Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2014Compact mask models for optical projection lithography
Agudelo Moreno, Viviana
: Erdmann, Andreas
Dissertation
2012Efficient simulation of EUV multilayer defects with rigorous data base approach
Evanschitzky, Peter; Shao, Feng; Erdmann, Andreas
Conference Paper
2011Compensation of mask induced aberrations by projector wavefront control
Evanschitzky, Peter; Shao, Feng; Fühner, Tim; Erdmann, Andreas
Conference Paper
2011Image simulation of projection systems in photolithography
Evanschitzky, Peter; Fühner, Tim; Erdmann, Andreas
Conference Paper
2011Modeling of mask diffraction and projection imaging for advanced optical and EUV lithography
Erdmann, A.; Shao, F.; Agudelo, V.; Fühner, T.; Evanschitzky, P.
Journal Article
2011Predictive modeling of EUV-lithography: The role of mask, optics, and photoresist effects
Erdmann, A.; Evanschitzky, P.; Shao, F.; Fühner, T.; Lorusso, G.; Hendrickx, E.; Goethals, A.M.; Jonckheere, R.; Bret, T.; Hofmann, T.
Conference Paper
2011The waveguide electromagnetic field solver and its extension and application to lithography simulation
Shao, Feng
Dissertation
2010Fast and highly accurate simulation of the printing behavior of EUV multilayer defects based on different models
Shao, F.; Evanschitzky, P.; Motzek, K.; Erdmann, A.
Conference Paper
2010Modeling of double patterning interactions in litho-cure-litho-etch (LCLE) processes
Erdmann, A.; Shao, F.; Fuhrmann, J.; Fiebach, A.; Patsis, G.P.; Trefonas, P.
Conference Paper
2010Modeling of exploration of reversible contrast enhacement layers for double exposure lithography
Shao, F.; Cooper, G.D.; Chen, Z.; Erdmann, A.
Conference Paper
2010Topography-aware BARC optimization for double patterning
Liu, S.; Fühner, T.; Shao, F.; Barenbaum, A.; Jahn, J.; Erdmann, A.
Conference Paper
2009Extended Abbe approach for fast and accurate lithography imaging simulations
Evanschitzky, P.; Erdmann, A.; Fühner, T.
Conference Paper
2009Impact of lithography variations on advanced CMOS devices
Lorenz, J.; Kampen, C.; Burenkov, A.; Fühner, T.
Conference Paper
2009Lithography simulation: Modeling techniques and selected applications
Erdmann, A.; Fühner, T.; Shao, F.; Evanschitzky, P.
Conference Paper
2008Increasing the predictability of AIMSTM measurements by coupling to resist simulations
Meliorisz, B.; Erdmann, A.; Schnattinger, T.; Strößner, U.; Scherübl, T.; Bisschop, P. de; Philipsen, V.
Conference Paper
2008Optimization of mask absorber stacks and illumination settings for contact hole imaging
Erdmann, A.; Fühner, T.; Evanschitzky, P.
Conference Paper
2008Rigorous electromagnetic field simulation of two-beam interference exposures for the exploration of double patterning and double exposure scenarios
Erdmann, A.; Evanschitzky, P.; Fühner, T.; Schnattinger, T.; Xu, C.B.; Szmanda, C.
Conference Paper
2006Accurate extraction of maximum current densities from the layout
Seidl, A.; Schnattinger, T.; Erdmann, A.; Hartmann, H.; Petrashenko, A.
Conference Paper, Journal Article
2006Mesoscopic resist processing simulation in optical lithography
Schnattinger, T.; Bär, E.; Erdmann, A.
Conference Paper
2006Three-dimensional resist development simulation with discrete models
Schnattinger, T.; Baer, E.; Erdmann, A.
Journal Article
2004Genetic algorithm for optimization and calibration in process simulation
Fühner, T.; Erdmann, A.; Ortiz, C.J.; Lorenz, J.
Conference Paper
2004Process optimization using lithography simulation
Erdmann, A.
Conference Paper
2004Simulation is essential to successful design of modern semiconductors
Erdmann, A.
Journal Article
2002Enhancements in rigorous simulation of light diffraction from phase-shift masks
Erdmann, A.; Kachwala, N.
Conference Paper
2001Comparison of simulation approaches for chemically amplified resists
Erdmann, A.; Henke, W.; Robertson, S.; Richter, E.; Tollkühn, B.; Hoppe, W.
Conference Paper
2000Rigorous diffraction analysis for future mask technology
Erdmann, A.; Friedrich, C.
Conference Paper
1998Lithographic process simulation for scanners
Erdmann, A.; Arnz, M.; Maenhoudt, M.; Baselmans, J.; Osnabrugge, J.C. van
Conference Paper