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| 2017 | Accelerators and Industry
Chimielewski, Andrzei; Chiari, Massimo; Rögner, Frank-Holm | Book Article |
| 2012 | Enhanced e-beam pattern writing for nano-optics based on character projection
Kley, Ernst-Bernhard; Schmidt, Holger; Zeitner, Uwe; Banasch, Michael; Schnabel, Bernd | Conference Paper |
| 2011 | Electrostatic clamping with an EUVL mask chuck: Particle issues
Kalkowski, G.; Zeuske, J.R.; Risse, S.; Müller, S.; Peschel, T.; Rohde, M. | Journal Article, Conference Paper |
| 2011 | Variable-shaped e-beam lithography enabling process development for future copper damascene technology
Jaschinsky, P.; Erben, J.-W.; Choi, K.-H.; Schulze, K.; Gutsch, M.; Freitag, M.; Schulz, S.E.; Steidel, K.; Hohle, C.; Gessner, T.; Kücher, P. | Journal Article, Conference Paper |
| 2010 | Determination of local electrostatic forces for EUVL mask chucks
Kalkowski, G.; Peschel, T.; Risse, S.; Müller, S.; Engelstad, R.L.; Zeuske, J.R.; Vukkadala, P. | Conference Paper, Journal Article |
| 2000 | Electron-beam lithography data preparation based on multithreading MGS/PROXECCO
Eichhorn, H.; Lemke, M.; Gramss, J.; Bürger, B.; Bätz, U.; Belic, N.; Eisenmann, H. | Conference Paper |
| 1994 | Antiresonant reflecting optical waveguides in strip configuration
Gehler, J.; Bräuer, A.; Karthe, W. | Journal Article |
| 1994 | Remote coupling over 93 mym using ARROW waveguides in strip configuration
Gehler, J.; Bräuer, A.; Karthe, W. | Journal Article |
| 1991 | GaAs/AlGaAs HEMT's with sub 0.5 mym gatelength written by E-beam and recessed by dry-etching for direct-coupled FET logic -DCFL-
Hülsmann, A.; Kaufel, G.; Raynor, B.; Glorer, K.H.; Olander, E.; Weismann, B.; Schneider, J.; Jakobus, T.; Koehler, K. | Conference Paper |