Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2018Analysis of Grain-Size Distribution and Yield Strength of Interconnector Ribbons and Wires at Different Streching Conditions Using Color Etching
Walter, J.; Stegmaier, J.; Kraft, A.; Eitner, U.
Conference Paper
2018The effect of etching and deposition processes on the width of spacers created during self-aligned double patterning
Baer, Eberhard; Lorenz, Juergen
Conference Paper
2018Optimization of inline processes for the production of freestanding epitaxially grown thin films for solar cells
Ivanov, Alexey; Sorgenfrei, R.; Gust, Elke; Barth, Philipp; Nieuwenhuysen, Kris van; Kühnhold-Pospischil, Saskia; Riepe, Stephan; Janz, Stefan
Conference Paper
2018Structuring of metal layers by electrochemical screen printing for back-contact solar cells
Kamp, M.; Efinger, R.; Gensowski, K.; Bechmann, S.; Bartsch, J.; Glatthaar, M.
Journal Article
2017Paste development for electrochemical screen printing to structure metal layers of back contact solar cells
Gensowski, K.; Kamp, M.; Efinger, R.; Klawitter, M.; Pospischil, M.; Eckert, J.; Bartsch, J.
Conference Paper
2017Tool optimization for dry forming applications - optimized surface preparation of ta-C
Roch, Teja; Stepien, Lukas; Kunze, Tim; Mousavi, Ali; Topalski, Slavcho; Lasagni, Andrés-Fabián; Brosius, Alexander
Journal Article
2016Alternative Inline Analysis of Acidic Etching Baths
Mohr, L.; Dannenberg, T.; Zimmer, M.; Rentsch, J.
Conference Paper
2015Nanostructuring of c-Si surface by F2-based atmospheric pressure dry texturing process
Kafle, B.; Seiffe, J.; Clochard, L.; Duffy, E.; Rentsch, J.; Hofmann, M.
Journal Article
2015Nanotextured multicrystalline Al-BSF solar cells reaching 18% conversion efficiency using industrially viable solar cell processes
Bishal, K.; Mannan, A.; Freund, T.; Clochard, L.; Duffy, E.; Hofmann, M.; Rentsch, J.; Preu, R.
Journal Article
2015Oberflächenmodifizierung mit Licht
Schmüser, Christian
Report
2015Relation between light trapping and surface topography of plasma textured crystalline silicon wafers
Souren, F.M.M.; Rentsch, J.; Sanden, M.C.M. van de
Journal Article
2014Challenges and opportunities for process modeling in the nanotechnology era
Lorenz, J.K.; Baer, E.; Burenkov, A.; Erdmann, A.; Evanschitzky, P.; Pichler, P.
Journal Article
2014Multicrystalline silicon solar cell improvement by atmospheric pressure dry etching process
Kafle, B.; Trogus, D.; Seiffe, J.; Clochard, L.; Duffy, E.; Hofmann, M.; Rentsch, J.
Conference Paper
2014Simultaneous simulation of systematic and stochastic process variations
Lorenz, Jürgen; Bär, Eberhard; Burenkov, Alex; Evanschitzky, Peter; Asenov, Asen; Wang, Liping; Wang, Xingsheng; Brown, Andrew; Millar, Campbell; Reid, David
Conference Paper
2013Experimental verification of the model by Klapper for 4H-SiC homoepitaxy on vicinal substrates
Kallinger, Birgit; Polster, Sebastian; Berwian, Patrick; Friedrich, Jochen; Danilewsky, A.N.
Journal Article
2013Industrial screen-printed solar cells with novel atmospheric pressure dry texturing process
Kafle, B.; Trogus, D.; Dresler, B.; Mäder, G.; Clochard, L.; Duffy, E.; Hofmann, M.; Rentsch, J.
Conference Paper
2013Laser assisted honeycomb-texturing on multicrystalline silicon for industrial applications
Volk, A.-K.; Gutscher, S.; Brand, A.; Wolke, W.; Zimmer, M.; Reinecke, H.
