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2018 | Elektrolytische Gallium-Abscheidung als Recyclingtechnologie Knoblauch, Christiane; Schmid, Klaus | Journal Article |
2017 | Recyclingpotenzial strategischer Metalle (ReStra) Sander, Knut; Gößling-Reisemann, Stefan; Zimmermann, Till; Marscheider-Weidemann, Frank; Wilts, Henning; Schebek, Liselotte; Wagner, Jörg; Heegn, Hanspeter; Pehlken, Alexandra | Report |
2013 | Light-induced degradation in copper-contaminated gallium-doped silicon Lindroos, J.; Yli-Koski, M.; Haarahiltunen, A.; Schubert, M.C.; Savin, H. | Journal Article |
2012 | Angular distributions of sputtered silicon at grazing gallium ion beam incidence Burenkov, Alex; Sekowski, Matthias; Belko, Viktor; Ryssel, Heiner | Journal Article, Conference Paper |
2012 | Evaluation of resistless Ga+ beam lithography for UV-NIL stamp fabrication Rumler, Maximilian; Fader, Robert; Haas, Anke; Rommel, Matthias; Bauer, Anton J.; Frey, Lothar | Poster |
2007 | Degradation of the minority carrier lifetime caused by Mn-correlated defects in Ga-implanted Si:P Beljakowa, S.; Pensl, G.; Rommel, M. | Poster |
1999 | Comparison of beam-induced deposition using ion microprobe Park, Y.S.; Nagai, T.; Takai, M.; Lehrer, C.; Frey, L.; Ryssel, H. | Journal Article, Conference Paper |
1983 | Phonon softening in ultra heavily doped Si and Ge. Cardona, M.; Axmann, A.; Compaan, A.; Contreras, G. | Journal Article |
1981 | Nd-YAG laser annealing of gallium-implanted silicon. Takai, M.; Tsou, S.C.; Tsien, P.H.; Roeschenthaler, D.; Ryssel, H. | Journal Article |