Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.
2018CMOS compatible pyroelectric applications enabled by doped HfO2 films on deep-trench structures
Mart, Clemens; Weinreich, Wenke; Czernohorsky, Malte; Riedel, Stefan; Zybell, Sabine; Kühnel, Kati
Conference Paper
2016ALD as effictive barrier for organic electronic devices
Boeffel, Christine
Presentation
2016ALD-based 3D-capacitors for harsh environments
Dietz, Dorothee; Celik, Yusuf; Goehlich, Andreas; Vogt, Holger
Conference Paper
2016Post-CMOS integrated ALD 3D micro- and nanostructures and application for multi-electrode arrays
Jupe, Andreas; Figge, Martin; Goehlich, Andreas; Vogt, Holger
Conference Paper
2016Ultrathin titanium dioxide nanolayers by atomic layer deposition for surface passivation of crystalline silicon
Gad, K.M.; Vössing, D.; Richter, A.; Rayner, B.; Reindl, L.M.; Mohney, S.E.; Kasemann, M.
Journal Article
2015ALD-basierte, monolithisch integrierte 3D-Nanostrukturen
Jupe, Andreas; Goehlich, Andreas; Feizi, Khadijeh; Vogt, Holger
Conference Paper
2015Entwicklung von Hochtemperatur Trench-Kondensatoren unter Verwendung von dünnen ALD-Dielektrika
Dietz, Dorothee; Celik, Yusuf; Goehlich, Andreas; Vogt, Holger; Kappert, Holger
Conference Paper
2013Effective passivation of black silicon surfaces by atomic layer deposition
Repo, P.; Haarahiltunen, A.; Sainiemi, L.; Yli-Koski, M.; Talvitie, H.; Schubert, M.C.; Savin, H.
Journal Article
2013Evaluation of an advanced dual hard mask stack for high resolution pattern transfer
Paul, Jan; Rudolph, M.; Riedel, S.; Thrun, X.; Wege, S.; Hohle, C.
Conference Paper
2012Interface and material characterization of thin ALD-Al2O3 layers on crystalline silicon
Naumann, V.; Otto, M.; Wehrspohn, R.B.; Werner, M.; Hagendorf, C.
Conference Paper, Journal Article
2012Plasma-assisted atomic layer deposition of alumina at room temperature
Lemberger, Martin; Fromm, Timo; Rommel, Mathias; Bauer, Anton J.; Frey, Lothar
Poster
2011Atomic layer deposition of ruthenium films from (Ethylcyclopentadienyl)(pyrrolyl)ruthenium and oxygen
Kukli, K.; Kemeli, M.; Puukilainen, E.; Aarik, J.; Aidla, A.; Sjavaara, T.; Laitinen, M.; Tallarida, M.; Sundqvist, J.; Ritala, M.; Leskela, M.
Journal Article
2010Thermal ALD of SrTiO3 films using Sr(iPr3Cp)2 and Star-Ti
Riedel, S.; Sundqvist, J.; Wilde, L.; Boitier, L.; Wilde, C.; Blasco, N.; Lachaud, C.; Zauner, A.; Michaelis, A.
Poster
2010Untersuchungen zur Oberflächenchemie der Atomlagenabscheidung und deren Einfluss auf die Effizienz von Prozessen
Rose, Martin
: Lakner, Hubert; Bartha, Johann W. (Gutachter); Michaelis, Alexander (Gutachter)
Dissertation