Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2016Spectroscopic measurement of material properties using an improved millimeter-wave ellipsometer based on metallic substrates
Klenner, M.; Zech, C.; Hülsmann, A.; Kühn, J.; Schlechtweg, M.; Ambacher, O.
Journal Article
2015Label-free detection of angiogenesis biomarkers using Bloch surface waves on one dimensional photonic crystals
Sinibaldi, A.; Anopchenko, Aleksei; Occhicone, Agostino; Michelotti, Francesco; Danz, Norbert; Munzert, Peter; Schmieder, Stefan; Sonntag, Frank; Chandrawati, Rona; Rana, Subinoy; Stevens, Molly M.; Napione, Lucia
Conference Paper
2014Characterisation of Ultra-Thin µc-Si Films for Silicon Heterojunction Solar Cells
Wernerus, H.; Bivour, M.; Kroely, L.; Hermle, M.; Wolke, W.
Conference Paper
2013Comparison of abrasive tests for transparent optical coatings
Bruns, S.; Montzka, S.; Reimann, W.; Vergöhl, M.
Journal Article
2013Heteroepitaxial Ge-on-Si by DC magnetron sputtering
Steglich, Martin; Patzig, Christian; Berthold, Lutz; Schrempel, Frank; Füchsel, Kevin; Höche, Thomas; Kley, Ernst-Bernhard; Tünnermann, Andreas
Journal Article
2012Comparison of abrasive tests for transparent optical coatings
Bruns, S.; Vergöhl, M.
Conference Paper
2011Optics contamination studies in support of high-throughput EUV lithography tools
Hill, S.B.; Faradzhev, N.S.; Richter, L.J.; Grantham, S.; Tarrio, C.; Lucatorto, T.B.; Yulin, S.; Schürmann, M.; Nesterenko, V.; Feigl, T.
Conference Paper
2010Carbon nanotubes: Numerical simulation of absorbing properties in visible and infrared regime
Lubkowski, G.
Conference Paper
2009Observation of Fermi-edge and excitons and exciton-phonon complexes in the optical response of heavily doped n-type wurtzite GaN
Shokhovets, S.; Köhler, K.; Ambacher, O.; Gobsch, G.
Journal Article
2008Anisotropy of the momentum matrix element, dichroism, and conduction-band dispersion relation of wurtzite semiconductors
Shokhovets, S.; Ambacher, O.; Meyer, B.K.; Gobsch, G.
Journal Article
2006Standardization of integrated ellipsometry for semiconductor manufacturing
Roeder, G.; Schellenberger, M.; Pfitzner, L.; Ryssel, H.; Richter, U.; Stehle, J.L.; Piel, J.-P.
Conference Paper
2004Effective-medium model for fast evaluation of scatterometric measurements on gratings
Weidner, A.; Slodowski, M.; Halm, C.; Schneider, C.; Pfitzner, L.
Conference Paper
2002Design and manufacture of spectrally selective reflecting coatings for the use with laser display projection screens
Rickers, C.; Vergöhl, M.; Klages, C.-P.
Journal Article
2001In-situ monitoring of optical coatings on architectural glass and comparison of the accuracy of the layer thicknesses attainable with ellipsometry and photometry
Vergöhl, M.; Malkomes, N.; Matthee, T.; Bräuer, G.; Richter, U.; Nickol, F.-W.; Bruch, J.
Conference Paper, Journal Article
2001Investigation of the surface micro-roughness of fluoride films by spectroscopic ellipsometry
Tikhonravov, A.V.; Trubetskov, M.K.; Krasilnikova, A.V.; Masetti, E.; Duparre, A.; Quesnel, E.; Ristau, D.
Journal Article
2000A new procedure for the optical characterization of high quality thin films
Bosch, S.; Leinfeller, N.; Quesnel, E.; Duparre, A.; Ferre-Borrull, J.; Günster, S.; Ristau, D.
Conference Paper
1999Ex situ and in situ spectroscopic ellipsometry of MF and DC-sputtered TiO2 and SiO2 films for process control
Vergöhl, M.; Malkomes, N.; Staedler, T.; Matthee, T.; Richter, U.
