimized microwave plasma reactors for diamond deposition
Füner, M.; Wild, C.; Koidl, P. | Journal Article |
| 1998 | Large area microwave-plasma CVD of diamond wafers for optical and thermal applications
Koidl, P.; Wild, C.; Füner, M.; Wörner, E.; Müller-Sebert, W. | Conference Paper |
| 1997 | ECR-plasma deposited oxygen-free SiN(x) films for low- and high-reflectivity coatings for GaAs based devices
Sah, R.E.; Weimar, U.; Baumann, H.; Wagner, J.; Kiefer, R.; Müller, S. | Conference Paper |
| 1996 | Combined Plasma Nitriding and PACVD Surface Treatments of Metal-Forming Tools
Morlok, O.; Mann, D. | Conference Paper |
| 1996 | Combined Surface Treatment of Forging Tools by Plasma Nitriding and PACVD
Doege, E.; Westkämper, E.; Seidel, R.; Romanowski, C.; Andreis, G.; Morlok, O. | Conference Paper |
| 1992 | Adherent metallization of carbon-fibre-reinforced plastic composites using a combined vacuum/electrochemical deposition process
Bolch, T.; Fessmann, J.; Kampschulte, G.; Leyendecker, F.; Mann, D.; Mertz, K. | Journal Article, Conference Paper |
| 1991 | Amorphous, hydrogenated carbon films and related materials - plasma deposition and film properties
Locher, R.; Sah, R.E.; Koidl, P.; Wild, C. | Book Article |
| 1991 | Direct ion-beam deposition of amorphous hydrogenated carbon films.
Locher, R.; Koidl, P.; Wild, C. | Journal Article |
| 1989 | Critical assessment of diamondlike carbon.
Koidl, P. | Conference Paper |
| 1989 | Plasma deposition, properties and structure of amorphous hydrogenated carbon films.
Dischler, B.; Koidl, P.; Ramsteiner, M.; Wagner, J.; Wild, C. | Journal Article |