Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2002Ensuring long term stability of process and film parameters during target lifetime in reactive magnetron sputtering
Bartzsch, H.; Frach, P.; Goedicke, K.; Böcher, B.; Gottfried, C.
Conference Paper
2002Growth of Ag films on PET deposited by magnetron sputtering
Charton, C.; Fahland, M.
Journal Article
2002Investigation of long throw PVD of titanium films from polycrystalline targets with texture
Wolf, H.; Streiter, R.; Tirschler, W.; Giegengack, H.; Urbansky, N.; Gessner, T.
Journal Article
2002Manufacture of specific structure of aluminum-doped zinc oxide films by patterning the substrate surface
Jiang, X.; Jia, C.L.; Szyszka, B.
Journal Article
2002Überwachung und Steuerung von Lackierprozessen - Pulverlackbeschichtung - Übersicht
Cudazzo, M.; Pulli, K.; Strohbeck, U.
Conference Paper
1998Oxide layer thickness measurement
Schneider, C.
Journal Article
1997Surface preparation for molecular beam epitaxy-regrowth on metalorganic vapour phase epitaxy grown InP and InGaAsP layers
Passenberg, W.; Schlaak, W.
Journal Article
1996Temperature measurement at RTP facilities. An overview
Wagner, J.; Böbel, F.G.
Conference Paper
1995In situ film thickness and temperature control of molecular beam epitaxy growth by pyrometric interferometry
Böbel, F.G.; Möller, H.; Hertel, B.; Grothe, H.; Schraud, G.; Schröder, S.; Chow, P.
Journal Article
1995In situ observation of chemical vapour deposition growth of epitaxial SiGe thin films by reflexion supported pyrometric interferometry
Ritter, G.; Tillack, B.; Weidner, M.; Zaumseil, P.; Böbel, F.G.; Hertel, B.; Möller, H.
Conference Paper
1995Pyrometrische Interferometrie. Ein neues Meßverfahren zur in-situ-Prozeßkontrolle
Böbel, F.G.
Dissertation
1995Temperature controlling with reflection supported interferometry (RSPI) at rapid thermal chemical vapor deposition-facilities (RTCVD)
Märitz, J.; Möller, H.; Böbel, F.G.; Ritter, G.; Weusthof, M.H.H.; Hollemann, J.
Conference Paper
1994Bestimmung des E-Moduls dünner Schichten mit Ultraschalloberflächenwellen
Schneider, D.; Schultrich, B.; Scheibe, H.J.
Conference Paper
1994In situ film-thickness and temperature monitor
Böbel, F.G.; Möller, H.; Hertel, B.; Ritter, G.; Chow, P.
Journal Article
1993Compositional analysis of molecular beam epitaxy grown InyGa1-yAs/GaAs/AlxGa1-xAs quantum wells by determination of film thickness.
Maier, M.; Köhler, K.; Höpner, A.; As, D.J.
Journal Article
1993Elektronenstrahl-Mikroanalyse zur Charakterisierung dünner Schichten
Willich, P.; Bethke, R.; Schiffmann, K.I.
Journal Article
1992Programs for data processing of electron probe microanalysis applied to thin films and multilayers
Willich, P.; Schiffmann, K.I.
Conference Paper
1991Interface characterization by C-V- measurements of three-terminal MOSOS capacitors
Abel, H.B.; Badenes, G.
Conference Paper