Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2014Effective corner rounding correction in the data preparation of electron beam lithography
Choi, Kang-Hoon; Browning, Clyde; Figueiro, Thiago; Hohle, Christoph; Kaiser, Michael; Schiavone, Patrick
Conference Paper
2014Fast character projection electron beam lithography for diffractive optical elements
Harzendorf, Torsten; Fuchs, Frank; Banasch, Michael; Zeitner, Uwe Detlef
Conference Paper
2014Plasmonic heating with near infrared resonance nanodot arrays for multiplexing optofluidic applications
Steinbrück, Andrea; Choi, J.W.; Fasold, Stefan; Menzel, Christoph; Sergeyev, Anton; Grange, Rachel
Journal Article
2013Exploiting extreme coupling to realize a metamaterial perfect absorber
Huebner, Uwe; Pshenay-Severin, Ekaterina; Alaee, Rasoul; Menzel, Christoph; Ziegler, Mario; Rockstuhl, Carsten; Lederer, Falk; Pertsch, Thomas; Meyer, Hans-Georg; Popp, Juergen
Journal Article
2012Enhanced e-beam pattern writing for nano-optics based on character projection
Kley, Ernst-Bernhard; Schmidt, Holger; Zeitner, Uwe; Banasch, Michael; Schnabel, Bernd
Conference Paper
2012Packaging technology of multi deflection arrays for multi-shaped beam lithography
Burkhardt, T.; Mohaupt, M.; Hornaff, M.; Zaage, B.; Beckert, E.; Döring, H.-J.; Slodowski, M.; Reimer, K.; Witt, M.; Eberhardt, R.; Tünnermann, A.
Conference Paper
2012Precision assembly of a miniaturized wire deflector for electron-beam lithography
Risse, Stefan; Damm, Christoph; Hornaff, Marcel; Kamm, Andreas; Mohaupt, Matthias; Eberhardt, Ramona; Schmidt, Ingo; Ramm, Roland; Kühmstedt, Peter; Notni, Gunther; Döring, Hans-Joachim; Elster, Thomas; Kirschstein, Ulf Carsten; Schenk, Christoph
Conference Paper, Journal Article
2009High speed (greater-than 100 Gbps) key components for a scalable optical data link to be implemented in future maskless lithography applications
Paraskevopoulos, A.; Voss, S.-H.; Talmi, M.; Walf, G.
Conference Paper
2002Continuously chirped gratings for DFB-lasers fabricated by direct write electron-beam lithography
Steingrüber, R.; Wohrle, M.; Sigmund, A.; Furst, W.
Journal Article
2001Essential reduction of stitching errors in electron-beam lithography using a multiple exposure technique
Steingrüber, R.; Engel, H.; Lessle, W.
Conference Paper
2001Micro-optical elements fabricated by electron-beam lithography and dry etching technique using top conductive coatings
Steingrüber, R.; Ferstl, M.; Pilz, W.
Conference Paper, Journal Article
2000MOMBE selective infill growth of InP/GaInAs for quantum dot formation
Gibis, R.; Schelhase, S.; Steingrüber, R.; Urmann, G.; Kunzel, H.; Thiel, S.; Stier, O.; Bimberg, D.
Conference Paper, Journal Article
2000Three-dimensional microstructure elements fabricated by electron beam lithography and dry etching technique
Steingrüber, R.; Ferstl, M.
Conference Paper, Journal Article
199850 Gbit/s InP-based photoreceiver OEIC with gain flattened transfer characteristics
Bach, H.G.; Schlaak, W.; Mekonnen, G.G.; Steingrüber, R.; Seeger, A.; Engel, T.; Passenberg, W.; Umbach, A.; Schramm, C.; Unterborsch, G.
Conference Paper
1997Simultaneous exposure of filter gratings and waveguides by direct write electron-beam lithography
Steingrüber, R.; Hamacher, M.
Conference Paper, Journal Article
1995Application of smoothing techniques to relief-type resist surfaces generated by direct write electron-beam lithography
Engel, H.; Wengelink, J.; Steingrüber, R.
Conference Paper
1995Exposure and characterization of super structure gratings for DBR lasers generated by direct write electron-beam lithography
Steingrüber, R.; Engel, H.; Löffler, R.; Sakkas, C.
Conference Paper
1995Semitransparent mask technique for relief type surface topographies
Wengelink, J.; Engel, H.; Döldissen, W.
Conference Paper, Journal Article
1995Submicron InGaAs/InP MSM photodetectors for operation at 1.55 mu m
Umbach, A.; Droge, E.; Engel, H.; Bottcher, E.H.; Unterborsch, G.; Steingrüber, R.; Bimberg, D.
Conference Paper
1994Diffractive microlenses with antireflection coatings fabricated by thin film deposition
Pawlowski, E.; Engel, H.; Ferstl, M.; Furst, W.; Kuhlow, B.
Journal Article
1994Multi-level Fresnel zone lenses capable of being fabricated with only one binary mask
Kuhlow, B.; Ferstl, M.; Pawlowski, E.; Przyrembel, G.; Galloway, P.C.M.
Conference Paper
1993Blazed Fresnel zone lenses approximated by discrete step profiles: Effects of fabrication errors
Ferstl, M.; Kuhlow, B.; Pawlowski, E.
Conference Paper
1993Thin film deposition: An alternative technique for the fabrication of binary optics with high efficiency
Pawlowski, E.
Conference Paper
1993Two dimensional array of AR-coated diffractive microlenses fabricated by thin film deposition
Pawlowski, E.; Engel, H.; Ferstl, M.; Furst, W.; Kuhlow, B.
Conference Paper
1993Two-dimensional arrays of diffractive microlenses for optical interconnects
Kuhlow, B.; Pawlowski, E.; Ferstl, M.
Conference Paper
1991E-beam lithography for the microfabrication of OEICs
Engel, H.; Doldissen, W.
Conference Paper
1990E-beam direct-write in a dry-etched recess gate HEMT process for GaAs/AlGaAs circuits
Hülsmann, A.; Kaufel, G.; Raynor, B.; Schneider, J.; Jakobus, T.; Köhler, K.
Journal Article
1989Multi-beam concepts for nanometer devices
Lischke, B.; Brunner, M.; Herrmann, K.H.; Heuberger, A.; Knapek, E.; Schnakenberg, U.; Bennecke, W.; Schäfer, P.
Journal Article