Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2015Mobile Plasmaquelle jetzt industriereif
Kotte, Liliana; Roch, Julius; Mäder, Gerrit
Journal Article
2011Aktivierung und Beschichtung von Partikeln durch Atmosphärendruck-Plasmen
Baalmann, A.; Ihde, J.; Keil, A.; Kolacyak, D.; Lommatzsch, U.; Lukasczyk, T.; Wilken, R.
Conference Paper
2011Industrielle ta-C-Beschichtungen für Komponenten und Werkzeuge
Weihnacht, V.; Scheibe, H.-J.; Falz, M.
Conference Paper
2008Cr(6+)-free hybrid coatings as potential pretreatment for structural adhesive bonding
Bringmann, P.; Rohr, O.; Wehr, J.; Jansen, I.
Conference Paper
2006Mit neuem Verfahren einfacher und schneller entlacken
Hügle, W.; Ott, M.
Journal Article
2005Easy-to-clean coatings produced by high-rate pulse magnetron sputtering and plasma-activated evaporation
Glöß, D.; Frach, P.; Metzner, C.; Modes, T.; Zywitzki, O.; Scheffel, B.
Conference Paper
2005Passivation of III-V-based compound semiconductor devices using high-density plasma deposited silicon nitride films
Sah, R.E.; Mikulla, M.; Schneider, H.; Benkhelifa, F.; Dammann, M.; Quay, R.; Fleißner, J.; Walther, M.; Weimann, G.
Conference Paper
1999Simulation and development of optimized microwave plasma reactors for diamond deposition
Füner, M.; Wild, C.; Koidl, P.
Journal Article
1998Large area microwave-plasma CVD of diamond wafers for optical and thermal applications
Koidl, P.; Wild, C.; Füner, M.; Wörner, E.; Müller-Sebert, W.
Conference Paper
1997ECR-plasma deposited oxygen-free SiN(x) films for low- and high-reflectivity coatings for GaAs based devices
Sah, R.E.; Weimar, U.; Baumann, H.; Wagner, J.; Kiefer, R.; Müller, S.
Conference Paper
1996Homoepitaxial growth of CVD diamond: effect of nitrogen contaminations on growth rates
Wild, C.; Locher, R.; Koidl, P.
Book Article
1991Amorphous, hydrogenated carbon films and related materials - plasma deposition and film properties
Locher, R.; Sah, R.E.; Koidl, P.; Wild, C.
Book Article
1991Direct ion-beam deposition of amorphous hydrogenated carbon films.
Locher, R.; Koidl, P.; Wild, C.
Journal Article
1989Critical assessment of diamondlike carbon.
Koidl, P.
Conference Paper
1989Plasma deposition, properties and structure of amorphous hydrogenated carbon films.
Dischler, B.; Koidl, P.; Ramsteiner, M.; Wagner, J.; Wild, C.
Journal Article
1987Composition and structure of plasma deposited a-C - H,F films
Fink, J.; Nücker, N.; Sah, R.E.; Baumann, H.; Bethge, K.; Koidl, P.
Conference Paper
1987Network structure and thermal decomposition of plasma deposited a-C/H films studied by gas effusion spectroscopy
Koidl, P.; Wild, C.
Conference Paper
1987Plasma deposition of a-C/H films - the role of process gas, plasma chemistry and plasma surface interaction
Koidl, P.; Wagner, J.; Wild, C.
Conference Paper
1987Process monitoring of a-C-H plasma deposition
Koidl, P.; Wagner, J.; Wild, C.
Journal Article
1986Characterization hydrocarbon plasma used for a-C-H deposition
Bubenzer, A.; Koidl, P.; Wagner, J.; Wild, C.
Conference Paper
1985Infrared and raman analysis of hydrogenated amorphous carbon films, prepared by R.F. plasma deposition from C6H6 or C6D6 vapour
Sah, R.E.; Fluhr, W.; Wokaun, A.; Dischler, B.; Koidl, P.
Conference Paper
1981Hydrogen content and mechanical stress in glow discharge amorphous silicon
Paduschek, P.; Eichinger, P.; Kristen, G.; Mitlehner, H.
Conference Paper