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| 2012 | Significant on-resistance reduction of LDMOS devices by intermitted trench gates integration
Erlbacher, Tobias; Bauer, Anton J.; Frey, Lothar | Journal Article |
| 2011 | High-speed selector-driver using abrupt delta-doped InP/InGaAs/InP DHBTs
Driad, R.; Makon, R.E.; Ritter, D. | Journal Article |
| 2011 | InP DHBT-based IC technology for 100-Gb/s ethernet
Driad, R.; Rosenzweig, J.; Makon, R.E.; Lösch, R.; Hurm, V.; Walcher, H.; Schlechtweg, M. | Journal Article |
| 2011 | Ultra-high-speed transmitter and receiver ICs for 100 Gbit/s ethernet using InP DHBTs
Makon, R.E.; Driad, R.; Rosenzweig, J.; Hurm, V.; Walcher, H.; Schlechtweg, M.; Ambacher, O.; Schubert, C. | Conference Paper |
| 2002 | Optoelectronic/photonic integrated circuits on InP between technological feasibility and commercial success
Kaiser, R.; Heidrich, H. | Journal Article |
| 1998 | 50 Gbit/s InP-based photoreceiver OEIC with gain flattened transfer characteristics
Bach, H.G.; Schlaak, W.; Mekonnen, G.G.; Steingrüber, R.; Seeger, A.; Engel, T.; Passenberg, W.; Umbach, A.; Schramm, C.; Unterborsch, G. | Conference Paper |
| 1998 | Full-duplex WDM transceiver PICs
Hamacher, M.; Heidrich, H.; Kaiser, R.; Albrecht, P.; Ebert, W.; Malchow, S.; Möhrle, M.; Rehbein, W.; Schroeter-Janssen, H.; Stenzel, R. | Conference Paper |
| 1995 | Active silicon CMOS addressing matrices for light-valve projection displays
Molzow, W.-D.; Brinker, W.; Wirges, W.; Gerhard-Multhaupt, R.; Melcher, R.; Budde, W.; Fiedler, H. | Journal Article |
| 1995 | Photonic ICs await their utilisation
Heidrich, H. | Journal Article |
| 1994 | Direct write pattern placement accuracy for E-beam nanolithography
Reimer, K.; Ehrlich, C.; Köhler, C.; Brünger, W.H. | Journal Article |
| 1994 | OEIC on indium phosphide: key components for future photonic networks
Heidrich, H. | Journal Article |
| 1993 | Impact of chuck flatness on wafer distortion and stepper overlay
Simon, K.; Huber, H.-L.; Gabeli, F.; Scheunemann, H.U. | Conference Paper |
| 1993 | Silicon microsystems
Heuberger, A. | Journal Article |
| 1991 | Modelling of illumination effects on resist profiles in X-ray lithography
Oertel, H.; Weiß, M.; Huber, H.-L.; Vladimirsky, Y.; Maldonado, J.R. | Conference Paper |
| 1991 | Thickness inhomogeneity during silicon X-ray mask membrane fabrication: generation and prevention
Löchel, B.; Macioßek, A.; Huber, H.-L.; König, M. | Journal Article |
| 1990 | Dry chemical etching processes for the production of InP-based components
Niggebrugge, U.; Muller, R. | Conference Paper |
| 1990 | Infrared-measurement of X-ray mask heating during SR-lithography
Trube, J.; Huber, H.-L.; Mourikis, S.; Koch, E.E.; Bernstoff, S. | Journal Article |
| 1990 | Ion projection lithography - electronic alignment and dry development of IPL exposed resist materials
Buchmann, L.-M.; Heuberger, A.; Fallmann, W.; Paschke, F.; Stangl, G.; Chalupka, A.; Fegerl, J.; Löschner, H.; Malek, L.; Nowak, R.; Stengl, G.; Traher, C.; Wolf, P.; Fischer, R. | Journal Article |
| 1989 | Microstructuring in semiconductor technology
Mader, H. | Journal Article |
| 1986 | ArF laser induced lift-off process
Moerl, L. | Journal Article |