| | |
|---|
| 2018 | Elektrolytische Gallium-Abscheidung als Recyclingtechnologie
Knoblauch, Christiane; Schmid, Klaus | Journal Article |
| 2017 | Recyclingpotenzial strategischer Metalle (ReStra)
Sander, Knut; Gößling-Reisemann, Stefan; Zimmermann, Till; Marscheider-Weidemann, Frank; Wilts, Henning; Schebek, Lieselotte; Wagner, Jörg; Heegn, Hanspeter; Pehlken, Alexandra | Report |
| 2013 | Light-induced degradation in copper-contaminated gallium-doped silicon
Lindroos, J.; Yli-Koski, M.; Haarahiltunen, A.; Schubert, M.C.; Savin, H. | Journal Article |
| 2012 | Angular distributions of sputtered silicon at grazing gallium ion beam incidence
Burenkov, Alex; Sekowski, Matthias; Belko, Viktor; Ryssel, Heiner | Journal Article, Conference Paper |
| 2012 | Evaluation of resistless Ga+ beam lithography for UV-NIL stamp fabrication
Rumler, Maximilian; Fader, Robert; Haas, Anke; Rommel, Matthias; Bauer, Anton J.; Frey, Lothar | Poster |
| 2007 | Degradation of the minority carrier lifetime caused by Mn-correlated defects in Ga-implanted Si:P
Beljakowa, S.; Pensl, G.; Rommel, M. | Poster |
| 1999 | Comparison of beam-induced deposition using ion microprobe
Park, Y.S.; Nagai, T.; Takai, M.; Lehrer, C.; Frey, L.; Ryssel, H. | Journal Article, Conference Paper |
| 1983 | Phonon softening in ultra heavily doped Si and Ge.
Cardona, M.; Axmann, A.; Compaan, A.; Contreras, G. | Journal Article |
| 1981 | Nd-YAG laser annealing of gallium-implanted silicon.
Takai, M.; Tsou, S.C.; Tsien, P.H.; Roeschenthaler, D.; Ryssel, H. | Journal Article |