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Combination of surface characterization techniques for investigating optical thin-film components

: Duparre, A.; Jakobs, S.


Applied optics 35 (1996), Nr.25, S.5052-5058
ISSN: 0003-6935
ISSN: 1539-4522
ISSN: 1559-128X
Fraunhofer IOF ()
atomic force microscopy; dünne Schicht; Lichtstreuung; light scattering; Mikrostruktur; Oberflächenrauheit; Rasterkraftmikroskopie; surface roughness; thin-film microstructure

To meet the requirements of comprehensively characterizing the morphology of thin films and substrates, a suitable combination of different measuring techniques should be chosen, i.e., a nonoptical surface profile measurement should be used together with optical analysis. It is demonstrated on selected examples of fluoride and oxide films that the use of atomic force microscopy and light scattering fulfills the demand of appropriate quantitative characterization over a sufficiently large range of bandwidths.