Journal Article
1999In-situ Ellipsometrie und Plasmadiagnostik zur Effizienzsteigerung der Abscheidung optischer Funktionsschichten durch reaktives Magnetron-Sputtern
Vergöhl, M.; Malkomes, N.; Bräuer, G.; Bruch, J.; Jäger, S.; Richter, U.
Conference Paper
1999MOCVD of ferroelectric thin films
Schmidt, C.; Lehnert, W.; Leistner, T.; Frey, L.; Ryssel, H.
Conference Paper
1999Nondestructive analytical tools for characterization of thin titanium silicide films prepared by conventional and direct step silicidation with enhanced transition
Kal, S.; Ryssel, H.
Journal Article
1999Novel process control strategies for 300 mm semiconductor production
Pfitzner, L.; Oechsner, R.; Schneider, C.; Ryssel, H.; Riemer, M.; Podewils, M. von
Journal Article
1999Simulation of a Coating Protection for an In Situ Ellipsometer in a CVD Furnace
Poscher, S.; Lehnert, W.; Ryssel, H.
Conference Paper
1998Comparative study of surface roughness measured on polysilicon using spectroscopic ellipsometry and atomic force microscopy
Petrik, P.; Biro, L.P.; Fried, M.; Lohner, T.; Berger, R.; Schneider, C.; Gyulai, J.; Ryssel, H.
Journal Article
1998Glass transition temperature and thermal expansion behaviour of polymer films investigated by variable temperature spectroscopic ellipsometry
Kahle, O.; Wielsch, U.; Metzner, H.; Bauer, J.; Uhlig, C.; Zawatzki, C.
Conference Paper
1998Oxide layer thickness measurement
Schneider, C.
Journal Article
1996Ellipsometry and Michelson interferometry for fixed- and variable-frequency electro-optical measurements on poled polymers
Dinger, C.; Yilmaz, S.; Brinker, W.; Wirges, W.; Bauer-Gogonea, S.; Bauer, S.; Gerhard-Multhaupt, R.
Journal Article
1996Structural characterization of InAs/(GaIn)Sb superlattices for IR optoelectronics
Wagner, J.; Schmitz, J.; Fuchs, F.; Weimar, U.; Herres, N.; Tränkle, G.; Koidl, P.
Conference Paper
1995Comparative film thickness determination by atomic force microscopy and ellipsometry for ultrathin prepolymer films
Gesang, T.; Fanter, D.; Höper, R.; Possart, W.; Hennemann, O.-D.
Journal Article
1995InAs/GaSb superlattices with different interfaces studied by resonant raman scattering ans ellipsometry
Behr, D.; Wagner, J.; Ralston, J.D.; Koidl, P.; Ramsteiner, M.; Schrottke, L.; Jungk, G.
Conference Paper
1995Pulsed laser deposition of laterally graded X-ray optical multilayers on substrates of technical relevance
Dietsch, R.; Holz, T.; Krawietz, R.; Mai, H.; Schöneich, B.; Scholz, R.; Völlmar, S.; Wehner, B.
Conference Paper
1995Surface influence on the doping dependence of the E1 plus Delta1 critical points of GaAs - electric field and inpurity unscreening effect
Kuball, M.; Kelly, M.K.; Santos, P.V.; Cardona, M.; Köhler, K.; Wagner, J.
Conference Paper
1995Variable-angle spectroscopic ellipsometry for deep UV characterization of dielectric coatings
Zuber, A.; Kaiser, N.; Stehle, J.L.
Journal Article
1992Laser pulse vapour deposition of metal-carbon superlattices for soft X-ray mirror applications
Dietsch, R.; Mai, H.; Pompe, W.; Schöneich, B.; Völlmar, S.; Hopfe, S.; Scholz, R.; Wehner, B.; Weißbrodt, P.; Wendrock, H.
Conference Paper
1992Multischichten für die Optik im weichen Röntgengebiet
Dietsch, R.; Mai, H.; Pompe, W.; Völlmar, S.
Conference Paper
1990Control of a reactive ion etching process for InP and related materials by in-situ ellipsometry in the near infrared
Muller, R.
Conference Paper
1990In situ etching depth monitoring for reactive ion etching of InGaAs(P)/InP heterostructures by ellipsometry
Muller, R.
Journal Article

 

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