Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2017Characterizing the degradation of PDMS stamps in nanoimprint lithography
Tucher, N.; Höhn, O.; Hauser, H.; Müller, C.; Bläsi, B.
Journal Article
2017Nanoscale patterning of self-assembled monolayer (SAM)-functionalised substrates with single molecule contact printing
Sajfutdinow, Martin; Uhlig, Katja; Prager, Andrea; Schneider, C.; Abel, Bernd; Smith, David M.
Journal Article
20163D simulation of light exposure and resist effects in laser direct write lithography
Onanuga, Temitope; Erdmann, Andreas
Conference Paper
2016Nanoparticle Scattering for Multijunction Solar Cells: The Tradeoff between Absorption Enhancement and Transmission Loss
Mellor, A.; Hylton, N.P.; Hauser, H.; Thomas, T.; Lee, K.-H.; Al-Saleh, Y.; Giannini, V.; Braun, A.; Loo, J.; Vercruysse, D.; Van Dorpe, P.; Blasi, B.; Maier, S.A.; Ekins-Daukes, N.J.
Journal Article
2015Development of nanoimprint processes for photovoltaic applications
Hauser, H.; Tucher, N.; Tokai, K.; Schneider, P.; Wellens, C.; Volk, A.; Seitz, S.; Benick, J.; Barke, S.; Dimroth, F.; Müller, C.; Glinsner, T.; Bläsi, B.
Journal Article
2015Development of NIL processes for PV applications
Hauser, H.; Tucher, N.; Tokai, K.; Schneider, P.; Wellens, C.; Volk, A.; Barke, S.; Müller, C.; Glinsner, T.; Bläsi, B.
Conference Paper
2015Spatial correlations and optical properties in three-dimensional deterministic aperiodic structures
Renner, Michael; Freymann, Georg von
Journal Article
2014Challenges and opportunities for process modeling in the nanotechnology era
Lorenz, J.K.; Baer, E.; Burenkov, A.; Erdmann, A.; Evanschitzky, P.; Pichler, P.
Journal Article
2014Novel light trapping concepts for crystalline silicon solar cells using diffractive rear side structures
Eisenlohr, J.; Tucher, N.; Bett, A.; Hauser, H.; Graf, M.; Benick, J.; Goldschmidt, J.; Bläsi, B.; Hermle, M.
Conference Paper
2014Simultaneous simulation of systematic and stochastic process variations
Lorenz, Jürgen; Bär, Eberhard; Burenkov, Alex; Evanschitzky, Peter; Asenov, Asen; Wang, Liping; Wang, Xingsheng; Brown, Andrew; Millar, Campbell; Reid, David
Conference Paper
2014Wafer-level hybrid integration of complex micro-optical modules
Dannberg, Peter; Wippermann, Frank; Brückner, Andreas; Matthes, Andre; Schreiber, Peter; Bräuer, Andreas
Journal Article
2013Design and wafer-level replication of a freeform curvature for polymer-based electrostatic out-of-plane actuators
Lange, Nicolas; Scheiding, Sebastian; Wippermann, Frank; Beckert, Erik; Eberhardt, Ramona; Tünnermann, Andreas
Journal Article
2013Innovative approach to high stroke electrostatic actuators
Lange, Nicolas; Wippermann, Frank; Beckert, Erik; Eberhardt, Ramona; Tünnermann, Andreas
Conference Paper
2012High stroke polymer based electrostatic actuators
Lange, Nicolas; Wippermann, Frank; Beckert, Erik; Eberhardt, Ramona; Tünnermann, Andreas
Conference Paper
2012Sub-micrometer pattern generation by diffractive mask-aligner lithography
Zeitner, Uwe D.; Stuerzebecher, Lorenz; Harzendorf, Torsten; Fuchs, Frank; Michaelis, Dirk
Conference Paper
2012Successful fabrication of polymer based low voltage electrostatic actuators
Lange, Nicolas; Wippermann, Frank; Beckert, Erik; Eberhardt, Ramona; Tünnermann, Andreas
Conference Paper
2011First results on electrostatic polymer actuators based on UV-replication
Lange, N.; Wippermann, F.; Leitel, R.; Bruchmann, C.; Beckert, E.; Eberhardt, R.; Tünnermann, A.
Conference Paper
2011TCAD challenges and some Fraunhofer solutions
Lorenz, J.
Conference Paper
2010Advances in lithography on non-planar surfaces
Radtke, D.; Stumpf, M.; Zeitner, U.
Conference Paper
2010Determination of local electrostatic forces for EUVL mask chucks
Kalkowski, G.; Peschel, T.; Risse, S.; Müller, S.; Engelstad, R.L.; Zeuske, J.R.; Vukkadala, P.
Conference Paper, Journal Article
2010Tailoring the properties of optical metamaterials
Helgert, C.; Pertsch, T.; Rockstuhl, C.; Pshenay-Severin, E.; Menzel, C.; Kley, E.-B.; Chipouline, A.; Etrich, C.; Hübner, U.; Tünnermann, A.; Lederer, F.
Journal Article
2008Accelerated lifetime metrology of EUV multilayer mirrors in hydrocarbon environments
Hill, S.B.; Faradzhev, N.S.; Tarrio, C.; Lucatorto, T.B.; Madey, T.E.; Yakshinskiy, B.V.; Loginova, E.; Yulin, S.
Conference Paper
2008On the stability of fully depleted SOI MOSFETs under lithography process variations
Kampen, C.; Fühner, T.; Burenkov, A.; Erdmann, A.; Lorenz, J.; Ryssel, H.
