Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2018Emitter Formation and Passivation Dependence on Crystal Grain Orientations after Atmospheric Pressure Dry Nanotexturing
Ridoy, A.I.; Kafle, B.; Saint-Cast, P.; Lohmüller, S.; Norouzi, M.H.; Clochard, L.; Duffy, E.; Hofmann, M.; Rentsch, J.; Preu, R.
Conference Paper
2017Resistless Ga+ beam lithography for flexible prototyping of nanostructures in different materials by reactive ion etching
Rommel, Mathias; Rumler, Maximilian; Haas, Anke; Beuer, Susanne
Presentation
2013Evaluation of an advanced dual hard mask stack for high resolution pattern transfer
Paul, Jan; Rudolph, M.; Riedel, S.; Thrun, X.; Wege, S.; Hohle, C.
Conference Paper
2012Novel industrial atmospheric pressure dry texturing procress for silicon solar cell improvement
Dresler, B.; Köhler, D.; Mäder, G.; Kaskel, S.; Beyer, E.; Clochard, L.; Duffy, E.; Kafle, B.; Hofmann, M.; Rentsch, J.
Conference Paper
2003Ultra thin ICs and MEMS elements. Techniques for wafer thinning, stress-free separation, assembly and interconnection
Feil, M.; Adler, C.; Klink, G.; König, M.; Landesberger, C.; Scherbaum, S.; Schwinn, G.; Spöhrle, H.
Journal Article
2001Micro-optical elements fabricated by electron-beam lithography and dry etching technique using top conductive coatings
Steingrüber, R.; Ferstl, M.; Pilz, W.
Conference Paper, Journal Article
2000Three-dimensional microstructure elements fabricated by electron beam lithography and dry etching technique
Steingrüber, R.; Ferstl, M.
Conference Paper, Journal Article
1999Chemically-assisted ion-beam etching of (AlGa)As/GaAs. Lattice damage and removal by in-situ Cl2 treatment
Daleiden, J.; Kiefer, R.; Klußmann, S.; Kunzer, M.; Manz, C.; Walther, M.; Braunstein, J.; Weimann, G.
Journal Article
1998MOMBE grown GaInAsP (lambda g=1.05/1.15 mu m) waveguide for laser integrated photonic ICs
Kuenzel, H.; Gibis, R.; Kizuki, H.; Albrecht, P.; Ebert, S.; Harde, P.; Malchow, S.; Kaiser, R.
Conference Paper, Journal Article
1997MBE regrowth of InP on patterned surfaces and its application potential for optoelectronic devices
Paraskevopoulos, A.; Kunzel, H.; Bottcher, J.; Urmann, G.; Hensel, H.J.; Bozbek, A.
Conference Paper
1997Micropatterned multilayer dielectric filters with two spectral characteristics
Frank, M.; Schallenberg, U.B.; Kaiser, N.
Journal Article
1997Simultaneous exposure of filter gratings and waveguides by direct write electron-beam lithography
Steingrüber, R.; Hamacher, M.
Conference Paper, Journal Article
1996Dry etching and micromachining of precision Silicon components
Kreutz, E.W.; Pfleging, W.; Jandeleit, J.; Urbasch, G.
Conference Paper
1996Dry etching of Hg(1-x)Cd(x)Te using CH4/H2/Ar/N2 electron cyclotron resonance plasmas
Keller, R.C.; Seelmann Eggebert, M.; Richter, H.J.
Journal Article
1996Microstructured multilayer dielectric coatings with binary optical functions
Frank, M.; Schallenberg, U.B.; Kaiser, N.
Conference Paper
1996MOMBE growth of high quality GaInAsP (lambda g=1.05 mu m) for waveguide applications
Kuenzel, H.; Albrecht, P.; Gibis, R.; Hamacher, M.; Schelhase, S.
Conference Paper, Journal Article
1995Dry etching of GaN at low pressure
Pletschen, W.; Niebuhr, R.; Bachem, K.H.
Conference Paper
1993In situ SIMS monitoring for ion beam etching of III-V semiconductor compounds and metal contacts
Hensel, H.J.; Paraskevopoulos, A.; Mörl, L.; Hase, A.; Böttcher, J.
Conference Paper
1993Integration of a quantum well laser with AlGaAs/GaAs-HEMT electronics.
Bronner, W.; Hornung, J.; Köhler, K.; Olander, E.; Wang, Z.-G.
Conference Paper
1993Stability of an AlGaAs/GaAs/AlGaAsE/D-HEMT process with double pulse doping
Jakobus, T.; Bronner, W.; Hofmann, P.; Hülsmann, A.; Kaufel, G.; Köhler, K.; Landsberg, B.; Raynor, B.; Schneider, J.; Grün, N.; Windscheif, J.; Berroth, M.; Hornung, J.
Conference Paper