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Critical dimension control in x-ray masks with electroplated gold absorbers

: Windbracke, W.; Betz, H.; Huber, H.-L.; Pilz, W.; Pongratz, S.

Microelectronic engineering (1986), Nr.5, S.73-80
ISSN: 0167-9317
International Conference on Microlithography <1986, Interlaken>
Fraunhofer ISIT ()

This paper describes a multi-layer technique for e-beam written x-ray master masks with electroplated gold absorbers, which allows to fulfill the demands on controlling linewidth of 0.5 Mikrometer better than plusminus 50 nm. Besides the rather complex multi-layer process for e-beam written master masks, a procedure for x-ray mas copying is described, which provides a much faster and more simple single-layer resist technology. Here the main contribution to linewidth variation results from the dose/development behaviour of the single-layer resist, being used as the electroplating mould. Appropriate exposure and development conditions allow a CD control of the work mask drawn via a submaster within the same error budget as on the master mask.