Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2021Influence of substrate materials on nucleation and properties of iridium thin films grown by ALD
Schmitt, P.; Beladiya, V.; Felde, N.; Paul, P.; Otto, F.; Fritz, T.; Tünnermann, A.; Szeghalmi, A.
Journal Article
2021Influence of temperature and plasma parameters on the properties of PEALD HfO2
Lapteva, M.; Beladiya, V.; Riese, S.; Hanke, P.; Otto, F.; Fritz, T.; Schmitt, P.; Stenzel, O.; Tünnermann, A.; Szeghalmi, A.
Journal Article
2021Mechanical and optical properties of as-grown and thermally annealed titanium dioxide from titanium tetrachloride and water by atomic layer deposition
Ylivaara, Oili M.E.; Langner, Andreas; Liu, Xuwen; Schneider, Dieter; Julin, Jaakko; Arstila, Kai; Sintonen, Sakari; Ali, Saima; Lipsanen, Harri; Sajavaara, Timo; Hannula, Simo-Pekka; Puurunen, Riikka L.
Journal Article
2021Optical bandgap control in Al2O3/TiO2 heterostructures by plasma enhanced atomic layer deposition: Toward quantizing structures and tailored binary oxides
Paul, P.; Hafiz, M.G.; Schmitt, P.; Patzig, C.; Otto, F.; Fritz, T.; Tünnermann, A.; Szeghalmi, A.
Journal Article
2021Structural, optical, and mechanical properties of TiO2 nanolaminates
Ghazaryan, L.; Handa, S.; Schmitt, P.; Beladiya, V.; Roddatis, V.; Tünnermann, A.; Szeghalmi, A.
Journal Article
2020Effect of an electric field during the deposition of silicon dioxide thin films by plasma enhanced atomic layer deposition: An experimental and computational study
Beladiya, V.; Becker, M.; Faraz, T.; Kessels, W.M.M.; Schenk, P.; Otto, F.; Fritz, T.; Gruenewald, M.; Helbing, C.; Jandt, K.D.; Tünnermann, A.; Sierka, M.; Szeghalmi, A.
Journal Article
2020Tuneable Optical Properties in Al2O3/TiO2 Nanocomposites Fabricated by Atomic Layer Deposition (ALD)
Paul, P.; Hafiz, G.; Tünnermann, A.; Szeghalmi, A.
Conference Paper
2014ALD ZrO2 processes for BEoL device applications
Weinreich, Wenke; Seidel, Konrad; Polakowski, Patrick; Riedel, Stefan; Wilde, Lutz; Sundqvist, Jonas; Triyoso, Dina H.; Nolan, Mark G.
Conference Paper
2014Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion
Ylivaara, O.M.E.; Liu, X.; Kilpi, L.; Lyytinen, J.; Schneider, D.; Laitinen, M.; Julin, J.; Ali, S.; Sintonen, S.; Berdova, M.; Haimi, E.; Sajavaara, T.; Ronkainen, H.; Lipsanen, H.; Koskinen, J.; Hannula, S.-P.; Puurunen, R.L.
Journal Article
2014Densification of thin aluminum oxide films by thermal treatments
Cimalla, V.; Baeumler, M.; Kirste, L.; Prescher, M.; Christian, B.; Passow, T.; Benkhelifa, F.; Bernhardt, F.; Eichapfel, G.; Himmerlich, M.; Krischok, S.; Pezoldt, J.
Journal Article
2014An ultra-black silicon absorber
Steglich, Martin; Lehr, Dennis; Ratzsch, Stephan; Käsebier, Thomas; Schrempel, Frank; Kley, Ernst-Bernhard; Tünnermann, Andreas
Journal Article
2013Activation of Al2O3 passivation layers on silicon by microwave annealing
Ziegler, J.; Otto, M.; Sprafke, A.N.; Wehrspohn, R.B.
Journal Article
2013Detailed leakage current analysis of metal-insulator-metal capacitors with ZrO2, ZrO2/SiO2/ZrO2, and ZrO2/Al2O3/ZrO2 as dielectric and TiN electrodes
Weinreich, W.; Shariq, A.; Seidel, K.; Sundqvist, J.; Paskaleva, A.; Lemberger, M.; Bauer, A.J.
Journal Article
2013Evaluation of an advanced dual hard mask stack for high resolution pattern transfer
Paul, Jan; Rudolph, M.; Riedel, S.; Thrun, X.; Wege, S.; Hohle, C.
Conference Paper
2013Highly efficient broadband blazed grating in resonance domain
Oliva, Maria; Michaelis, Dirk; Fuchs, Frank; Tünnermann, Andreas; Zeitner, Uwe Detlef
Journal Article
2013Structural properties of as deposited and annealed ZrO2 influenced by atomic layer deposition, substrate, and doping
Weinreich, W.; Wilde, L.; Müller, J.; Sundqvist, J.; Erben, E.; Heitmann, J.; Lemberger, M.; Bauer, A.J.
Journal Article
2012Interface and material characterization of thin ALD-Al2O3 layers on crystalline silicon
Naumann, V.; Otto, M.; Wehrspohn, R.B.; Werner, M.; Hagendorf, C.
Journal Article
2011Atomic layer deposition of iridium thin films and their application in gold electrodeposition
Szeghalmi, A.; Arnold, M.; Berger, A.; Schammelt, N.; Füchsel, K.; Knez, M.; Kley, E.-B.; Zahn, D.R.T.; Tünnermann, A.
Conference Paper
2011Atomic layer deposition of ruthenium films from (Ethylcyclopentadienyl)(pyrrolyl)ruthenium and oxygen
Kukli, K.; Kemeli, M.; Puukilainen, E.; Aarik, J.; Aidla, A.; Sjavaara, T.; Laitinen, M.; Tallarida, M.; Sundqvist, J.; Ritala, M.; Leskela, M.
Journal Article
2009Greatly increased toughness of infiltrated spider silk
Lee, S.-M.; Pippel, E.; Gösele, U.; Dresbach, C.; Qin, Y.; Chandran, C.V.; Bräuniger, T.; Hause, G.; Knez, M.
Journal Article
2009Low-temperature ZnO atomic layer deposition on biotemplates
Lee, S.-M.; Grass, G.; Kim, G.-M.; Dresbach, C.; Zhang, L.; Gösele, U.; Knez, M.
Journal Article