YearTitle/AuthorDocument Type
2021Influence of substrate materials on nucleation and properties of iridium thin films grown by ALD
Schmitt, P.; Beladiya, V.; Felde, N.; Paul, P.; Otto, F.; Fritz, T.; Tünnermann, A.; Szeghalmi, A.
Journal Article
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2021Influence of temperature and plasma parameters on the properties of PEALD HfO2
Lapteva, M.; Beladiya, V.; Riese, S.; Hanke, P.; Otto, F.; Fritz, T.; Schmitt, P.; Stenzel, O.; Tünnermann, A.; Szeghalmi, A.
Journal Article
full text
2021Optical bandgap control in Al2O3/TiO2 heterostructures by plasma enhanced atomic layer deposition: Toward quantizing structures and tailored binary oxides
Paul, P.; Hafiz, M.G.; Schmitt, P.; Patzig, C.; Otto, F.; Fritz, T.; Tünnermann, A.; Szeghalmi, A.
Journal Article
2021Structural, optical, and mechanical properties of TiO2 nanolaminates
Ghazaryan, L.; Handa, S.; Schmitt, P.; Beladiya, V.; Roddatis, V.; Tünnermann, A.; Szeghalmi, A.
Journal Article
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2020Antireflection coating on PMMA substrates by atomic layer deposition
Paul, P.; Pfeiffer, K.; Szeghalmi, A.
Journal Article
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2020Effect of an electric field during the deposition of silicon dioxide thin films by plasma enhanced atomic layer deposition: An experimental and computational study
Beladiya, V.; Becker, M.; Faraz, T.; Kessels, W.M.M.; Schenk, P.; Otto, F.; Fritz, T.; Gruenewald, M.; Helbing, C.; Jandt, K.D.; Tünnermann, A.; Sierka, M.; Szeghalmi, A.
Journal Article
2020Tuneable Optical Properties in Al2O3/TiO2 Nanocomposites Fabricated by Atomic Layer Deposition (ALD)
Paul, P.; Hafiz, G.; Tünnermann, A.; Szeghalmi, A.
Conference Paper
2019Antireflection coating with consistent near-neutral color on complex-shaped substrates prepared by ALD
Pfeiffer, K.; Dewald, W.; Szeghalmi, A.
Journal Article
2019Design and fabrication of single, smooth and broadband chirped mirrors with a top nano-porous layer
Ma, P.; Szeghalmi, A.; Schulz, U.; Rickelt, F.; Beladiya, V.; Zimmermann, P.; Li, L.
Conference Paper
2019On the Properties of Nanoporous SiO2 Films for Single Layer Antireflection Coating
Ghazaryan, L.; Sekman, Y.; Schröder, S.; Mühlig, C.; Stevanovic, I.; Botha, R.; Aghaee, M.; Creatore, M.; Tünnermann, A.; Szeghalmi, A.
Journal Article
2019Optical Coatings with Atomic Precision
Szeghalmi, A.
Journal Article
2019Wide-Angle Broadband Antireflection Coatings Prepared by Atomic Layer Deposition
Pfeiffer, K.; Ghazaryan, L.; Schulz, U.; Szeghalmi, A.
Journal Article
2018Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
Beladiya, V.; Faraz, T.; Kessels, W.M.M.; Tünnermann, A.; Szeghalmi, A.
Conference Paper
2018Growth of Atomic Layer Deposited Ruthenium and its Optical Properties at Short Wavelengths Using Ru(EtCp)2 and Oxygen
Müller, R.; Ghazaryan, L.; Schenk, P.; Wolleb, S.; Beladiya, V.; Otto, F.; Kaiser, N.; Tünnermann, A.; Fritz, T.; Szeghalmi, A.
Journal Article
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2018Insulating and passivating plasma-enhanced atomic layer deposited aluminum oxide thin films for silicon solar cells
Reichel, C.; Reusch, M.; Kotula, S.; Granek, F.; Richter, A.; Hermle, M.; Glunz, S.W.
Journal Article
2018Laser-induced damage threshold of nanoporous single-layer ALD antireflective coatings
Gischkat, T.; Botha, R.; Stevanovic, I.; Szeghalmi, A.; Ghazaryan, L.; Bächli, A.
Conference Paper
2018Reproducibility and stability of nanoporous SiO2 thin film coatings
Ghazaryan, L.; Szeghalmi, A.
Conference Paper
2018Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies
Faraz, T.; Knoops, H.C.M.; Verheijen, M.A.; Helvoirt, C.A.A. van; Karwal, S.; Sharma, A.; Beladiya, V.; Szeghalmi, A.; Hausmann, D.M.; Henri, J.; Creatore, M.; Kessels, W.M.M.
Journal Article
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2017Antireflection Coatings for Strongly Curved Glass Lenses by Atomic Layer Deposition
Pfeiffer, K.; Schulz, U.; Tünnermann, A.; Szeghalmi, A.
