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Vorrichtung zum Anregen elektrischer Entladungen mittels getakteter Spannungsspitzen

Gas discharge excitation method - has transient voltage pulses superimposed on basic LF voltage for increasing energy fed to gas discharge..
 
: Neff, W.; Pochner, K.

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Frontpage ()

DE 1996-19616187 A: 19960423
DE 1996-19616187 A: 19960423
DE 19616187 A1: 19971106
H05H0001
Deutsch
Patent, Elektronische Publikation
Fraunhofer ILT ()

Abstract
The gas discharge excitation method uses an applied AC voltage with a frequency of between 500Hz and 50kHz, which is insufficient to trigger the gas discharge and superimposed transient voltage pulses (A,B) used for increasing the energy level to initiate the gas discharge. The transient voltage pulses may have a rise time of less than 5 microsec, with different pulses superimposed on each half wave of the basic AC voltage signal adjacent the maximum voltage amplitude. USE - For plasma process used for semiconductor manufacture.

: http://publica.fraunhofer.de/dokumente/PX-40637.html