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CVD-Verfahren zur Beschichtung von Substratoberflaechen

Process for handling substrate surfaces
 
: Jung, T.

:
Frontpage ()

DE 1995-19505268 A: 19950216
DE 1995-19505268 A: 19950216
DE 19505268 C2: 19990218
H05H0001
Deutsch
Patent, Elektronische Publikation
Fraunhofer IST ()

Abstract
The invention relates to a process and a device for the treatment of substrate surfaces, in particular the coating, the removal of layers or parts of the surface and the activation for a subsequent coating to improve adhesion, as required for example with sensitive substrate materials. The excitation of coating, removal and activation processes in a vacuum is intended to be achieved by simple means in conjunction with a higher variability, in particular with the possibility of handling large surface areas. In the process according to the invention a) plasma is produced in a vacuum with a hollow cathode glow discharge, b) a reactive gas flow is fed into the plasma existing between the substrate side of the hollow cathode and the substrate, c) an inert gas flow is fed through the hollow cathode in such a way that the particles excited by the plasma are accelerated in the direction of and onto the substrate, and d) the plasma conditions and/or the inert gas feed is adjusted in such a way that a reaction of reactive gas and cathode material is prevented to the greatest extent possible.

: http://publica.fraunhofer.de/dokumente/PX-8878.html