Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
1993Diamond membranes with controlled stress for submicron lithography
Bluhm, A.; Löchel, B.; Buchmann, L.-M.; Huber, H.-L.; Klages, C.-P.; Schäfer, L.
Journal Article, Conference Paper
1992Diamond membranes for X-ray masks
Löchel, B.; Schliwinski, H.-J.; Huber, H.-L.; Trube, J.; Klages, C.-P.; Lüthje, H.; Schäfer, L.
Conference Paper
1989Repetitive plasma focus as radiation source for X-ray lithography.
Richter, F.; Eberle, J.; Holz, R.; Neff, W.; Lebert, R.
Conference Paper
1988Laser-induced metal deposition for clear defect repair work on X-ray masks
Putzar, R.; Petzold, H.-C.; Weigmann, U.
Conference Paper
1988X-ray lithography
Heuberger, A.
Journal Article
1987Fabrication of halfmicron MOSFETs by means of X-ray lithography
Huber, H.-L.; Lauer, V.; Bauer, F.; Korec, J.; Balk, P.
Journal Article
1987Half micrometer N-MOS technology using X-ray lithography
Huber, H.-L.; Lauer, V.; Bauer, F.; Korec, J.; Balk, P.
Conference Paper
1987Influence of phase shift on pattern transfer in X-rax lithography
Oertel, H.; Huber, H.-L.; Weiß, M.
Journal Article
1987The influence of photoelectronics and fluorescence radiation on resolution in X-rax lithography
Chlebek, J.; Heuberger, A.; Huber, H.-L.; Betz, H.
Journal Article
1987Maskenherstellung mit Hilfe der Mikromechanik
Csepregi, L.
Conference Paper
1987Photocatalytic novolak - based positive resist for X-ray lithography - kinetics and simulation
Huber, H.-L.; Oertel, H.; Dössel, K.F.; Dammel, R.; Lingnau, J.; Theis, J.
Journal Article
1987Reparatur von Röntgenmasken mit Ionenstrahlen
Weigmann, U.
Conference Paper
1987Technologie der Röntgenmasken
Pongratz, S.
Journal Article
1987Temperaturänderungen von Silizium-Membranen durch Absorption von Röntgenstrahlung
Trube, J.; Huber, H.-L.
Abstract