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Aspects of TiN and Ti deposition in an ECR plasma enhanced CVD process

: Weber, A.; Nikulski, R.; Klages, C.-P.; Gross, M.E.; Charatan, R.M.; Opilan, R.L.; Brown, L.


Applied surface science 91 (1995), S.314-320
ISSN: 0169-4332
Fraunhofer IST ()
electron cyclotron resonance plasma; MOPECVD; tetrakis(dimethylamido)-titanium; titanium; titanium nitride; titaniumtetrachloride

Tetrakis(dimethylamido) titanium (TDMAT) was used to deposit pure TiN at temperatures < 300 deg C by introducing it into the downstream region of an electron cyclotron resonance (ECR) plasma using nitrogen as plasma gas. The mechanism of TiN formation from TDMAT was elucidated with labeled nitrogen as plasma gas. Titanium was deposited on silicon at 500 deg C using titanium tetrachloride (TiCl4) and a hydrogen ECR downstream plasma. The formation of titanium disilicide was confirmed by X-ray photoelectron spectroscopy (XPS) after annealing the Ti film on silicon at 800 deg C. After silicide formation, a TiN cap was deposited from TiCl4 and a nitrogen/hydrogen plasma gas mixture. The chlorine content of the film was less than 1 at per cent. Thus, the combination of the TiCl4 and TDMAT process is a possible approach for contact level and upper level metallization.