Fraunhofer-Gesellschaft

YearTitle/AuthorDocument Type
2019Large-Area Layer Counting of Two-Dimensional Materials Evaluating the Wavelength Shift in Visible-Reflectance Spectroscopy
Hutzler, Andreas; Matthus, Christian D.; Dolle, Christian; Rommel, Mathias; Jank, Michael P.M.; Spiecker, Erdmann; Frey, Lothar
Journal Article
2018Human Sweat Analysis Using a Portable Device Based on a Screen‐printed Electrolyte Sensor
Zoerner, A.; Oertel, S.; Jank, M.P.M.; Frey, L.; Langenstein, B.; Bertsch, T.
Journal Article
2018Large-area layer counting of 2D materials via visible reflection spectroscopy: Poster presented at IMC19, 19th International Microscopy Congress, September 9 - 14, 2018, Sydney, Australia
Hutzler, Andreas; Matthus, C.D.; Dolle, C.; Rommel, M.; Jank, M.P.M.; Spiecker, E.; Frey, L.
Poster
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2017Determination of the selectivity of printed wearable sweat sensors
Zörner, A.; Oertel, S.; Schmitz, B.; Lang, N.; Jank, M.P.M.; Frey, L.
Conference Paper
2017System integration of printed biosensors for sweat electrolytes with data acquisition via Bluetooth to App
Oertel, S.; Jank, M.; Zörner, A.; Schmitz, B.; Lang, N.
Conference Paper
2016Correlation of film morphology and defect content with the charge-carrier transport in thin-film transistors based on ZnO nanoparticles
Polster, S.; Jank, M.P.M.; Frey, L.
Journal Article
2016Electrical properties of solution processed layers based on Ge-Si alloy nanoparticles
Meric, Z.; Mehringer, C.; Jank, M.P.M.; Peukert, W.; Frey, L.
Journal Article
2016Flexographic printing of nanoparticulate tin-doped indium oxide inks on PET foils and glass substrates
Wegener, M.; Spiehl, D.; Sauer, H.M.; Mikschl, F.; Liu, X.; Kölpin, N.; Schmidt, M.; Jank, M.P.M.; Dörsam, E.; Roosen, A.
Journal Article
2016Materials integration for printed zinc oxide thin-film transistors: Engineering of a fully-printed semiconductor/contact scheme
Liu, X.; Wegener, M.; Polster, S.; Jank, M.P.M.; Roosen, A.; Frey, L.
Journal Article
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2016Monitoring of biomarkers in sweat with printed sensors combined with sport wearables
Oertel, S.; Jank, M.; Schmitz, B.; Lang, N.
Conference Paper
2016Prospects and issues of nanomaterials use in microelectronics: Poster presented at Materials Research Society Spring Meeting 2016, Phoenix, Arizona, USA
Jank, Michael; Bauer, Anton; Frey, Lothar
Poster
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2015Device optimization and application study of low cost printed temperature sensor for mobile and stationary battery based Energy Storage Systems
Grosch, J.; Teuber, E.; Jank, M.; Lorentz, V.; März, M.; Frey, L.
Conference Paper
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2015Improved electrical behavior of ZrO2-based MIM structures by optimizing the O3 oxidation pulse time
Paskaleva, A.; Weinreich, W.; Bauer, A.J.; Lemberger, M.; Frey, L.
Journal Article
2015In situ formation of tantalum oxide - PMMA hybrid dielectric thin films for transparent electronic application
Valcu, E.E.; Musat, V.; Oertel, S.; Jank, M.P.M.; Leedham, T.
Journal Article
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2015Tunable conduction type of solution-processed germanium nanoparticle based field effect transistors and their inverter integration
Meric, Z.; Mehringer, C.; Karpstein, N.; Jank, M.P.M.; Peukert, W.; Frey, L.
Journal Article
2014Approaches to calculate the dielectric function of ZnO around the band gap
Agocs, E.; Fodor, B.; Pollakowski, B.; Beckhoff, B.; Nutsch, A.; Jank, M.; Petrik, P.
