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Conductivity and reproducibility of e-beam induced deposited tungsten lines


Warlaumont, J.M. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Electron-beam, x-ray, EUV, and ion-beam submicrometer lithographies for manufacturing V : 20-21 February 1995, Santa Clara, California
Bellingham, Wash.: SPIE, 1995 (SPIE Proceedings Series 2437)
ISBN: 0-8194-1785-8
Conference "Electron-beam, X-ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing" <5, 1995, Santa Clara/Calif.>
Fraunhofer ISIT ()
electrical conductivity; electron beam deposition; integrated circuit metallisation; tungsten; X-ray lithography

The e-beam induced deposition process with the precursor gas W(CO)6 is investigated with the aim of improving the conductivity of the deposits. For this purpose, lines are deposited on Kelvin structures of gold on silicon oxide. A non-ohmic behaviour is observed if the connection of the deposits to the gold is incomplete. The reproducibility of the process mainly depends on the stability of the current density. Keeping the current density constant, the deviations of the conductivity are less than 20%. By increasing the dwell time and by lowering the beam energy and the beam step size (BSS), the specific resistance decreases down to 10-3 omega cm. We conjecture that at a beam energy of 1 keV and a current density of 60-70 A/cm2 the conductivity and the reproducibility might further be improved.