Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2013Plasma deposition of hydrophobic coatings on structured surfaces for condensation and heat transfer
Glöß, Daniel; Frach, Peter; Maicu, Marina; Holst, Emmy; Schmittgens, Ralf; Gerlach, Gerald; Lu, Chen; Roch, T.; Bieda, M.; Lasagni, A.; Beckmann, M.
Conference Paper
2013Strengthening fibre/matrix interphase by fibre surface modification and nanoparticle incorporation into the matrix
Drescher, P.; Thomas, M.; Borris, J.; Riedel, U.; Arlt, C.
Journal Article
2009Magnetically enhanced hollow cathode - a new plasma source for high-rate deposition processes
Fietzke, F.; Morgner, H.; Günther, S.
Journal Article, Conference Paper
2006Micro-cavity organic light emitting diodes for biochip applications
Roma, G.; Belardini, A.; Michelotti, F.; Danz, N.; Pace, A.; Sarto, F.; Montereali, R.M.
Journal Article
2005Passivation of III-V-based compound semiconductor devices using high-density plasma deposited silicon nitride films
Sah, R.E.; Mikulla, M.; Schneider, H.; Benkhelifa, F.; Dammann, M.; Quay, R.; Fleißner, J.; Walther, M.; Weimann, G.
Conference Paper
2004Influence of plasma functionalization of poly(propylene) with acrylic acid on the nucleation of CaCO3
Sciarratta, V.; Oehr, C.; Diegelmann, C.; Löbmann, P.
Journal Article
2003Plasma functionalization of polypropylene with acrylic acid
Sciarratta, V.; Vohrer, U.; Hegemann, D.; Müller, M.; Oehr, C.
Conference Paper
2003Wet etching studies of silicon nitride thin films deposited by electron cyclotron resonance (ECR) plasma enhanced chemical vapor deposition
Sundaram, K.B.; Sah, R.E.; Baumann, H.; Balachandran, K.; Todi, R.M.
Journal Article
2002Detailed study of the composition of hydrogenated SiNX layers for high-quality silicon surface passivation
Mächel, H.; Lüdemann, R.
Journal Article
2001Thermally induced stress changes in high-density plasma deposited silicon nitride films
Sah, R.E.; Baumann, H.; Mikulla, M.; Kiefer, R.; Weimann, G.
Conference Paper
2000Plasma-assisted deposition at atmospheric pressure using dielectric barrier discharges
Klages, C.-P.; Höpfner, K.; Kläke, N.; Thyen, R.
Conference Paper
2000Surface functionalization at atmospheric pressure by DBD-based pulsed plasma polymerization
Klages, C.-P.; Höpfner, K.; Kläke, N.; Thyen, R.
Journal Article
1999Simulation and development of optimized microwave plasma reactors for diamond deposition
Füner, M.; Wild, C.; Koidl, P.
Journal Article
1998Large area microwave-plasma CVD of diamond wafers for optical and thermal applications
Koidl, P.; Wild, C.; Füner, M.; Wörner, E.; Müller-Sebert, W.
Conference Paper
1997ECR-plasma deposited oxygen-free SiN(x) films for low- and high-reflectivity coatings for GaAs based devices
Sah, R.E.; Weimar, U.; Baumann, H.; Wagner, J.; Kiefer, R.; Müller, S.
Conference Paper
1996Combined Plasma Nitriding and PACVD Surface Treatments of Metal-Forming Tools
Morlok, O.; Mann, D.
Conference Paper
1996Combined Surface Treatment of Forging Tools by Plasma Nitriding and PACVD
Doege, E.; Westkämper, E.; Seidel, R.; Romanowski, C.; Andreis, G.; Morlok, O.
Conference Paper
1992Adherent metallization of carbon-fibre-reinforced plastic composites using a combined vacuum/electrochemical deposition process
Bolch, T.; Fessmann, J.; Kampschulte, G.; Leyendecker, F.; Mann, D.; Mertz, K.
Journal Article, Conference Paper
1991Amorphous, hydrogenated carbon films and related materials - plasma deposition and film properties
Locher, R.; Sah, R.E.; Koidl, P.; Wild, C.
Book Article
1991Direct ion-beam deposition of amorphous hydrogenated carbon films.
Locher, R.; Koidl, P.; Wild, C.
Journal Article
1989Critical assessment of diamondlike carbon.
Koidl, P.
Conference Paper
1989Plasma deposition, properties and structure of amorphous hydrogenated carbon films.
Dischler, B.; Koidl, P.; Ramsteiner, M.; Wagner, J.; Wild, C.
Journal Article