Journal Article
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2017Mechanical, structural, and optical properties of PEALD metallic oxides for optical applications
Shestaeva, S.; Bingel, A.; Munzert, P.; Ghazaryan, L.; Patzig, C.; Tünnermann, A.; Szeghalmi, A.
Journal Article
2017Nanoporous thin films made by atomic layer deposition and molecular layer deposition: Applications as antireflection coatings and for encapsulation of optical gratings
Ghazaryan, L.
Dissertation
2017PEALD and pulsed CVD of Cobalt thin films using the precursor cyclopentadienylcobalt dicarbonyl: Poster presented at Joint EuroCVD 21 - Baltic ALD 15 Conference, 11 - 14 June 2017, Linköping, Sweden
Hossbach, Christoph; Shukla, Shashank; Fischer, Dustin; Reif, Johanna; Bönhardt, Sascha; Geidel, Marion; Albert, Matthias; Bartha, Johann W.
Poster
2017Ta2O5/ Al2O3/ SiO2 - antireflective coating for non-planar optical surfaces by atomic layer deposition
Pfeiffer, K.; Schulz, U.; Tünnermann, A.; Szeghalmi, A.
Conference Paper
2016Blistering during the atomic layer deposition of iridium
Genevee, P.; Ahiavi, E.; Janunts, N.; Pertsch, T.; Oliva, M.; Kley, E.-B.; Szeghalmi, A.
Journal Article
2016Comparative study of ALD SiO2 thin films for optical applications
Pfeiffer, K.; Shestaeva, S.; Bingel, A.; Munzert, P.; Ghazaryan, L.; Helvoirt, C. van; Kessels, W.M.M.; Sanli, U.T.; Grevent, C.; Schütz, G.; Putkonen, M.; Buchanan, I.; Jensen, L.; Ristau, D.; Tünnermann, A.; Szeghalmi, A.
Journal Article
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2016Nanoporous SiO2 thin films made by atomic layer deposition and atomic etching
Ghazaryan, L.; Kley, E.-B.; Tünnermann, A.; Szeghalmi, A.
Journal Article
2016New grating concepts in the NIR and SWIR spectral band for high resolution earth-observation spectrometers
Flügel-Paul, T.; Kalkowski, G.; Benkenstein, T.; Harzendorf, T.; Matthes, A.; Zeitner, U.D.
Conference Paper
2015Encapsulation process for diffraction gratings
Ratzsch, Stephan; Kley, Ernst-Bernhard; Tünnermann, Andreas; Szeghalmi, Adriana
Journal Article
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2015Half-wave phase retarder working in transmission around 630nm realized by atomic layer deposition of sub-wavelength gratings
Paul, Thomas; Matthes, Andre; Harzendorf, Torsten; Ratzsch, Stephan; Zeitner, Uwe D.
Journal Article
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2015High efficiency blazed gratings in resonance domain
Oliva, M.
Dissertation
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2015High-efficiency embedded transmission grating made by atomic layer deposition
Ratzsch, S.; Kley, E.-B.; Tünnermann, A.; Szeghalmi, A.
Conference Paper
2015Influence of the oxygen plasma parameters on the atomic layer deposition of titanium dioxide
Ratzsch, Stephan; Kley, Ernst-Bernhard; Tünnermann, Andreas; Szeghalmi, Adriana
Journal Article
2015Inhibition of Crystal Growth during Plasma Enhanced Atomic Layer Deposition by Applying BIAS
Ratzsch, S.; Kley, E.-B.; Tünnermann, A.; Szeghalmi, A.
Journal Article
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2015Nanoporous SiO2 made by atomic layer deposition and atomic layer etching
Ghazaryan, L.; Kley, E.-B.; Tünnermann, A.; Szeghalmi, A.
Conference Paper
2015Plasma enhanced atomic layer deposition by means of an Anode Layer Ion Source for electronics packaging applications
Bellido-Gonzalez, V.; Monaghan, D.; Daniel, B.; Li, Heqing; Papa, Frank; Kröhnert, Kevin; Ehrmann, Oswin; Lang, Klaus-Dieter; Mackowiak, Piotr; Ngo, Ha-Duong
Conference Paper
2015Plasma-enhanced atomic layer deposition for antireflection coatings using SiO2 as low-refractive index material
Pfeiffer, K.; Shestaeva, S.; Bingel, A.; Munzert, P.; Schulz, U.; Kaiser, N.; Tünnermann, A.; Szeghalmi, A.