Conference Paper
2008Roughness evolution and scatter losses of multilayers for 193 nm optics
Schröder, S.; Duparre, A.; Tünnermann, A.
Journal Article
2007Contrast properties of spatial light modulators for microlithography
Heber, J.; Kunze, D.; Dürr, P.; Rudloff, D.; Wagner, M.; Björnängen, P.; Luberek, J.; Berzinsh, U.; Sandström, T.; Karlin, T.
Conference Paper
2007Flatness characterization of EUV mask chucks
Kalkowski, G.; Risse, S.; Müller, S.
Conference Paper, Journal Article
2006Advanced packaging materials for optical applications: Bridging the gap between nm-size structures and large-area panel processing
Houbertz, R.; Wolter, W.; Dannberg, P.; Serbin, J.; Uhlig, S.
Conference Paper
2006DUV-reflective coatings and novel actuator materials for light modulator arrays
Schmidt, Jan-Uwe; Friedrichs, Martin; Sandner, Thilo; Heber, Jörg; Rudloff, Dirk; Lakner, Hubert; Yang, M.; Gatto, A.; Kaiser, Norbert
Presentation
2006High-speed data storage and processing for projection mask-less lithography systems
Voss, S.-H.; Talmi, M.; Saniter, J.; Eindorf, J.; Reisig, A.; Heinitz, J.; Haugeneder, E.
Journal Article
2006Lossless high-speed data compression for optical interconnects as used in maskless lithography systems
Voss, S.-H.; Talmi, M.
Journal Article
2005Impact of modulational instability of partially coherent light in photosensitive optical polymers on the fabrication of optical microstructures
Streppel, U.; Michaelis, D.; Bräuer, A.; Kowarschik, R.
Conference Paper
2005Lithographieverfahren
Notthoff, C.
Journal Article
2004Werkstofftrends: Lithographieverfahren
Notthoff, C.; Kohlhoff, J.; Reschke, S.; Kretschmer, T.
Journal Article
2002Design and fabrication of broadband EUV multilayer mirrors
Kuhlmann, T.; Yulin, S.A.; Feigl, T.; Kaiser, N.; Bernitzki, H.; Lauth, H.
Conference Paper
2001Adjustment and mounting of stencil masks for ion projection lithography
Damm, C.; Peschel, T.; Gebhardt, A.; Kirschstein, U.
Journal Article
2001Electrostatic chucks for lithography applications
Kalkowski, G.; Risse, S.; Harnisch, G.; Guyenot, V.
Journal Article
2001Mikrooptische Elemente, Funktionen und lithographische Herstellungstechnologien
Kley, E.-B.; Tünnermann, A.; Zeitner, U.D.; Karthe, W.
Journal Article
2001Wafer stage assembly for ion projection lithography
Damm, C.; Peschel, T.; Risse, S.; Kirschstein, U.
Journal Article
1999A new metrology stage for Ion Projection Lithography made of glass ceramics
Risse, S.; Peschel, T.; Damm, C.; Kirschstein, U.
Conference Paper
1997Infrared micromirror array with large pixel size and large deflection angle
Wagner, B.; Reimer, K.; Maciossek, A.; Hofmann, U.
Conference Paper
1997Integrated three-dimensional topography simulation of contact hole processing
Bär, E.; Benvenuti, A.; Henke, W.; Jünemann, B.; Kalus, C.; Niedermaier, P.; Lorenz, J.
Conference Paper
1995Tailoring of surface properties by removal and deposition with laser radiation
Kreutz, E.W.; Frerichs, H.; Mertin, M.; Wesner, D.A.; Pfleging, W.
Journal Article
1994Industrielles Nachfragepotential für die BESSY-Synchrotronstrahlung. Ansatz zur Vernetzung von Grundlagenforschung und Industrie
Bierhals, R.; Schmoch, U.; Nick, D.; Pilorget, L.; Ritschel, C.; Walter, G.H.
Report
1994Laser and pinch plasma X-ray sources for microscopy and lithography
Neff, W.; Rothweiler, D.; Eidmann, K.; Lebert, R.; Richter, F.; Winhart, G.
Conference Paper
1992Investigation of pinch plasmas with plasma parameters promising ASE
Lebert, R.; Neff, W.; Rohe, T.; Rothweiler, D.; Seelig, W.; Herziger, G.
Conference Paper
1992Pinch plasmas as intense X-ray sources for laboratory applications
Rothweiler, D.; Neff, W.; Lebert, R.; Richter, F.; Diehl, M.
Conference Paper
1992Silicon technologies for sensor fabrication
Mokwa, W.
Book Article
1990Simulation of proximity printing
Schwalm, R.; Henke, W.; Pelka, J.; Weiß, M.
Journal Article
1989Fabrication of 0.5 mym MOS test devices by application of X-ray lithography at all levels
Friedrich, D.; Bernt, H.; Windbracke, W.; Zwicker, G.; Huber, H.-L.
Conference Paper
1989The plasma focus as soft x-ray source for microscopy and lithography.
Richter, F.; Eberle, J.; Holz, R.; Neff, W.; Lebert, R.
Conference Paper
1989Two-dimensional simulation methods (integrated optics)
Nolting, H.-P.; Weinert, C.M.
Journal Article
1987Fabrication of halfmicron MOSFETs by means of X-ray lithography
Huber, H.-L.; Lauer, V.; Bauer, F.; Korec, J.; Balk, P.
Journal Article
1986High resolution lithography using synchrotron radiation
Betz, H.
Journal Article, Conference Paper