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Title
Vorrichtung zur Erzeugung einer Gasentladung mit schnellen Spannungsanstiegen und hohen Leistungsfluessen
Date Issued
2003
Author(s)
Neff, W.
Klein, Jürgen
Pochner, K.
Chen, P.
Patent No
1996-19643925
Abstract
The voltage rise is faster than the breakdown time period of the gas discharge. The repetition frequency of the voltage pulses is chosen so high that a sufficient rest ionisation remains up to the next pulse. Typically the gas discharge is of barrier type with which at least one electrode is screened by a dielectric against the gas discharge space. Preferably the fast voltage rise results in an overvoltage prior to ignition. The discharge may ignite in very frequent closely spaced microdischarges, which may ignite simultaneously. The current flow in the microdischarges is cut short by their mutual influence. USE - For plasma-chemical techniques, using barrier discharges. ADVANTAGE - More micro-discharges per electrode surface and faster discharge frequency.
Language
de
Institute
Patenprio
DE 1996-19643925 A: 19961030