Conference Paper
2012Effect of metal-wrap-through holes and etching parameters on the strength of multicrystalline silicon wafers
Oswald, M.; Loewenstein, T.; Schubert, G.; Schoenfelder, S.
Conference Paper
2011Threading dislocations in n- and p-type 4H-SiC material analyzed by etching and synchrotron x-ray topography
Kallinger, B.; Polster, S.; Berwian, P.; Friedrich, J.; Müller, G.; Danilewsky, A.N.; Wehrhahn, A.; Weber, A.-D.
Journal Article
2010DLC/Si multilayer mirrors for EUV radiation
Gawlitza, P.; Braun, S.; Leson, A.; Soer, W.; Jak, M.; Banine, V.
Conference Paper
2009Crystallographic anisotropy of growth and etch rates of CVD diamond
Wolfer, M.; Biener, J.; El-Dasher, B.S.; Biener, M.M.; Hamza, A.V.; Kriele, A.; Wild, C.
Journal Article, Conference Paper
2008Micromachined mid-infrared emitter for fast transient temperature operation for optical gas sensing systems
Hildenbrand, J.; Kürzinger, A.; Peter, C.; Moretton, E.; Wöllenstein, J.; Naumann, F.; Ebert, M.; Korvink, J.
Conference Paper
2007Lithium niobate ridge waveguides fabricated by wet etching
Hu, H.; Ricken, R.; Sohler, W.; Wehrspohn, R.B.
Journal Article
2007Orthodox etching of HVPE-grown GaN
Weyher, J.L.; Lazar, S.; Macht, L.; Liliental-Weber, Z.; Molnar, R.J.; Müller, S.; Sivel, V.G.M.; Nowak, G.; Grzegory, I.
Conference Paper, Journal Article
2005Studies of fine pitch patterning by reel-to-reel processes for flexible electronic systems
Drost, A.; Klink, G.; Feil, M.; Bock, K.
Conference Paper
2003State-of-the-art mid-frequency sputtered ZnO films for thin film silicon solar cells and modules
Müller, J.; Schöpe, G.; Kluth, O.; Rech, B.; Sittinger, V.; Szyszka, B.; Geyer, R.; Lechner, P.; Schade, H.; Ruske, M.; Dittmar, G.; Bochem, H.-P.
Journal Article
2003Three-dimensional triangle-based simulation of etching processes and applications
Lenhart, O.; Bär, E.
Journal Article
2002MOVPE-based in-situ etching of InP epitaxial heterostructures
Wolfram, P.; Franke, D.; Ebert, W.; Grote, N.
Conference Paper
2002Three-dimensional triangle-based simulation of etching processes
Lenhart, O.; Bär, E.
Conference Paper
2000Conservation of low dark current of InGaAs photodiodes after NH3/HF etch with a BCB passivation layer
Schmidt, D.; Trommer, D.
Conference Paper
2000MOVPE-based in situ etching of In(GaAs)P/InP using tertiarybutylchloride
Wolfram, P.; Ebert, W.; Kreissl, J.; Grote, N.
Conference Paper, Journal Article
1999A novel flexible, reliable and easy to use technique for the fabrication of optical spot size converters for InP based PICs
Trommer, D.; Steingrüber, R.; Löffler, R.; Umbach, A.
Conference Paper
1998Experimental verification of three-dimensional simulations of LTO layer deposition on structures prepared by anisotropic wet etching of silicon
Bär, E.; Lorenz, J.; Ryssel, H.
Conference Paper
1998MOMBE grown GaInAsP (lambda g=1.05/1.15 mu m) waveguide for laser integrated photonic ICs
Kuenzel, H.; Gibis, R.; Kizuki, H.; Albrecht, P.; Ebert, S.; Harde, P.; Malchow, S.; Kaiser, R.
Conference Paper, Journal Article
1997Integrated three-dimensional topography simulation of contact hole processing
Bär, E.; Benvenuti, A.; Henke, W.; Jünemann, B.; Kalus, C.; Niedermaier, P.; Lorenz, J.