Conference Paper
2014High-refractive-index gratings for spectroscopic and laser applications
Zeitner, Uwe Detlef; Fuchs, Frank; Kley, Ernst-Bernhard; Tünnermann, Andreas
Conference Paper
2014Observation of the waveguide resonance in a periodically patterned high refractive index broadband antireflection coating
Stenzel, Olaf; Wilbrandt, Steffen; Chen, Xiaoying; Schlegel, Ralph; Coriand, Luisa; Duparré, Angela; Zeitner, Uwe; Benkenstein, Tino; Wächter, Christoph
Journal Article
2014An ultra-black silicon absorber
Steglich, Martin; Lehr, Dennis; Ratzsch, Stephan; Käsebier, Thomas; Schrempel, Frank; Kley, Ernst-Bernhard; Tünnermann, Andreas
Journal Article
2013Deep-subwavelength plasmonic nanoresonators exploiting extreme coupling
Alaee, Rasoul; Menzel, Christoph; Huebner, Uwe; Pshenay-Severin, Ekaterina; Bin Hasan, Shakeeb; Pertsch, Thomas; Rockstuhl, Carsten; Lederer, Falk
Journal Article
2013Exploiting extreme coupling to realize a metamaterial perfect absorber
Huebner, Uwe; Pshenay-Severin, Ekaterina; Alaee, Rasoul; Menzel, Christoph; Ziegler, Mario; Rockstuhl, Carsten; Lederer, Falk; Pertsch, Thomas; Meyer, Hans-Georg; Popp, Juergen
Journal Article
2013Highly efficient broadband blazed grating in resonance domain
Oliva, Maria; Michaelis, Dirk; Fuchs, Frank; Tünnermann, Andreas; Zeitner, Uwe Detlef
Journal Article
2013Stability and annealing of alucones and alucone alloys
Ghazaryan, Lilit; Kley, Ernst-Bernhard; Tünnermann, Andreas; Szeghalmi, Adriana Viorica
Journal Article
2012Atomic layer deposited ZnO:Al for nanostructured silicon heterojunction solar cells
Steglich, M.; Bingel, A.; Jia, G.; Falk, F.
Journal Article
2012Plasma-assisted atomic layer deposition of alumina at room temperature: Poster at 17th Workshop on Dielectrics in Microelectronics (WoDiM 2012), June 25-27, 2012, Dresden
Lemberger, Martin; Fromm, Timo; Rommel, Mathias; Bauer, Anton J.; Frey, Lothar
Poster
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2011Atomic layer deposition of iridium thin films and their application in gold electrodeposition
Szeghalmi, A.; Arnold, M.; Berger, A.; Schammelt, N.; Füchsel, K.; Knez, M.; Kley, E.-B.; Zahn, D.R.T.; Tünnermann, A.
Conference Paper
2011Iridium wire grid polarizer fabricated using atomic layer deposition
Weber, T.; Kasebier, T.; Szeghalmi, A.; Knez, M.; Kley, E.B.; Tünnermann, A.
Journal Article
2011Plasma and optical thin film technologies
Stenzel, O.; Wilbrandt, S.; Kaiser, N.; Schmitz, C.; Turowski, M.; Ristau, D.; Awakowicz, P.; Brinkmann, R.P.; Musch, T.; Rolfes, I.; Steffen, H.; Foest, R.; Ohl, A.; Köhler, T.; Dolgonos, G.; Frauenheim, T.
Conference Paper
2010Analysis of NbN thin film deposition by plasma-enhanced ALD for gate electrode application
Hinz, J.; Bauer, A.J.; Frey, L.
Journal Article
2010Evaluation of NbN thin films grown by MOCVD and plasma-enhanced ALD for gate electrode application in high-k/SiO2 gate stacks
Hinz, J.; Bauer, A.J.; Thiede, T.; Fischer, R.A.; Frey, L.
Journal Article
2008ALD of Copper and Copper Oxide Thin Films for Applications in Metallization Systems of ULSI Devices
Waechtler, T.; Oswald, S.; Roth, N.; Lang, H.; Schulz, S.E.; Gessner, T.
Conference Paper
full text
2008Atomic layer deposition process with TiF4 as a precursor for depositing metal fluoride thin films
Pilvi, T.; Ritala, M.; Leskelä, M.; Bischoff, M.; Kaiser, U.; Kaiser, N.
Journal Article
2007Study of a novel ALD process for depositing MgF2 thin films
Pilvi, T.; Hatanpaa, T.; Puukilainen, E.; Arstila, K.; Bischoff, M.; Kaiser, U.; Kaiser, N.; Leskela, M.; Ritala, M.
Journal Article
2002High-performance 6-inch EUV mask blanks produced under real production conditions by ion-beam sputter deposition
Becker, H.W.; Sobel, F.; Aschke, L.; Renno, M.; Krieger, J.; Buttgereit, U.; Hess, G.; Lenzen, F.; Knapp, K.; Yulin, S.A.; Feigl, T.; Kuhlmann, T.; Kaiser, N.
Conference Paper
1997Properties of SiO2 and Al2O3 films for use in UV-optical coatings
Thielsch, R.; Duparre, A.; Schulz, U.; Kaiser, N.
Conference Paper
This publication list has been generated from the publication database Fraunhofer-Publica.