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CVD-processes by hollow cathode glow discharge

: Hellmich, A.; Jung, T.; Kielhorn, A.; Rißland, M.

Plasma surface engineering 1996. Proceedings of the 5th International Conference on Plasma Surface Engineering
Garmisch-Partenkirchen, 1996
International Conference on Plasma Surface Engineering <5, 1996, Garmisch-Partenkirchen>
Fraunhofer IST ()
a-C:H(Ti); CVD; DC-Anregung; DC excitation; Hohlkathodenglimmentladung; hollow cathode glow discharge

Hollow cathode glow discharges are able to generate stable plasmas of high density under rough vacuum environment, can easily driven by D.C. excitation and require no complicated source design. The application of this discharge type for plasma chemical applications is studied for the case of plasma enhanced chemical vapour deposition of hydrogenated amorphous carbon films without and with metal content (a-C:H and Ti-C:H). The precursor gases were ethine and methane. linear correlation between deposition rate and input power was observed. Film deposition rates up to 12 mu m/h in the maximum with a half width across the source elongation of approximately 6 cm were obtained. The basic coating properties as wear resistance and hardness are comparable with established RF methods. The potential of two-dimensional upscaling was successful demonstrated with an array of five parallel linear sources.