Journal Article
2014Feasibility evaluation of virtual metrology for the example of a trench etch process
Roeder, G.; Winzer, S.; Schellenberger, M.; Jank, S.; Pfitzner, L.
Journal Article
2014High-mobility metal-oxide thin-film transistors by spray deposition of environmentally friendly precursors
Oertel, S.; Jank, M.P.M.; Teuber, E.; Bauer, A.J.; Frey, L.
Conference Paper
2014Pulsed direct flame deposition and thermal annealing of transparent amorphous indium zinc oxide films as active layers in field effect transistors
Kilian, D.; Polster, S.; Vogeler, I.; Jank, M.P.M.; Frey, L.; Peukert, W.
Journal Article
2014Sol-gel preparation of ZrO2-PMMA for thin films transistors
Valcu, E.E.; Musat, V.; Jank, M.; Oertel, S.
Journal Article
2013Characterization of ZnO structures by optical and X-ray methods
Petrik, P.; Pollakowski, B.; Zakel, S.; Gumprecht, T.; Beckhoff, B.; Lemberger, M.; Labadi, Z.; Baji, Z.; Jank, M.; Nutsch, A.
Journal Article
2013Comparative measurements on atomic layer deposited Al2O3 thin films using ex situ table top and mapping ellipsometry, as well as X-ray and VUV reflectometry
Petrik, P.; Gumprecht, T.; Nutsch, A.; Roeder, G.; Lemberger, M.; Juhasz, G.; Polgar, O.; Major, C.; Kozma, P.; Janosov, M.; Fodor, B.; Agocs, E.; Fried, M.
Journal Article
2013Detailed leakage current analysis of metal-insulator-metal capacitors with ZrO2, ZrO2/SiO2/ZrO2, and ZrO2/Al2O3/ZrO2 as dielectric and TiN electrodes
Weinreich, W.; Shariq, A.; Seidel, K.; Sundqvist, J.; Paskaleva, A.; Lemberger, M.; Bauer, A.J.
Journal Article
2013Influence of parasitic capacitances on conductive AFM I-V measurements and approaches for its reduction
Rommel, Mathias; Jambreck, Joachim D.; Lemberger, Martin; Bauer, Anton J.; Frey, Lothar; Murakami, Katsuhisa; Richter, Christoph; Weinzierl, Philipp
Journal Article
2013Innovative balancing, heating and temperature sensing element for automotive batteries
Filimon, R.; Grosch, J.; Teuber, E.; Jank, M.; Lorentz, V.; Wenger, M.; Giegerich, M.; März, M.; Frey, L.
Conference Paper
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2013Laser melting of nanoparticulate transparent conductive oxide thin films
Baum, M.; Polster, S.; Jank, M.P.M.; Alexeev, I.; Frey, L.; Schmidt, M.
Journal Article
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2013Structural properties of as deposited and annealed ZrO2 influenced by atomic layer deposition, substrate, and doping
Weinreich, W.; Wilde, L.; Müller, J.; Sundqvist, J.; Erben, E.; Heitmann, J.; Lemberger, M.; Bauer, A.J.
Journal Article
2013Virtual metrology for prediction of etch depth in a trench etch process
Roeder, G.; Schellenberger, M.; Pfitzner, L.; Winzer, S.; Jank, S.
Conference Paper
2012Approaches for the reduction of the influence of parasitic capacitances on local IV characteristics for conductive AFM: Presentations held at 17th Workshop on Dielectrics in Microelectronics, June 25-27, Dresden, Germany
Rommel, Mathias; Jambreck, Joachim D.; Murakami, Katsuhisa; Lemberger, Martin; Richter, Christoph; Weinzierl, Philip; Bauer, Anton J.; Frey, Lothar
Presentation
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2012Efficient laser induced consolidation of nanoparticulate ZnO thin films with reduced thermal budget
Baum, M.; Polster, S.; Jank, M.P.M.; Alexeev, I.; Frey, L.; Schmidt, M.
