Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2012Advanced mask aligner lithography (AMALITH)
Völkel, R.; Vogler, U.; Bramati, A.; Weichelt, T.; Stürzebecher, L.; Zeitner, U.D.; Motzek, K.; Erdmann, A.; Hornung, M.; Zoberbier, R.
Conference Paper
2012Novel gap alignment sensor for high-resolution proximity lithography
Harzendorf, Torsten; Stürzebecher, Lorenz; Zeitner, Uwe Detlef
Conference Paper
2012Wafer scale fabrication of submicron chessboard gratings using phase masks in proximity lithography
Stürzebecher, Lorenz; Harzendorf, T.; Fuchs, F.; Zeitner, U.D.
Conference Paper
2011Computational algorithms for optimizing mask layouts in proximity printing
Motzek, K.; Vogler, U.; Hennemeyer, M.; Hornung, M.; Voelkel, R.; Erdmann, A.; Meliorisz, B.
Journal Article
2011Mask aligner process enhancement by spatial filtering
Vogler, U.; Bich, A.; Voelkel, R.; Stürzebecher, L.; Zeitner, U.D.; Hornung, M.
Conference Paper
2010Half-tone proximity lithography
Harzendorf, T.; Stürzebecher, L.; Vogler, U.; Zeitner, U.; Völkel, R.
Conference Paper
2010Optimization of illumination pupils and mask structures for proximity printing
Motzek, K.; Bich, A.; Erdmann, A.; Hornung, M.; Hennemeyer, M.; Meliorisz, B.; Hofmann, U.; Ünal, N.; Völkel, R.; Partel, S.; Hudek, P.
Conference Paper