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Characterization of thin films and multilayers by use of electron beam excited X-ray spectrometry

Vortrag an der Ecole Polytechnique Federale de Lausanne, Department de Physique am 15. Januar 1991.
: Willich, P.

Fraunhofer IST ()
chemical analysis; chemische Analyse; determination of film thickness; dünne Schicht; electron probe microanalysis; Elektronenstrahlmikroanalyse; local surface analysis; lokale Oberflächenanalyse; Mehrfachschicht; multilayer; Schichtdickenmessung; thin films

Electron beam excited x-ray spectrometry is applied to non-destructive chemical analysis of solids in the near-surface region. Because of its lateral resolution in the order of 2 mym the technique is frequently designated as electron probe micro-analysis (EPMA). Detectability limits are in the order of 50 ppm by use of crystal spectrometers. Accuracy of quantitative analysis is about 1-5% rel. by use of pure element or simple compound standards. EPMA of low atomic number elements (Be, B, C, N, O, F) is possible without significant restrictions in respect of sensitivity and accuracy. Recently developed data reduction models in combination with refined experimental procedures enable one to perform local analysis of films having a thickness of 0.01-2 mym. Special applications include the determination of films thickness, buried layers, multilayers, and non-destructive in-depth analysis. EPMA is demonstrated as a versatile tool of thin film characterization by examples of scientific and/or technological interest, e.g., garnet films, tribological- and protective coatings, thin film resistors, superconductors, and magneto-optic storage materials.