Conference Paper
1997Micro-optic fabrication using one-level gray-tone lithography
Reimer, K.; Quenzer, H.J.; Jürss, M.; Wagner, B.
Conference Paper
1997Multilevel diffractive optical elements fabricated with a single amplitude-phase mask
Pawlowski, E.; Engel, H.
Journal Article
1997The selective etching of H+ ions and its effect on the oriented growth of diamond films
Jiang, X.; Xia, Y.B.; Zhang, W.J.
Journal Article
1997Selective MOMBE growth behaviour at the lateral interface of waveguide/laser butt-joints
Kunzel, H.; Ebert, S.; Gibis, R.; Kaiser, R.; Kizuki, H.; Malchow, S.
Conference Paper
1997Surface preparation for molecular beam epitaxy-regrowth on metalorganic vapour phase epitaxy grown InP and InGaAsP layers
Passenberg, W.; Schlaak, W.
Journal Article
1996MBE regrowth on planar and patterned In(GaAs)P layers for monolithic integration
Passenberg, W.; Schlaak, W.; Umbach, A.
Conference Paper
1996MOMBE growth of high quality GaInAsP (lambda g=1.05 mu m) for waveguide applications
Kuenzel, H.; Albrecht, P.; Gibis, R.; Hamacher, M.; Schelhase, S.
Conference Paper, Journal Article
1996Nondestructive morphological characterization of latent and etched ion tracks in PETP by SANS
Häußler, F.; Hempel, M.; Birkholz, W.; Baumbach, H.; Kröning, M.
Conference Paper
1995Local material removal by focused ion beam milling and etching
Lipp, S.; Frey, L.; Franz, G.; Demm, E.; Petersen, S.; Ryssel, H.
Journal Article
1995On the role of interface properties in the degradation of metalorganic vapor phase epitaxially grown Fe profiles in InP
Roehle, H.; Schroeter-Janssen, H.; Harde, P.; Franke, D.
Conference Paper
1994Hydrating cement paste and SSNTD
Häußler, F.; Hempel, M.; Eichhorn, F.; Hempel, A.; Baumbach, H.
Book Article
1993Blazed Fresnel zone lenses approximated by discrete step profiles: Effects of fabrication errors
Ferstl, M.; Kuhlow, B.; Pawlowski, E.
Conference Paper
1993SIMOX and wafer bonding, combination of competitors complements one another
Gassel, H.; Vogt, H.
Conference Paper
1993Two-dimensional arrays of diffractive microlenses for optical interconnects
Kuhlow, B.; Pawlowski, E.; Ferstl, M.
Conference Paper
1992SIMOX, an efficient etch-stop to fabricate silicon membranes with well defined thickness. Part 1
Dura, H.-G.; Gassel, H.; Mokwa, W.; Vogt, H.
Conference Paper
1992SIMOX, an efficient etch-stop to fabricate silicon membranes with well defined thickness. Part 2
Dura, H.-G.; Gassel, H.; Mokwa, W.; Vogt, H.
Conference Paper
1991Thickness inhomogeneity during silicon X-ray mask membrane fabrication: generation and prevention
Löchel, B.; Macioßek, A.; Huber, H.-L.; König, M.
Conference Paper
1990Hydrogen passivation of Zn acceptors in InGaAs during reactive ion etching
Moehrie, M.
Journal Article
1990Silicon micromachining for microsensors and microactuators
Benecke, W.
Conference Paper
1989Endpoint detection for CH4/H2 reactive ion etching of InGaAsP heterostructures by mass spectrometry
Schmid, H.; Fidorra, F.; Grutzmacher, D.
Conference Paper
1989Two-dimensional simulation methods (integrated optics)
Nolting, H.-P.; Weinert, C.M.
Journal Article
1987Simultaneous fabrication of very low resistance ohmic contacts to n-InP and p-InGaAs
Kaumanns, R.; Grote, N.; Bach, H.-G.; Fidorra, F.
Conference Paper