Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2018Detailed characterisation of focused ion beam induced lateral damage on silicon carbide samples by electrical scanning probe microscopy and transmission electron microscopy
Stumpf, Florian; Abu Quba, A.A.; Singer, Philip; Rumler, Maximilian; Cherkashin, Nikolay; Schamm-Chardon, Sylvie; Cours, Robin; Rommel, Mathias
Journal Article
2018On the limits of scalpel AFM for the 3D electrical characterization of nanomaterials
Chen, Shaochuan; Jiang, Lanlan; Buckwell, Mark; Jing, Xu; Ji, Yanfeng; Grustan-Gutierrez, Enric; Hui, Fei; Shi, Yuanyuan; Rommel, Mathias; Paskaleva, Albena; Benstetter, Günther; Ng, Wing. H.; Mehonic, Adnan; Kenyon, Anthony J.; Lanza, Mario
Journal Article
2017Investigation of high-k dielectric stacks by C-AFM: Advantages, limitations, and possible applications
Rommel, Mathias; Paskaleva, Albena
Book Article
2014Nanoscale characterization of TiO2 films grown by atomic layer deposition on RuO2 electrodes
Murakami, Katsuhisa; Rommel, Mathias; Hudec, Boris; Rosová, Alica; Hušeková, Krístina; Dobročka, Edmund; Rammula, Raul; Kasikov, Arne; Han, Jeong Hwan; Lee, Woongkyu; Song, Seul Ji; Paskaleva, Albena; Bauer, Anton J.; Frey, Lothar; Fröhlich, Karol; Aarik, Jaan; Hwang, Cheol Seong
Journal Article
2013Influence of parasitic capacitances on conductive AFM I-V measurements and approaches for its reduction
Rommel, Mathias; Jambreck, Joachim D.; Lemberger, Martin; Bauer, Anton J.; Frey, Lothar; Murakami, Katsuhisa; Richter, Christoph; Weinzierl, Philipp
Journal Article
2012Approaches for the reduction of the influence of parasitic capacitances on local IV characteristics for conductive AFM
Rommel, Mathias; Jambreck, Joachim D.; Murakami, Katsuhisa; Lemberger, Martin; Richter, Christoph; Weinzierl, Philip; Bauer, Anton J.; Frey, Lothar
Presentation
2012Effect of HfO2 polycrystallinity on distribution of the CAFM-induced TDDB in high-k gate stacks
Iglesias, V.; Erlbacher, T.; Rommel, M.; Murakami, K.; Bauer, A.J.; Frey, L.; Porti, M.; Martin-Martinez, J.; Rodriguez, R.; Nafria, M.; Aymerich, X.; Bersuker, G.
Poster
2012Fabrication and application of shielded probes for conductive AFM measurements
Jambreck, Joachim D.; Rommel, Mathias; Richter, Christoph; Weinzierl, Philip; Bauer, Anton J.; Frey, Lothar
Poster
2012Nanoscale characterization of TiO2 films grown by atomic layer deposition
Murakami, Katsuhisa; Rommel, Mathias; Bauer, Anton J.; Frey, Lothar; Hudec, Boris; Rosova, A.; Hueková, K.; Fröhlich, Karol; Kasikov, A.; Ramula, R.; Aarik, J.; Han, J.H.; Han, S.; Lee, W.; Song, S.J.; Hwang, C.S.
Poster
2012TiO2-based metal-insulator-metal structures for future DRAM storage capacitors
Fröhlich, K.; Hudec, B.; Tapajna, M.; Hueková, K.; Rosova, A.; Eliá, P.; Aarik, J.; Rammula, R.; Kasikov, A.; Arroval, T.; Aarik, L.; Murakami, Katsuhisa; Rommel, Mathias; Bauer, Anton J.
Conference Paper
2011Current voltage characteristics through grains and grain boundaries of high-k dielectric thin films measured by tunneling atomic force microscopy
Murakami, K.; Rommel, M.; Yanev, V.; Bauer, A.J.; Frey, L.
Poster
2011Gate oxide reliability at the nano-scale evaluated by combining cAFM and CVS
Erlbacher, T.; Yanev, V.; Rommel, M.; Bauer, A.J.; Frey, L.
Journal Article, Conference Paper
2010Electrical scanning probe microscopy techniques for the detailed characterization of high-k dielectric layers
Rommel, M.; Yanev, V.; Paskaleva, A.; Erlbacher, T.; Lemberger, M.; Bauer, A.J.; Frey, L.
Conference Paper