Journal Article
2012Novel cost-efficient contactless distributed monitoring concept for smart battery cells
Lorentz, V.R.H.; Wenger, M.M.; Grosch, J.L.; Giegerich, M.; Jank, M.P.M.; März, M.; Frey, L.
Conference Paper
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2012Plasma-assisted atomic layer deposition of alumina at room temperature: Poster at 17th Workshop on Dielectrics in Microelectronics (WoDiM 2012), June 25-27, 2012, Dresden
Lemberger, Martin; Fromm, Timo; Rommel, Mathias; Bauer, Anton J.; Frey, Lothar
Poster
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2011Atomic layer deposited Al2O3 as characterized reference samples for nanolayer metrology
Nutsch, A.; Lemberger, M.; Petrik, P.
Conference Paper
2011Conduction mechanisms and environmental sensitivity of solution-processed silicon nanoparticle layers for thin-film transistors
Weis, S.; Körmer, R.; Jank, M.P.M.; Lemberger, M.; Otto, M.; Ryssel, H.; Peukert, W.; Frey, L.
Journal Article
2011Dünnfilmtransistor
Jank, Michael; Teuber, Erik; Lemberger, M.; Huang, J.
Patent
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2011Effects of oxygen and forming gas annealing on ZnO TFTs
Huang, J.; Radhakrishna, U.; Lemberger, M.; Jank, M.P.M.; Polster, S.; Ryssel, H.; Frey, L.
Conference Paper
2011EPR investigations of non-oxidized silicon nanoparticles from thermal pyrolysis of silane
Körmer, R.; Otto, M.; Wu, J.; Jank, M.P.M.; Frey, L.; Peukert, W.
Journal Article
2011Implication of oxygen vacancies on current conduction mechanisms in TiN/Zr1-xAlxO2/TiN metal-insulator-metal structures
Paskaleva, A.; Lemberger, M.; Bauer, A.J.; Frey, L.
Journal Article
2011Jet printing of colloidal solutions - numerical modeling and experimental verification of the influence of ink and surface parameters on droplet spreading
Schneider, O.; Epple, P.; Teuber, E.; Meyer, B.; Jank, M.P.M.; Rauh, C.; Delgado, A.
Journal Article
2011Properties of SiO2 and Si3N4 as gate dielectrics for printed ZnO transistors
Walther, S.; Polster, S.; Meyer, B.; Jank, M.; Ryssel, H.; Frey, L.
Journal Article
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2011Traps and trapping phenomena and their implications on electrical behavior of high-k capacitor stacks
Paskaleva, A.; Lemberger, M.; Atanassova, E.; Bauer, A.J.
Journal Article
2011Tuning of charge carrier density of ZnO nanoparticle films by oxygen plasma treatment
Walther, S.; Polster, S.; Jank, M.P.M.; Thiem, H.; Ryssel, H.; Frey, L.
Journal Article
2011Verfahren zur Herstellung eines Siliziumschicht
Jank, M.; Lukas, S.
Patent
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2011ZnO Dünnfilmtransistoren für druckbare Elektronik
Walther, S.
Dissertation
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2010Aerosol synthesis of silicon nanoparticles with narrow size distribution. Pt.1: Experimental investigations
Körmer, R.; Jank, M.P.M.; Ryssel, H.; Schmid, H.-J.; Peukert, W.
Journal Article
2010Chemische Gasphasenabscheidung von Metallsilicatschichten aus Einquellen-Ausgangsstoffen für Anwendungen in der Mikroelektronik
Lemberger, M.
Dissertation
2010Effects of oxygen and forming gas annealing on ZnO-TFTs: Poster at MRS Fall Meeting 2010, Boston
Huang, J.; Krishna, U.R.; Lemberger, M.; Jank, M.P.M.; Polster, S.; Ryssel, H.; Frey, L.
Poster
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2010Electrical scanning probe microscopy techniques for the detailed characterization of high-k dielectric layers
Rommel, M.; Yanev, V.; Paskaleva, A.; Erlbacher, T.; Lemberger, M.; Bauer, A.J.; Frey, L.
