Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2015Modeling of the electrochemical etch stop with high reverse bias across pn-junctions
Szwarc, Robert; Frey, Lothar; Weber, Hans; Moder, Iris; Erlbacher, Tobias; Rommel, Mathias; Bauer, Anton J.
Presentation
2005Etch stop materials for release by vapor HF etching
Bakke, T.; Schmidt, J.; Friedrichs, M.; Völker, B.
Conference Paper
1998Dielectric multilayer grating designs with maximum diffraction efficiencies
Frank, M.; Collischon, N.M.
Journal Article
1996Microstructured multilayer dielectric coatings with binary optical functions
Frank, M.; Schallenberg, U.B.; Kaiser, N.
Conference Paper
1995Nitrogen implanted etch-stop layers in silicon
Paneva, R.; Temmel, G.; Ryssel, H.; Burte, E.P.
Journal Article
1992SIMOX, an efficient etch-stop to fabricate silicon membranes with well defined thickness. Part 1
Dura, H.-G.; Gassel, H.; Mokwa, W.; Vogt, H.
Conference Paper
1992SIMOX, an efficient etch-stop to fabricate silicon membranes with well defined thickness. Part 2
Dura, H.-G.; Gassel, H.; Mokwa, W.; Vogt, H.
Conference Paper