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| 2013 | Anomalous impurity segregation and local bonding fluctuation in l-Si
Fisicaro, G.; Huet, K.; Negru, R.; Hackenberg, M.; Pichler, P.; Taleb, N.; La Magna, A. | Journal Article |
| 2013 | A comprehensive model for the diffusion of boron in silicon in presence of fluorine
Wolf, F. Alexander; Martinez-Limia, Alberto; Pichler, Peter | Journal Article |
| 2012 | Implantation-induced structural defects in highly activated USJs: Boron precipitation and trapping in pre-amorphised silicon
Cristiano, F.; Essa, Z.; Qiu, Y.; Spiegel, Y.; Torregrosa, F.; Duchaine, J.; Boulenc, P.; Tavernier, C.; Cojocaru, O.; Blavette, D.; Mangelinck, D.; Fazzini, P.F.; Quillec, M.; Bazizi, M.; Hackenberg, M.; Boninelli, S. | Conference Paper |
| 2012 | Modeling boron profiles in silicon after pulsed excimer laser annealing
Hackenberg, M.; Huet, K.; Negru, R.; Venturini, J.; Fisicaro, G.; La Magna, A.; Pichler, P. | Conference Paper |
| 2012 | Simulation of BF3 plasma immersion ion implantation into silicon
Burenkov, A.; Hahn, A.; Spiegel, Y.; Etienne, H.; Torregrosa, F. | Conference Paper |
| 2010 | Investigation of boron redistribution during silicidation in TiSi2 using atom probe tomography
Shariq, A.; Wedderhoff, K.; Kleint, C.; Teichert, S. | Abstract, Conference Paper |
| 2008 | On a computationally efficient approach to boron-interstitial clustering
Schermer, J.; Martinez-Limia, A.; Pichler, P.; Zechner, C.; Lerch, W.; Paul, S. | Journal Article, Conference Paper |
| 2008 | Process models for advanced annealing schemes and their use in device simulation
Pichler, P.; Martinez-Limia, A.; Kampen, C.; Burenkov, A.; Schermer, J.; Paul, S.; Lerch, W.; Gelpey, J.; McCoy, S.; Kheyrandish, H.; Pakfar, A.; Tavernier, C.; Bolze, D. | Conference Paper |
| 2007 | On a computationally efficient approach to Boron-interstitial clustering
Schermer, J.; Pichler, P.; Zechner, C.; Lerch, W.; Paul, S. | Conference Paper |
| 2007 | Stress development and impurity segregation during oxidation of the Si(100) surface
Cole, D.J.; Payne, M.C.; Colombi Ciacchi, L. | Journal Article |
| 2006 | Boron containing combination tool coatings - characterization and application tests
Keunecke, M.; Bewilogua, K.; Wiemann, E.; Weigel, K.; Wittorf, R.; Thomsen, H. | Journal Article |
| 2006 | Diffusion and activation of dopants in silicon and advanced silicon-based materials
Pichler, P.; Ortiz, C.J.; Colombeau, B.; Cowern, N.E.B.; Lampin, E.; Uppal, S.; Karunaratne, M.S.A.; Bonar, J.M.; Willoughby, A.F.W.; Claverie, A.; Cristiano, F.; Lerch, W.; Paul, S. | Journal Article |
| 2006 | Structure and thermoelectric properties of boron doped nanocrystalline Si0.8Ge0.2 thin film
Takashiri, M.; Borca-Tasciuc, T.; Jacquot, A.; Miyazaki, K.; Cheng, G. | Journal Article |
| 2005 | Advanced activation of ultra-shallow junctions using flash-assisted RTP
Lerch, W.; Paul, S.; Niess, J.; McCoy, S.; Selinger, T.; Gelpey, J.; Cristiano, F.; Severac, F.; Gavelle, M.; Boninelli, S.; Pichler, P.; Bolze, D. | Conference Paper, Journal Article |
| 2004 | Boron based and other combination tool coatings - characterization and application tests
Keunecke, M.; Wiemann, E.; Weber, M.; Thomsen, H.; Wittorf, R. | Conference Paper |
| 2004 | Electrical deactivation and diffusion of boron in preamorphized ultrashallow junctions: Interstitial transport and F co-implant control
Colombeau, B.; Smith, A.J.; Cowern, N.E.B.; Lerch, W.; Paul, S.; Pawlak, B.J.; Cristiano, F.; Hebras, X.; Bolze, D.; Ortiz, C.; Pichler, P. | Conference Paper |
| 2004 | On the modeling of transient diffusion and activation of boron during post-implantation annealing
Pichler, P.; Ortiz, C.J.; Colombeau, B.; Cowern, N.E.B.; Lampin, E.; Claverie, A.; Cristiano, F.; Lerch, W.; Paul, S. | Conference Paper |
| 2002 | Ultrahigh boron doping of nanocrystalline diamond films and their electron field emission characteristics
Jiang, X.; Au, F.C.K.; Lee, S.-T. | Journal Article |
| 1997 | Low energy implantation and transient enhanced diffusion
Cowern, N.E.B.; Collart, E.J.H.; Politiek, J.; Bancken, P.H.L.; Berkum, J.G.M. van; Kyllesbech Larsen, K.; Stolk, P.A.; Huizing, H.G.A.; Pichler, P.; Burenkov, A.; Gravensteijn, D.J. | Conference Paper |
| 1995 | Optical and electrical characterization of boron-doped diamond films
Locher, R.; Wagner, J.; Fuchs, F.; Maier, M.; Gonon, P.; Koidl, P. | Journal Article |
| 1994 | Analytical description of high energy implantation profiles of bordon and phosphorus into crystalline silicon
Gong, L.; Bogen, S.; Frey, L.; Jung, W.; Ryssel, H. | Journal Article |
| 1994 | On modeling of ion implantation at high temperatures
Pichler, P.; Schork, R. | Journal Article |
| 1993 | Electron probe microanalysis of submicron coatings containing ultralight elements
Willich, P.; Bethke, R. | Conference Paper |
| 1993 | High energy implantation of high10 B and high11 B into -100- silicon in channel and in random
Gong, L.; Frey, L.; Bogen, S.; Ryssel, H. | Journal Article |
| 1993 | Photon assisted implantation -PAI-
Biro, L.P.; Gyulai, J.; Ryssel, H.; Frey, L.; Kormany, T.; Tuan, N.M. | Journal Article |
| 1992 | Burning behaviour of gas generators with high Boron content.
Eisenreich, N.; Krause, H.H.; Menke, K.; Pfeil, A. | Journal Article |
| 1991 | Combustion of boron-based slurries in a ramburner
Liehmann, W. | Conference Paper |
| 1991 | Thickness inhomogeneity during silicon X-ray mask membrane fabrication: generation and prevention
Löchel, B.; Macioßek, A.; Huber, H.-L.; König, M. | Conference Paper |