Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2005High-density ECR-plasma deposited silicon nitride films for applications in III/V-based compound semiconductor devices
Sah, R.E.; Mikulla, M.; Baumann, H.; Benkhelifa, F.; Quay, R.; Weimann, G.
Conference Paper
2003Wet etching studies of silicon nitride thin films deposited by electron cyclotron resonance (ECR) plasma enhanced chemical vapor deposition
Sundaram, K.B.; Sah, R.E.; Baumann, H.; Balachandran, K.; Todi, R.M.
Journal Article
2002Review of the fundamentals of thin-film growth
Kaiser, N.
Journal Article
1996High quality 4 nm gate dielectrics prepared at low pressure in oxygen oxide atmospheres
Bauer, A.J.; Burte, E.P.
Journal Article