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Application of e-beam nanolithography for absorber structuring of high resolution x-ray masks
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1993
Journal Article
Titel
Application of e-beam nanolithography for absorber structuring of high resolution x-ray masks
Author(s)
Köhler, C.
Brünger, W.H.
Ehrlich, C.
Huber, H.-L.
Reimer, K.
Zeitschrift
Microelectronic engineering
DOI
10.1016/0167-9317(93)90047-9
Language
English
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Fraunhofer-Institut für Siliziumtechnologie ISIT