Conference Paper
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2010Fabrication of silicon carbide micropillar arrays from polycarbosilanes
Jang, Y.-S.; Zollfrank, C.; Jank, M.; Greil, P.
Journal Article
2010Impact of forming gas annealing on ZnO-TFTs
Huang, J.; Krishna, U.R.; Lemberger, M.; Jank, M.P.M.; Ryssel, H.; Frey, L.
Conference Paper
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2010Influence of annealing temperature and measurement ambient on TFTs based on gas phase synthesized ZnO nanoparticles
Walther, S.; Schäfer, S.; Jank, M.P.M.; Thiem, H.; Peukert, W.; Ryssel, H.; Frey, L.
Journal Article
2010Power semiconductor joining through sintering of Ag-nanoparticles: Analysis of suitability of different powders using DSC and TGA measurements
Knörr, M.; Schletz, A.; Oertel, S.; Jank, M.
Conference Paper
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2010SiC ceramic micropatterns from polycarbosilanes
Jang, Y.-S.; Jank, M.; Maier, V.; Durst, K.; Travitzky, N.; Zollfrank, C.
Journal Article
2009Correlation of microscopic and macroscopic electrical characteristics of high-k ZrSixO2-x thin films using tunneling atomic force microscopy
Weinreich, W.; Wilde, L.; Kücher, P.; Lemberger, M.; Yanev, V.; Rommel, M.; Bauer, A.J.; Erben, E.; Heitmann, J.; Schröder, U.; Oberbeck, L.
Conference Paper
2009Deposition of niobium nitride thin films from Tert-Butylamido-Tris-(Diethylamido)-Niobium by a modified industrial MOCVD reactor
Thiede, T.B.; Parala, H.; Reuter, K.; Passing, G.; Kirchmeyer, S.; Hinz, J.; Lemberger, M.; Bauer, A.J.; Barreca, D.; Gasparotto, A.; Fischer, R.A.
Journal Article
2009Impact of interface variations on J-V and C-V polarity asymmetry of MIM capacitors with amorphous and crystalline Zr(1-x)AlxO2 films
Weinreich, W.; Reiche, R.; Lemberger, M.; Jegert, G.; Müller, J.; Wilde, L.; Teichert, S.; Heitmann, J.; Erben, E.; Oberbeck, L.; Schröder, U.; Bauer, A.J.; Ryssel, H.
Conference Paper
2009Improved manufacturability of ZrO2 MIM capacitors by process stabilizing HfO2 addition
Müller, J.; Böscke, T.S.; Schröder, U.; Reinicke, M.; Oberbeck, L.; Zhou, D.; Weinreich, W.; Kücher, P.; Lemberger, M.; Frey, L.
Conference Paper
2009Influence of N2 and NH3 annealing on the nitrogen incorporation and k-value of thin ZrO2 layers
Weinreich, W.; Ignatova, V.A.; Wilde, L.; Teichert, S.; Lemberger, M.; Bauer, A.J.; Reiche, R.; Erben, E.; Heitmann, J.; Oberbeck, L.; Schröder, U.
Journal Article
2009Influence of the amorphous/crystalline phase of Zr1-xAlxO2 high-k layers on the capacitance performance of metal insulator metal stacks
Pakaleva, A.; Lemberger, M.; Bauer, A.J.; Weinreich, W.; Heitmann, J.; Erben, E.; Schröder, U.; Oberbeck, L.
Journal Article
2009Search for future high-k dielectrics, boundary conditions and examples
Bauer, A.J.; Lemberger, M.; Erlbacher, T.; Weinreich, W.
Conference Paper
2008Evaluation of MOCVD grown niobium nitride films as gate electrode for advanced CMOS technology
Thiede, T.; Parala, H.; Reuter, K.; Passing, G.; Kirchmeyer, S.; Hinz, J.; Lemberger, M.; Bauer, A.J.; Fischer, R.A.
