Particle measurement configuration for semiconductor wafer processing device, has control unit that controls switching state of valve based on comparison between signal representing parameter and predefined threshold value.

: Trunk, R.; Schmid, H.; Schneider, C.; Pfitzner, L.

Abstract
Eine Partikelmessgeraeteanordnung misst mittels eines Partikelmessgeraetes (11) die Partikelkonzentration in einem fluessigen oder gasfoermigen Medium. Zur Vermeidung von Fehlmessungen oder Beschaedigung des Partikelmessgeraetes (11) ist eine Messzelle (10) vorgesehen, die Temperatur oder Druck oder pH-Wert des Mediums misst. Eine Systemsteuerung schaltet bei Ueberschreiten von Schwellwerten ein Ventil (14) ab und verhindert ein Betreiben des Prtikelmessgeraetes ausserhalb vorgegebener Spezifikation.

 

US2003041969 A UPAB: 20030619 NOVELTY - Two measuring instruments respectively measure concentration and parameter of particles in gaseous or liquid medium output from a feed connection. A control unit compares a signal representing the measured parameter with a predefined threshold value, and controls a switching state of a valve connected with the feed connection and measuring instruments based on the comparison result. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for semiconductor wafer processing device. USE - For semiconductor wafer processing device (claimed). ADVANTAGE - Enables preventing the particle measurement instrument from being operated outside a predefined specification, so as to avoid erroneous measurement. Enables semiconductor wafer processing device to perform reliable operation using the reliable particle measuring instruments.