Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2011Preparation of a-C:H/a-C:H:Si:O and a-C:H/a-C:H:Si multilayer coatings by PACVD
Bewilogua, K.; Bialuch, I.; Ruske, H.; Weigel, K.
Journal Article
2007Atmospheric-pressure plasmas for wide-area thin-film deposition and etching
Hopfe, V.; Sheel, D.W.
Journal Article
2007Wirtschaftlicher Solarstrom - Atmosphärendruck-Plasmaverfahren in der Photovoltaik
Dani, I.; Dresler, B.; Lopez, E.; Hopfe, V.
Journal Article
2003Ultrathin amorphous carbon films for magnetic recording prepared by the mesh hollow cathode plasma source
Mahrholz, J.; Höfer, M.; Jung, T.
Conference Paper
2001Comparison of radio frequency and pulsed-d.c. plasma CVD of Ti-C-N-H and Zr-C-N-H layers at low temperature
Wöhle, J.; Gebauer-Teichmann, A.; Rie, K.-T.
Journal Article
2000Deposition and characterization of nanocrystalline diamond films prepared by ion bombardement-assisted method
Gu, C.Z.; Jiang, X.
Journal Article
2000Deposition of TiCN and ZrCN layers on light metals by PACVD method using radio frequency and pulsed-DC plasma
Wöhle, J.; Pfohl, C.; Rie, K.-T.; Gebauer-Teichmann, A.; Kim, S.K.
Journal Article
1999Plasma-CVD of TiCN and ZrCN films on light metals
Rie, K.-T.; Wöhle, J.
Journal Article
1997Improved current-voltage characteristics of downstream plasma enhanced chemical vapor deposition SiNx deposited at low temperature by using He as a dilution gas
Arps, M.; Marlowitz, A.
Journal Article
1997Metallization of polymers using plasma enhanced chemical vapor deposited titanium nitride as interlayer
Weber, A.; Dietz, A.; Pöckelmann, R.; Klages, C.-P.
Journal Article
1993Influence of plasma activation on the deposition of Ti, TiN and Cu using metalorganic compounds
Weber, A.; Nikulski, R.; Bringmann, U.; Gernhuber, M.; Pöckelmann, R.; Klages, C.-P.
Conference Paper
1992Diamond membranes for X-ray masks
Löchel, B.; Schliwinski, H.-J.; Huber, H.-L.; Trube, J.; Klages, C.-P.; Lüthje, H.; Schäfer, L.
Journal Article