Conference Paper
2008HfSiO/SiO2- and SiO2/HfSiO/SiO2-gate stacks for non-volatile memories
Erlbacher, T.; Jank, M.P.M.; Lemberger, M.; Bauer, A.J.; Ryssel, H.
Journal Article
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2008High-k: Latest developments and perspectives
Bauer, A.J.; Lemberger, M.; Erlbacher, T.; Weinreich, W.
Book Article
2008Hightech-Materialien für die Elektronik von morgen
Jank, M.P.; Bauer, A.J.; Fischer, B.; Slama, A.; Potinecke, T.
Book Article
2008Improved insight in charge trapping of high-k ZrO2/SiO2 stacks by use of tunneling atomic force microscopy
Paskaleva, A.; Yanev, V.; Rommel, M.; Lemberger, M.; Bauer, A.J.
Journal Article
2008Ion implantation into nanoparticulate functional layers
Walther, S.; Jank, M.P.M.; Ebbers, A.; Ryssel, H.
Conference Paper
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2008Self-aligned growth of organometallic layers for nonvolatile memories: Comparison of liquid-phase and vapor-phase deposition
Erlbacher, T.; Jank, M.P.M.; Ryssel, H.; Frey, L.; Engl, R.; Walter, A.; Sezi, R.; Dehm, C.
Journal Article
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2008Tunneling atomic-force microscopy as a highly sensitive mapping tool for the characterization of film morphology in thin high-k dielectrics
Yanev, V.; Rommel, M.; Lemberger, M.; Petersen, S.; Amon, B.; Erlbacher, T.; Bauer, A.J.; Ryssel, H.; Paskalev, A.; Weinreich, W.; Fachmann, C.; Heitmann, J.; Schroeder, U.
Journal Article
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2007Approach for a standardized methodology for multisite processing of 300-mm wafers at R&D sites
Oechsner, R.; Pfeffer, M.; Frickinger, J.; Schellenberger, M.; Roeder, G.; Pfitzner, L.; Ryssel, H.; Fritzsche, M.; Kaushik, V.; Renaud, D.; Danel, A.; Claeys, C.; Bearda, T.; Lering, M.; Graef, M.; Murphy, B.; Walther, H.; Hury, S.
Journal Article
2007Chemical vapor deposition of tantalum nitride films for metal gate application using TBTDET and novel single-source MOCVD precursors
Lemberger, M.; Baunemann, A.; Bauer, A.J.
Journal Article
2007Entwicklung und Charakterisierung eines CMOS-Prozesses mit minimierter Anzahl an Lithographieebenen
Jank, M.
Dissertation
2007MOCVD of hafnium silicate films obtained from a single-source precursor on silicon and germanium for gate-dielectric applications
Lemberger, M.; Schön, F.; Dirnecker, T.; Jank, M.P.M.; Frey, L.; Ryssel, H.; Paskaleva, A.; Zürcher, S.; Bauer, A.J.
Journal Article
2007MOCVD of TaN Using the All-Nitrogen-Coordinated Precursors [Ta(NEtMe)3(N-tBu)], [Ta(NEtMe)(N-tBu){C(N-iPr)2(NEtMe)}2] and [Ta(NMeEt)2(N-tBu){Me2N-N(SiMe3)}]
Baunemann, A.; Lemberger, M.; Bauer, A.J.; Parala, H.; Fischer, R.A.
Journal Article
2007MOCVD of tantalum nitride thin films from TBTEMT single source precursor as metal electrodes in CMOS applications
Lemberger, M.; Thiemann, S.; Baunemann, A.; Parala, H.; Fischer, R.A.; Hinz, J.; Bauer, A.J.; Ryssel, H.
Conference Paper
2007Polarity asymmetry of stress and charge trapping behavior of thin Hf- and Zr-silicate layers
Paskaleva, A.; Lemberger, M.; Bauer, A.J.
Journal Article
2007Stress induced leakage current mechanism in thin Hf-silicate layers
Paskaleva, A.; Lemberger, M.; Bauer, A.J.
