Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2014High-refractive-index gratings for spectroscopic and laser applications
Zeitner, Uwe Detlef; Fuchs, Frank; Kley, Ernst-Bernhard; Tünnermann, Andreas
Conference Paper
2012High aspect ratio deep UV wire grid polarizer fabricated by double patterning
Weber, Thomas; Käsebier, Thomas; Szeghalmi, Adriana; Knez, Mato; Kley, Ernst-Bernhard; Tünnermann, Andreas
Journal Article, Conference Paper
2012High performance dielectric diffraction gratings for space applications
Zeitner, Uwe D.; Fuchs, Frank; Kley, Ernst-Bernhard
Conference Paper
2006Advanced lithography for micro-optics
Zeitner, U.D.; Kley, E.-B.
Conference Paper
2002Continuously chirped gratings for DFB-lasers fabricated by direct write electron-beam lithography
Steingrüber, R.; Wohrle, M.; Sigmund, A.; Furst, W.
Journal Article
199850 Gbit/s InP-based photoreceiver OEIC with gain flattened transfer characteristics
Bach, H.G.; Schlaak, W.; Mekonnen, G.G.; Steingrüber, R.; Seeger, A.; Engel, T.; Passenberg, W.; Umbach, A.; Schramm, C.; Unterborsch, G.
Conference Paper
1996Fast layout data processing and repetitive structure exposure for high throughput e-beam lithography
Gramms, J.; Eichhorn, H.; Baetz, U.
Conference Paper
19940.15 mym T-gate e-beam lithography using crosslinked P/MMA/MAA developed in ortho-xylene resulting in high contrast and high plasma stability for dry etched recess gate pseudomorphic MODFETs for MMIC production
Hülsmann, A.; Mühlfriedel, E.; Raynor, B.; Glorer, K.; Bronner, W.; Köhler, K.; Schneider, J.; Braunstein, J.; Schlechtweg, M.; Tasker, P.J.; Thiede, A.; Jakobus, T.
Journal Article
1994Fabrication of high speed MMICs and digital ICs using T-gate technology on pseudomorphic-HEMT structures
Hülsmann, A.; Bronner, W.; Hofmann, P.; Köhler, K.; Raynor, B.; Schneider, J.; Braunstein, J.; Schlechtweg, M.; Tasker, P.J.; Thiede, A.; Jakobus, T.
Conference Paper
1993Stability of an AlGaAs/GaAs/AlGaAsE/D-HEMT process with double pulse doping
Jakobus, T.; Bronner, W.; Hofmann, P.; Hülsmann, A.; Kaufel, G.; Köhler, K.; Landsberg, B.; Raynor, B.; Schneider, J.; Grün, N.; Windscheif, J.; Berroth, M.; Hornung, J.
Conference Paper
1992Mushroom shaped gates in a dry etched recessed gate process
Kaufel, G.; Hülsmann, A.; Raynor, B.; Hofmann, P.; Schneider, J.; Hornung, J.; Jakobus, T.; Berroth, M.; Köhler, K.
Conference Paper
1991Mushroom shaped gates defined by e-beam lithography down to 80 nm gate lengths and fabrication of pseudomorphic HEMTs with a dry-etched gate recess.
Hülsmann, A.; Kaufel, G.; Raynor, B.; Schweizer, T.; Braunstein, J.; Schlechtweg, M.; Tasker, P.; Jakobus, T.; Köhler, K.
Conference Paper
1989Overlay precision between electron beam and optical lithography systems for a mix and match GaAs technology.
Patrick, W.; Glorer, K.; Schneider, J.
Journal Article