Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2012Investigations into an electrostatic chuck design for 450mm Si wafer
Kalkowski, Gerhard; Peschel, Thomas; Hassall, Geoffrey; Risse, Stefan
Conference Paper
2011Electrostatic clamping with an EUVL mask chuck: Particle issues
Kalkowski, G.; Zeuske, J.R.; Risse, S.; Müller, S.; Peschel, T.; Rohde, M.
Journal Article, Conference Paper
2010Determination of local electrostatic forces for EUVL mask chucks
Kalkowski, G.; Peschel, T.; Risse, S.; Müller, S.; Engelstad, R.L.; Zeuske, J.R.; Vukkadala, P.
Conference Paper, Journal Article
2010Electrostatic chucking of EUVL masks: Coefficients of friction
Kalkowski, G.; Semmler, C.; Risse, S.; Peschel, T.; Damm, C.; Müller, S.; Bauer, R.
Conference Paper
2007Flatness characterization of EUV mask chucks
Kalkowski, G.; Risse, S.; Müller, S.
Conference Paper, Journal Article
2002Electrostatic chuck behaviour at ambient conditions
Kalkowski, G.; Risse, S.; Guyenot, V.
Journal Article
2001Electrostatic chucks for lithography applications
Kalkowski, G.; Risse, S.; Harnisch, G.; Guyenot, V.
Journal Article
2001Wafer stage assembly for ion projection lithography
Damm, C.; Peschel, T.; Risse, S.; Kirschstein, U.
Journal Article
1999A new metrology stage for Ion Projection Lithography made of glass ceramics
Risse, S.; Peschel, T.; Damm, C.; Kirschstein, U.
Conference Paper