Journal Article
2007Thermal stability of thin ALD ZrO2 layers as dielectrics in deep trench DRAM devices annealed in N2 and NH3: Poster at E-MRS Fall Meeting, September 17-21 2007, Warsaw
Weinreich, W.; Lemberger, M.; Erben, E.; Heitmann, J.; Wilde, L.; Ignatova, V.A.; Teichert, S.; Schröder, U.; Oberbeck, L.; Bauer, A.J.; Ryssel, H.; Kücher, P.
Poster
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2007Verification of grain boundaries in annealed thin ZrO2 films by electrical AFM technique: Poster at E-MRS Fall Meeting, September 17-21 2007, Warsaw
Yanev, V.; Paskaleva, A.; Weinreich, W.; Lemberger, M.; Petersen, S.; Rommel, M.; Bauer, A.J.; Ryssel, H.
Poster
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2006Approach for a standardized methodology for mulit-site processing of 300 mm wafers at R&D-sites
Öchsner, R.; Frickinger, J.; Pfeffer, M.; Schellenberger, M.; Roeder, G.; Pfitzner, L.; Ryssel, H.; Fritzsche, M.; Kaushik, V.; Renaud, D.; Danel, A.; Claeys, C.; Bearda, T.; Lering, M.; Graef, M.; Murphy, B.; Walther, H.; Hury, S.
Conference Paper
2006Correlation between defects, leakage currents and conduction mechanisms in thin high-k dielectric layers
Paskaleva, A.; Atanassova, E.; Lemberger, M.; Bauer, A.J.
Conference Paper
2006Flying Wafer - A standardised methodology for multi-site processing of 300 mm wafers at R&D-sites
Frickinger, J.; Oechsner, R.; Schellenberger, M.; Pfeffer, M.; Pfitzner, L.; Ryssel, H.; Claeys, C.; Claes, M.; Bearda, T.; Renaud, D.; Danel, A.; Lering, M.; Graef, M.; Kaushik, V.; Murphy, B.; Fritzsche, M.; Walther, H.; Hury, S.
Conference Paper
2006Flying wafer - A standardised methodology for multi-site processing Of 300 Mm wafers at research and development-sites
Frickinger, J.; Öchsner, R.; Schellenberger, M.; Pfeffer, M.; Pfitzner, L.; Ryssel, H.; Claes, M.; Bearda, T.; Renaud, D.; Danel, A.; Lering, M.; Graef, M.; Kaushik, V.; Murphy, B.; Fritzsche, M.; Walther, H.; Hury, S.
Conference Paper
2006Stress induced leakage currents and charge trapping in thin Zr- and Hf-silicate layers
Paskaleva, A.; Lemberger, M.; Bauer, A.J.
Conference Paper
2006Well design in a bulk CMOS technology with low mask count
Jank, M.P.M.; Kandziora, C.; Frey, L.; Ryssel, H.
Conference Paper
2005An asymmetry of conduction mechanisms and charge trapping in thin high-k Hf(x)Ti(y)Si(z)O films
Paskaleva, A.; Bauer, A.J.; Lemberger, M.
Journal Article
2005Characterization of interface state densities by photocurrent analysis: Comparison of results for different insulator layers
Rommel, M.; Groß, M.; Ettinger, A.; Lemberger, M.; Bauer, A.J.; Frey, L.; Ryssel, H.
Conference Paper
2005Chemistry of mixed ligand all nitrogen coordinated Ta, Hf, and W precursors for metal nitride MOCVD: Poster at Fifteenth European Conference on Chemical Vapor Deposition (EUROCVD-15), September 4-9 2005, Bochum
Baunemann, A.; Rische, D.; Kim, Y.; Parala, H.; Bauer, A.J.; Lemberger, M.; Fischer, R.A.
Poster
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2005Conduction mechanisms and an evidence for phonon-assisted conduction process in thin high-k Hf(x)Ti(y)Si(z)O films
Paskaleva, A.; Bauer, A.; Lemberger, M.
