Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2011Light switched plasma charging protection device for high-field characterization and flash memory protection
Sommer, S.P.; Paschen, U.; Figge, M.; Vogt, H.
Journal Article
2002Influence of photoresist pattern on charging damage during high current ion implantation
Dirnecker, T.; Ruf, A.; Frey, L.; Beyer, A.; Bauer, A.J.; Henke, D.; Ryssel, H.
Conference Paper
2000Charakterisierung dünner Gate- und Tunneloxide in CMOS-Prozessen
Specht, M.
Thesis
1997Characterization of ultrathin on stacked layers consisting of thermally grown bottom oxide and deposited silicon nitride
Bauer, A.J.; Burte, E.P.; Ryssel, H.
Journal Article
1997A novel XPS system for integration into advanced semiconductor equipment for in-line process control
Kasko, I.; Oechsner, R.; Schneider, C.; Pfitzner, L.; Ryssel, H.; Trubitsyn, A.A.; Kratenko, V.I.
Conference Paper
1996Characterization of ultrathin on stacked layers consisting of thermally grown bottom oxide and deposited silicon nitride
Bauer, A.J.; Burte, E.P.; Ryssel, H.
Journal Article
1996High quality 4 nm gate dielectrics prepared at low pressure in oxygen oxide atmospheres
Bauer, A.J.; Burte, E.P.
Conference Paper