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Anordnung zur Plasmaerzeugung

Setup for plasma generation
 
: Kozlowski, F.; Steiner, P.; Lang, W.

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Frontpage ()

DE 1993-4315075 A: 19930506
DE 1993-4315075 A: 19930506
DE 4315075 A1: 19941110
H05H0001
Deutsch
Patent, Elektronische Publikation
Fraunhofer IZM ()

Abstract
The description refers to a setup for plasma generation as presented in the German patent application P 4304846.3-33, and comprises a microporous body and a voltage source which applies a voltage to spaced points on the microporous body. Another simplified variant of this setup is created by the fact that the body has a conductive base layer, an insulator layer arranged on top of the latter and a counter electrode layer arranged on top pf the insulator layer, that the pores are in the region of the surface of the body and extend from the surface of the body through the counterelectrode layer and through the insulator layer through to the base layer, and that the width of the pores in the parallel direction to the surface of the body is greater than the free path length of the electrons and smaller than twenty times the free path length of the electrons, whereby the free path length of the electrons depends on the type and pressure of the gas surrounding the setup.

: http://publica.fraunhofer.de/dokumente/PX-4084.html