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Deposition and properties of diamond thin films

Abscheidung und Eigenschaften von Diamantfilmen
: Klages, C.-P.


Materials Science and Engineering, A. Structural materials, properties, microstructure and processing 140 (1991), S.741-746
ISSN: 0921-5093
ISSN: 1873-4936
International Conference on Plasma Surface Engineering <2, 1990, Garmisch-Partenkirchen>
Fraunhofer IST ()
Abscheidungsverfahren; Adhäsion; adhesion; deposition method; electrical and optical properties; elektrische Eigenschaft; Hochskalierung; low temperature deposition; optische Eigenschaft; review; scale-up; Tieftemperaturabscheidung; Übersichtsvortrag

Owing to a combination of several excellent intrinsic properties, diamond is the ideal material for a wide range of technical applications, from cutting tool coatings to high power, high temperature semiconductor devices. More than 20 years after Eversole's demonstration of the feasibility of diamond growth under conditions of thermodynamic metastability, intensive world-wide research activities emerged, aiming at the development and improvement of processes for the deposition of diamond thin films. This paper gives a short account of the important deposition methods known at present and discusses, as examples, several film properties and applications.