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| 2011 | Current voltage characteristics through grains and grain boundaries of high-k dielectric thin films measured by tunneling atomic force microscopy
Murakami, Katsuhisa; Rommel, Mathias; Yanev, Vasil; Bauer, Anton J.; Frey, Lothar | Conference Paper |
| 2003 | Deep UV laser induced fluorescence in fluoride thin films
Heber, J.; Mühlig, C.; Triebel, W.; Danz, N.; Thielsch, R.; Kaiser, N. | Journal Article |
| 2003 | Some fundamentals of optical thin film growth
Kaiser, N. | Book Article |
| 2002 | 193 nm laser induced fluorescence in fluoride thin films
Heber, J.; Mühlig, C.; Triebel, W.; Danz, N.; Thielsch, R.; Kaiser, N. | Journal Article |
| 2002 | 193 nm laser induced luminescence in oxide thin films
Heber, J.; Mühlig, C.; Triebel, W.; Danz, N.; Thielsch, R.; Kaiser, N. | Journal Article |
| 2002 | Deep UV laser induced luminescence in oxide thin films
Heber, J.; Muhlig, C.; Triebel, W.; Danz, N.; Thielsch, R.; Kaiser, N. | Journal Article |
| 2001 | New Applications for Optical Coatings
Kaiser, N. | Book Article |
| 2001 | Optical Coatings for Ultraviolet Radiation
Kaiser, N. | Book Article |
| 1998 | Low dielectric constant materials for interlayer dielectric
Treichel, H.; Ruhl, G.; Ansmann, P.; Wurl, R.; Müller, C. | Journal Article |
| 1997 | Embedding technology - a chip-first approach using BCB
Töpper, M.; Buschick, K.; Wolf, J.; Glaw, V.; Hahn, R.; Dabek, A.; Ehrmann, O.; Reichl, H. | Conference Paper |
| 1997 | Improved current-voltage characteristics of downstream plasma enhanced chemical vapor deposition SiNx deposited at low temperature by using He as a dilution gas
Arps, M.; Marlowitz, A. | Journal Article |