Journal Article
2005Electrical properties of hafnium silicate films obtained from a single-source MOCVD precursor
Lemberger, M.; Paskaleva, A.; Zurcher, S.; Bauer, A.J.; Frey, L.; Ryssel, H.
Journal Article
2005High-k hafnium silicate films on silicon and germanium wafers by MOCVD using a single-source precursor
Lemberger, M.; Schön, F.; Dirnecker, T.; Jank, M.P.M.; Paskaleva, A.; Bauer, A.J.; Frey, L.; Ryssel, H.
Conference Paper
2005MOCVD of conductive cubic HfN thin films from Hf(NR2)4 and N,N-dimethylhydrazine
Kim, Y.; Parala, H.; Bauer, A.J.; Lemberger, M.; Baunemann, A.; Fischer, R.A.
Conference Paper
2005MOCVD of cunductive cubic HfN thin films from Hf(NR2)4 and N,N-dimethylhydrazine
Kim, Y.; Parala, H.; Bauer, A.J.; Lemberger, M.; Baunemann, A.; Fischer, R.A.
Conference Paper
2005Thin Hf(x)Ti(y)Si(z)O films with varying Hf to Ti contents as candidates for high-k dielectrics
Bauer, A.J.; Paskaleva, A.; Lemberger, M.; Frey, L.; Ryssel, H.
Conference Paper
2004Different current conduction mechanisms through thin high-k Hf(x)Ti(y)Si(z)O films due to the varying Hf to Ti ratio
Paskaleva, A.; Bauer, A.J.; Lemberger, M.; Zurcher, S.
Journal Article
2004Electrical characterization and reliability aspects of zirconium silicate films obtained from novel MOCVD precursors
Lemberger, M.; Paskaleva, A.; Zurcher, S.; Bauer, A.J.; Frey, L.; Ryssel, H.
Conference Paper
2004Electrical properties and conduction mechanisms in Hf(x)Ti(y)Si(z)O films obtained from novel MOCVD precursors
Paskaleva, A.; Lemberger, M.; Zürcher, S.; Bauer, A.J.
Conference Paper
2003Electrical characterization of zirconium silicate films obtained from novel MOCVD precursors
Lemberger, M.; Paskaleva, A.; Zürcher, S.; Bauer, A.J.; Frey, L.; Ryssel, H.
Conference Paper
2003Hafnium titanium silicate high-k dielectric films deposited by MOCVD using novel single source precursors
Zürcher, S.; Morstein, M.; Lemberger, M.; Bauer, A.J.
Conference Paper
2003Investigation of implantation-induced defects in thin gate oxides using low field tunnel currents
Jank, M.; Frey, L.; Bauer, A.J.; Ryssel, H.
Conference Paper
2003Zirconium silicate films obtained from novel MOCVD precursors
Lemberger, M.; Paskaleva, A.; Zürcher, S.; Bauer, A.J.; Frey, L.; Ryssel, H.
Conference Paper
2002New single-source precursors for the MOCVD of high-kappa dielectric zirconium silicates to replace SiO2 in semiconducting devices
Zürcher, S.; Morstein, M.; Spencer, N.D.; Lemberger, M.; Bauer, A.
Journal Article
2001Electrical reliability aspects of through the gate implanted MOS-structures with thin oxides
Jank, M.; Lemberger, M.; Bauer, A.J.; Frey, L.; Ryssel, H.
Journal Article
2001New precursors for MOCVD of high-k metal silicates as alternative to SiO2 in semiconducting devices: Poster at Workshop on Nanoscience, October 16-19 2001, Twannberg
Zürcher, S.; Morstein, M.; Bauer, A.J.; Lemberger, M.
Poster
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2000Gate oxide damage due to through the gate implantation in MOS-structures with ultrathin and standard oxides
Jank, M.P.M.; Lemberger, M.; Frey, L.; Ryssel, H.
Conference Paper
1997Degradation of polymide by implantation with Ar+ ions
Svorcik, V.; Rybka, V.; Hnatowicz, V.; Mieek, I.; Jankovkij, O.; Öchsner, R.; Ryssel, H.
Journal Article