Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
20183D laser metal deposition: Process steps for additive manufacturing
Graf, Benjamin; Marko, Angelina; Petrat, Torsten; Gumenyuk, Andrey; Rethmeier, Michael
Journal Article
2014Increasing the carbon deposition rate using sputter yield amplification upon serial magnetron co-sputtering
Schmidt, R.M.; Ries, P.; Pflug, A.; Wuttig, M.; Kubart, T.
Journal Article
2013High-power-plasma PECVD of SiNx and Al2O3 for industrial solar cell manufacturing
Hofmann, M.; Kohn, N.; Schwarz, F.; Nölker, S.; Kastl, S.; Beckmann, R.; Ferré, R.; Pernau, T.; Trogus, D.; Kühnhold, S.; Saint-Cast, P.; Rentsch, J.
Conference Paper
2012Modelling of sputtering yield amplification in serial reactive magnetron co-sputtering
Kubart, T.; Schmidt, R.M.; Austgen, M.; Nyberg, T.; Pflug, A.; Siemers, M.; Wuttig, M.; Berg, S.
Journal Article
2011Deposition rate characteristics for steady state high power impulse magnetron sputtering (HIPIMS) discharges generated with a modulated pulsed power (MPP) generator
Papa, F.; Gerdes, H.; Bandorf, R.; Ehiasarian, A.P.; Kolev, I.; Bräuer, G.; Tietema, R.; Krug, T.
Journal Article, Conference Paper
2010Modelling of sputtering yield amplification effect in reactive deposition of oxides
Kubart, T.; Nyberg, T.; Pflug, A.; Siemers, M.; Austgen, M.; Koehl, D.; Wuttig, M.; Berg, S.
Journal Article
2007Experimental determination of the refractive index profile of rugate filters based on in situ measurements of transmission spectra
Wilbrandt, S.; Stenzel, O.; Kaiser, N.
Journal Article
2003Evaluation of deposition conditions to design plasma coatings like SiOx and a-C:H on polymers
Hegemann, D.; Brunner, H.; Oehr, C.
Journal Article, Conference Paper
2002C-Axis oriented AlN films prepared on diamond film substrate by electron cyclotron resonance plasma-enhanced chemical vapor deposition
Gong, H.; Jiang, X.
Journal Article
2002Ensuring long term stability of process and film parameters during target lifetime in reactive magnetron sputtering
Bartzsch, H.; Frach, P.; Goedicke, K.; Böcher, B.; Gottfried, C.
Conference Paper
2002Investigation of long throw PVD of titanium films from polycrystalline targets with texture
Wolf, H.; Streiter, R.; Tirschler, W.; Giegengack, H.; Urbansky, N.; Gessner, T.
Journal Article
2001Deposition rate and three-dimensional uniformity of RF plasma deposited SiOx films
Hegemann, D.; Brunner, H.; Oehr, C.
Journal Article
1997Deposition of SiOx Thin Films by Corona Discharges at Atmospheric Pressure
Thyen, R.; Weber, A.; Klages, C.-P.
Conference Paper
1992Einflußparameter für galvanisch erzeugte Nickeldispersionsschichten -Ni-SiC-
Mertz, K.; Gemmler, A.; Metzger, W.
Journal Article
1991Einflußparameter für galvanisch erzeugte Nickeldispersionsschichten -Ni-SiC-
Mertz, K.; Gemmler, A.; Metzger, W.
Conference Paper