Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2000MOVPE-based in situ etching of In(GaAs)P/InP using tertiarybutylchloride
Wolfram, P.; Ebert, W.; Kreissl, J.; Grote, N.
Journal Article
1990Anisotropic etching of crystalline silicon in alkaline solutions
Seidel, H.; Csepregi, L.; Heuberger, A.; Baumgärtel, H.
Journal Article
1987Plasma mass spectrometric analysis and control of reactive ion etching of InP and related compounds
Schmid, H.
Conference Paper